Atsutaro YOSHIZAWA

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Hitachi-shi, lbaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method of manufacturing pattern c...
- Patent number 11,487,201
- Issue date Nov 1, 2022
- HD MICROSYSTEMS, LTD.
- Etsuharu Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
POLYIMIDE PRECURSOR, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOS...
- Publication number 20240092973
- Publication date Mar 21, 2024
- HD MICROSYSTEMS, LTD.
- Naoto NAGAMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CU...
- Publication number 20230359122
- Publication date Nov 9, 2023
- HD MICROSYSTEMS, LTD.
- Atsutaro YOSHIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CU...
- Publication number 20210311390
- Publication date Oct 7, 2021
- HD MICROSYSTEMS, LTD.
- Atsutaro YOSHIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF MANUFACTURING PATTERN C...
- Publication number 20210116809
- Publication date Apr 22, 2021
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Etsuharu TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY