Atsushi Sawano

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for antireflection film formation and method for resist...
- Patent number 8,455,182
- Issue date Jun 4, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detergent for lithography and method of forming resist pattern with...
- Patent number 8,367,312
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Application liquid and method for formation of a silica-based coati...
- Patent number 8,323,745
- Issue date Dec 4, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tokonori Yamadaya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Anti-reflection film forming material, and method for forming resis...
- Patent number 8,216,775
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yuriko Shirai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for formation of anti-reflection film, and method for f...
- Patent number 8,158,328
- Issue date Apr 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer, photoresist composition, and process for forming resist...
- Patent number 6,884,566
- Issue date Apr 26, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition
- Patent number 6,551,755
- Issue date Apr 22, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Hidesaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer, photoresist composition, and process for forming resist...
- Patent number 6,517,993
- Issue date Feb 11, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition
- Patent number 6,312,863
- Issue date Nov 6, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Hidesaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and a process for producing the same
- Patent number 6,083,657
- Issue date Jul 4, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Kono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 5,853,948
- Issue date Dec 29, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 5,728,504
- Issue date Mar 17, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi Hosoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working naphtho quinone diazide sulfonic acid ester photor...
- Patent number 5,576,138
- Issue date Nov 19, 1996
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshito Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MATERIAL FOR FORMING PROTECTIVE FILM AND METHOD FOR FORMING PHOTORE...
- Publication number 20110065053
- Publication date Mar 17, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki YOSHIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
APPLICATION LIQUID AND METHOD FOR FORMATION OF A SILICA-BASED COATI...
- Publication number 20100247799
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tokunori YAMADAYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD OF FORMING...
- Publication number 20100104978
- Publication date Apr 29, 2010
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD FOR RESIST...
- Publication number 20100104987
- Publication date Apr 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING FORMATION AGENT FOR PATTERN MICRO-FABRICATION, AND MICROPAT...
- Publication number 20100090372
- Publication date Apr 15, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Anti-reflection film forming material, and method for forming resis...
- Publication number 20090253077
- Publication date Oct 8, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yuriko Shirai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Detergent For Lithography And Method Of Forming Resist Pattern With...
- Publication number 20090004608
- Publication date Jan 1, 2009
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20040096772
- Publication date May 20, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20030186171
- Publication date Oct 2, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive photoresist composition
- Publication number 20020061458
- Publication date May 23, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Hidesaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20020031719
- Publication date Mar 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel copolymer, photoresist composition , and process for forming...
- Publication number 20020031720
- Publication date Mar 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Atsushi Sawano

Person

Patents Grantslast 30 patents

Composition for antireflection film formation and method for resist...

Detergent for lithography and method of forming resist pattern with...

Application liquid and method for formation of a silica-based coati...

Anti-reflection film forming material, and method for forming resis...

Composition for formation of anti-reflection film, and method for f...

Copolymer, photoresist composition, and process for forming resist...

Positive photoresist composition

Copolymer, photoresist composition, and process for forming resist...

Positive photoresist composition

Positive photoresist compositions and a process for producing the same

Positive photoresist compositions and multilayer resist materials u...

Positive photoresist compositions and multilayer resist materials u...

Positive-working naphtho quinone diazide sulfonic acid ester photor...

Patents Applicationslast 30 patents

MATERIAL FOR FORMING PROTECTIVE FILM AND METHOD FOR FORMING PHOTORE...

APPLICATION LIQUID AND METHOD FOR FORMATION OF A SILICA-BASED COATI...

COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD OF FORMING...

COMPOSITION FOR ANTIREFLECTION FILM FORMATION AND METHOD FOR RESIST...

COATING FORMATION AGENT FOR PATTERN MICRO-FABRICATION, AND MICROPAT...

Anti-reflection film forming material, and method for forming resis...

Detergent For Lithography And Method Of Forming Resist Pattern With...

Novel copolymer, photoresist composition, and process for forming r...

Novel copolymer, photoresist composition, and process for forming r...

Positive photoresist composition

Novel copolymer, photoresist composition, and process for forming r...

Novel copolymer, photoresist composition , and process for forming...