Atsushi Shiota

Person

Ushiku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming organic silica film, organic silica film, wiring...
- Patent number 8,268,403
- Issue date Sep 18, 2012
- JSR Corporation
- Masahiro Akiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Organic silica-based film, method of forming the same, composition...
- Patent number 7,932,295
- Issue date Apr 26, 2011
- JSR Corporation
- Hajime Tsuchiya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Laminated body and semiconductor device
- Patent number 7,608,928
- Issue date Oct 27, 2009
- JSR Corporation
- Kaori Shirato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Insulation film
- Patent number 7,297,360
- Issue date Nov 20, 2007
- JSR Corporation
- Mutsuhiko Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing silica-based film, silica-based film, insulat...
- Patent number 7,026,053
- Issue date Apr 11, 2006
- JSR Corporation
- Atsushi Shiota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-free plasma curing process for porous low-k materials
- Patent number 7,011,868
- Issue date Mar 14, 2006
- Axcelis Technologies, Inc.
- Carlo Waldfried
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing silica-based film, silica-based film, insulat...
- Patent number 6,902,771
- Issue date Jun 7, 2005
- JSR Corporation
- Atsushi Shiota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of film formation, insulating film, and substrate for semico...
- Patent number 6,890,605
- Issue date May 10, 2005
- JSR Corporation
- Michinori Nishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stacked film, insulating film and substrate for semiconductor
- Patent number 6,824,833
- Issue date Nov 30, 2004
- JSR Corporation
- Michinori Nishikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for film formation, method of film formation, and silic...
- Patent number 6,800,330
- Issue date Oct 5, 2004
- JSR Corporation
- Eiji Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the formation of silica film, silica film, insulating fi...
- Patent number 6,787,193
- Issue date Sep 7, 2004
- JSR Corporation
- Eiji Hayashi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Stacked film, method for the formation of stacked film, insulating...
- Patent number 6,749,944
- Issue date Jun 15, 2004
- JSR Corporation
- Michinori Nishikawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of forming insulating film and process for producing semicon...
- Patent number 6,558,747
- Issue date May 6, 2003
- Kabushiki Kaisha Toshiba
- Rempei Nakata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for film formation, method of film formation, and insul...
- Patent number 6,410,151
- Issue date Jun 25, 2002
- JSR Corporation
- Takahiko Kurosawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for film formation, method of film formation, and insul...
- Patent number 6,410,150
- Issue date Jun 25, 2002
- JSR Corporation
- Takahiko Kurosawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Film-forming composition
- Patent number 6,406,794
- Issue date Jun 18, 2002
- JSR Corporation
- Atsushi Shiota
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,190,833
- Issue date Feb 20, 2001
- JSR Corporation
- Atsushi Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for Forming Organic Silica Film, Organic Silica Film, Wiring...
- Publication number 20080268264
- Publication date Oct 30, 2008
- JSR Corporation
- Masahiro Akiyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Laminated Body and Semiconductor Drive
- Publication number 20080044664
- Publication date Feb 21, 2008
- JSR CORPORATION
- Kaori Shirato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for Forming Organic Silica Film, Organic Silica Film, Wiring...
- Publication number 20080038527
- Publication date Feb 14, 2008
- JSR Corporation
- Masahiro Akiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Process for producing silica-based film, silica-based film, insulat...
- Publication number 20050042464
- Publication date Feb 24, 2005
- JSR Corporation
- Atsushi Shiota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Insulation film
- Publication number 20040110896
- Publication date Jun 10, 2004
- JSR Corporation
- Mutsuhiko Yoshioka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Fluorine-free plasma curing process for porous low-k materials
- Publication number 20040028916
- Publication date Feb 12, 2004
- Carlo Waldfried
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fluorine-free plasma curing process for porous low-k materials
- Publication number 20030157267
- Publication date Aug 21, 2003
- Carlo Waldfried
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for producing silica-based film, silica-based film, insulat...
- Publication number 20030157340
- Publication date Aug 21, 2003
- JSR Corporation
- Atsushi Shiota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for producing silica-based film, silica-based film, insulat...
- Publication number 20030104225
- Publication date Jun 5, 2003
- JSR Corporation
- Atsushi Shiota
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Stacked film, insulating film and substrate for semiconductor
- Publication number 20030077461
- Publication date Apr 24, 2003
- JSR Corporation
- Michinori Nishikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Stacked film, method for the formation of stacked film, insulating...
- Publication number 20030059628
- Publication date Mar 27, 2003
- JSR Corporation
- Michinori Nishikawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of film formation, insulating film, and substrate for semico...
- Publication number 20030059550
- Publication date Mar 27, 2003
- JSR Corporation
- Michinori Nishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for the formation of silica film, silica film, insulating fi...
- Publication number 20030008155
- Publication date Jan 9, 2003
- JSR Corporation
- Eiji Hayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for film formation, method of film formation, and silic...
- Publication number 20020189495
- Publication date Dec 19, 2002
- JSR Corporation
- Eiji Hayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of forming dual damascene structure
- Publication number 20020142586
- Publication date Oct 3, 2002
- JSR Corporation
- Atsushi Shiota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming insulating film and process for producing semicon...
- Publication number 20020086169
- Publication date Jul 4, 2002
- Kabushiki Kaisha Toshiba
- Rempei Nakata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Process for producing silica-based film, silica-based film, insulat...
- Publication number 20010018129
- Publication date Aug 30, 2001
- JSR Corporation
- Atsushi Shiota
- H01 - BASIC ELECTRIC ELEMENTS

Atsushi Shiota

Person

Patents Grantslast 30 patents

Method for forming organic silica film, organic silica film, wiring...

Organic silica-based film, method of forming the same, composition...

Laminated body and semiconductor device

Insulation film

Process for producing silica-based film, silica-based film, insulat...

Fluorine-free plasma curing process for porous low-k materials

Process for producing silica-based film, silica-based film, insulat...

Method of film formation, insulating film, and substrate for semico...

Stacked film, insulating film and substrate for semiconductor

Composition for film formation, method of film formation, and silic...

Method for the formation of silica film, silica film, insulating fi...

Stacked film, method for the formation of stacked film, insulating...

Method of forming insulating film and process for producing semicon...

Composition for film formation, method of film formation, and insul...

Composition for film formation, method of film formation, and insul...

Film-forming composition

Radiation-sensitive resin composition

Patents Applicationslast 30 patents

Method for Forming Organic Silica Film, Organic Silica Film, Wiring...

Laminated Body and Semiconductor Drive

Method for Forming Organic Silica Film, Organic Silica Film, Wiring...

Process for producing silica-based film, silica-based film, insulat...

Insulation film

Fluorine-free plasma curing process for porous low-k materials

Fluorine-free plasma curing process for porous low-k materials

Process for producing silica-based film, silica-based film, insulat...

Process for producing silica-based film, silica-based film, insulat...

Stacked film, insulating film and substrate for semiconductor

Stacked film, method for the formation of stacked film, insulating...

Method of film formation, insulating film, and substrate for semico...

Method for the formation of silica film, silica film, insulating fi...

Composition for film formation, method of film formation, and silic...

Method of forming dual damascene structure

Method of forming insulating film and process for producing semicon...

Process for producing silica-based film, silica-based film, insulat...