Aurélie Kuroda

Person

Chofu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for forming a conformal silicon carbon nitride la...
- Patent number 12,031,205
- Issue date Jul 9, 2024
- ASM IP Holding B.V.
- Ling Chi Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming a topographically selective silicon oxide film...
- Patent number 11,610,774
- Issue date Mar 21, 2023
- ASM IP Holding B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selectively depositing a capping layer structure on a sem...
- Patent number 10,910,262
- Issue date Feb 2, 2021
- ASM IP Holding B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processes for preventing oxidation of metal thin films
- Patent number 9,947,582
- Issue date Apr 17, 2018
- ASM IP Holding B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR FORMING A CONFORMAL SILICON CARBON NITRIDE LA...
- Publication number 20230167544
- Publication date Jun 1, 2023
- ASM IP HOLDING B.V.
- Ling Chi Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING A TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM...
- Publication number 20230143580
- Publication date May 11, 2023
- ASM IP HOLDING B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITION OF SILICON NITRIDE LAYER USING PRETREATMENT,...
- Publication number 20210225643
- Publication date Jul 22, 2021
- ASM IP Holding B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM...
- Publication number 20210104399
- Publication date Apr 8, 2021
- ASM IP HOLDING B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL PRECURSORS AND METHODS FOR DEPOSITING A SILICON OXIDE FILM...
- Publication number 20190249303
- Publication date Aug 15, 2019
- ASM IP HOLDING B.V.
- Aurélie Kuroda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF SELECTIVELY DEPOSITING A CAPPING LAYER STRUCTURE ON A SEM...
- Publication number 20190148224
- Publication date May 16, 2019
- ASM IP HOLDING B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS

Aurélie Kuroda

Person

Patents Grantslast 30 patents

Method and system for forming a conformal silicon carbon nitride la...

Methods for forming a topographically selective silicon oxide film...

Method of selectively depositing a capping layer structure on a sem...

Processes for preventing oxidation of metal thin films

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR FORMING A CONFORMAL SILICON CARBON NITRIDE LA...

METHODS FOR FORMING A TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM...

METHOD FOR DEPOSITION OF SILICON NITRIDE LAYER USING PRETREATMENT,...

METHODS FOR FORMING A TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM...

CHEMICAL PRECURSORS AND METHODS FOR DEPOSITING A SILICON OXIDE FILM...

METHOD OF SELECTIVELY DEPOSITING A CAPPING LAYER STRUCTURE ON A SEM...