Audunn Ludviksson

Person

Scottsdale, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Neutral beam etching of Cu-containing layers in an organic compound...
- Patent number 10,147,613
- Issue date Dec 4, 2018
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post deposition plasma cleaning system and method
- Patent number 8,974,868
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for etching high-k dielectric materials
- Patent number 7,781,340
- Issue date Aug 24, 2010
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for use of optical system with a plasma proces...
- Patent number 7,591,923
- Issue date Sep 22, 2009
- Tokyo Electron Limited
- Andrej S Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of Cu-containing layers
- Patent number 7,553,427
- Issue date Jun 30, 2009
- Tokyo Electron Limited
- Audunn Ludviksson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for process monitoring and control
- Patent number 7,355,171
- Issue date Apr 8, 2008
- Tokyo Electron Limited
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anisotropic dry etching of Cu-containing layers
- Patent number 7,214,327
- Issue date May 8, 2007
- Tokyo Electron Limited
- Lee Chen
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method and system for etching high-k dielectric materials
- Patent number 7,202,169
- Issue date Apr 10, 2007
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring using infrared optical diagnostics
- Patent number 7,102,132
- Issue date Sep 5, 2006
- Tokyo Electron Limited
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of using a sensor gas to determine erosion level of consumab...
- Patent number 7,064,812
- Issue date Jun 20, 2006
- Tokyo Electron Limited
- Audunn Ludviksson
- G01 - MEASURING TESTING
Information Patent Grant
Monitoring erosion of system components by optical emission
- Patent number 6,894,769
- Issue date May 17, 2005
- Tokyo Electron Limited
- Audunn Ludviksson
- G01 - MEASURING TESTING
Information Patent Grant
Monitoring material buildup on system components by optical emission
- Patent number 6,806,949
- Issue date Oct 19, 2004
- Tokyo Electron Limited
- Audunn Ludviksson
- G01 - MEASURING TESTING
Information Patent Grant
Method for depositing conformal nitrified tantalum silicide films b...
- Patent number 6,586,330
- Issue date Jul 1, 2003
- Tokyo Electron Limited
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
NEUTRAL BEAM ETCHING OF CU-CONTAINING LAYERS IN AN ORGANIC COMPOUND...
- Publication number 20150380271
- Publication date Dec 31, 2015
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching high-k dielectric materials
- Publication number 20070155181
- Publication date Jul 5, 2007
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for process monitoring and control
- Publication number 20060255260
- Publication date Nov 16, 2006
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition system and method
- Publication number 20060211243
- Publication date Sep 21, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Anisotropic dry etching of cu-containing layers
- Publication number 20050224456
- Publication date Oct 13, 2005
- TOKYO ELECTRON LIMITED
- Lee Chen
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Plasma processing system and method
- Publication number 20050189069
- Publication date Sep 1, 2005
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for use of optical system with a plasma proces...
- Publication number 20050173375
- Publication date Aug 11, 2005
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching of cu-containing layers
- Publication number 20050167399
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring using infrared optical diagnostics
- Publication number 20050082482
- Publication date Apr 21, 2005
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of using a sensor gas to determine erosion level of consumab...
- Publication number 20050041238
- Publication date Feb 24, 2005
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- G01 - MEASURING TESTING
Information Patent Application
Method system and computer readable medium for monitoring the statu...
- Publication number 20040221957
- Publication date Nov 11, 2004
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Monitoring erosion of system components by optical emission
- Publication number 20040125360
- Publication date Jul 1, 2004
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- G01 - MEASURING TESTING
Information Patent Application
Monitoring material buildup on system components by optical emission
- Publication number 20040125359
- Publication date Jul 1, 2004
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- G01 - MEASURING TESTING
Information Patent Application
Method and system for etching high-k dielectric materials
- Publication number 20040110375
- Publication date Jun 10, 2004
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for depositing tantalum silicide films by thermal chemical v...
- Publication number 20030211736
- Publication date Nov 13, 2003
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for use of optical diagnostic system with a pl...
- Publication number 20030183337
- Publication date Oct 2, 2003
- James Fordemwalt
- H01 - BASIC ELECTRIC ELEMENTS

Audunn Ludviksson

Person

Patents Grantslast 30 patents

Neutral beam etching of Cu-containing layers in an organic compound...

Post deposition plasma cleaning system and method

Method and system for etching high-k dielectric materials

Apparatus and method for use of optical system with a plasma proces...

Plasma etching of Cu-containing layers

Method and apparatus for process monitoring and control

Anisotropic dry etching of Cu-containing layers

Method and system for etching high-k dielectric materials

Process monitoring using infrared optical diagnostics

Method of using a sensor gas to determine erosion level of consumab...

Monitoring erosion of system components by optical emission

Monitoring material buildup on system components by optical emission

Method for depositing conformal nitrified tantalum silicide films b...

Patents Applicationslast 30 patents

NEUTRAL BEAM ETCHING OF CU-CONTAINING LAYERS IN AN ORGANIC COMPOUND...

Method and system for etching high-k dielectric materials

Method and apparatus for process monitoring and control

Deposition system and method

Anisotropic dry etching of cu-containing layers

Plasma processing system and method

Apparatus and method for use of optical system with a plasma proces...

Plasma etching of cu-containing layers

Process monitoring using infrared optical diagnostics

Method of using a sensor gas to determine erosion level of consumab...

Method system and computer readable medium for monitoring the statu...

Monitoring erosion of system components by optical emission

Monitoring material buildup on system components by optical emission

Method and system for etching high-k dielectric materials

Method for depositing tantalum silicide films by thermal chemical v...

Apparatus and method for use of optical diagnostic system with a pl...