Atsushi Yasuda

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Copolymer for semiconductor lithography, resist composition, and me...
- Patent number 10,336,851
- Issue date Jul 2, 2019
- Mitsubishi Chemical Corporation
- Atsushi Yasuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer and method for producing same
- Patent number 9,840,568
- Issue date Dec 12, 2017
- Mitsubishi Chemical Corporation
- Tomoya Oshikiri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alcohol compound and method for producing same, method for producin...
- Patent number 9,823,563
- Issue date Nov 21, 2017
- Mitsubishi Chemical Corporation
- Satoshi Sakuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymers for lithography and method for producing same, resist co...
- Patent number 9,733,564
- Issue date Aug 15, 2017
- Mitsubishi Chemical Corporation
- Atsushi Yasuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist copolymer and resist composition
- Patent number 9,540,468
- Issue date Jan 10, 2017
- Mitsubishi Rayon Co., Ltd.
- Keisuke Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer for lithography and method of manufacturing the same, res...
- Patent number 9,527,938
- Issue date Dec 27, 2016
- Mitsubishi Rayon Co., Ltd.
- Atsushi Yasuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer for lithography
- Patent number 9,296,842
- Issue date Mar 29, 2016
- Mitsubishi Rayon Co., Ltd.
- Atsushi Yasuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing polymer for lithography, method of manufact...
- Patent number 9,223,213
- Issue date Dec 29, 2015
- Mitsubishi Rayon Co., Ltd.
- Atsushi Yasuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing polymer, polymer for lithography, resist compo...
- Patent number 9,109,060
- Issue date Aug 18, 2015
- Mitsubishi Rayon, Co., Ltd.
- Atsushi Yasuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing epihalohydrin copolymer rubber
- Patent number 4,299,944
- Issue date Nov 10, 1981
- Nippon Zeon Co. Ltd.
- Akio Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY, RESIST COMPOSITION, AND ME...
- Publication number 20160200849
- Publication date Jul 14, 2016
- MITSUBISHI RAYON CO., LTD.
- Atsushi YASUDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RES...
- Publication number 20150099230
- Publication date Apr 9, 2015
- MITSUBISHI RAYON CO., LTD.
- Atsushi Yasuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF MANUFACTURING POLYMER FOR LITHOGRAPHY, METHOD OF MANUFACT...
- Publication number 20150044608
- Publication date Feb 12, 2015
- Mitsubishi Rayon Co., Ltd.
- Atsushi YASUDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COPOLYMER AND RESIST COMPOSITION
- Publication number 20140371412
- Publication date Dec 18, 2014
- Mitsubishi Rayon Co., Ltd.
- Keisuke KATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ALCOHOL COMPOUND AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCIN...
- Publication number 20140134539
- Publication date May 15, 2014
- MITSUBISHI RAYON CO., LTD.
- Satoshi Sakuma
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER AND METHOD FOR PRODUCING SAME
- Publication number 20140114034
- Publication date Apr 24, 2014
- MITSUBISHI RAYON CO., LTD.
- Tomoya Oshikiri
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER FOR LITHOGRAPHY
- Publication number 20130331533
- Publication date Dec 12, 2013
- Mitsubishi Rayon Co., Ltd.
- Atsushi Yasuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST CO...
- Publication number 20130224654
- Publication date Aug 29, 2013
- Mitsubishi Rayon Co., Ltd.
- Atsushi Yasuda
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPO...
- Publication number 20120115086
- Publication date May 10, 2012
- Mitsubishi Rayon Co., Ltd.
- Atsushi Yasuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Atsushi Yasuda

Person

Patents Grantslast 30 patents

Copolymer for semiconductor lithography, resist composition, and me...

Polymer and method for producing same

Alcohol compound and method for producing same, method for producin...

Copolymers for lithography and method for producing same, resist co...

Resist copolymer and resist composition

Copolymer for lithography and method of manufacturing the same, res...

Polymer for lithography

Method of manufacturing polymer for lithography, method of manufact...

Method for producing polymer, polymer for lithography, resist compo...

Process for producing epihalohydrin copolymer rubber

Patents Applicationslast 30 patents

COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY, RESIST COMPOSITION, AND ME...

COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RES...

METHOD OF MANUFACTURING POLYMER FOR LITHOGRAPHY, METHOD OF MANUFACT...

RESIST COPOLYMER AND RESIST COMPOSITION

ALCOHOL COMPOUND AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCIN...

POLYMER AND METHOD FOR PRODUCING SAME

POLYMER FOR LITHOGRAPHY

COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST CO...

METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPO...