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Shanghai, CN
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last 30 patents
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Patent Grant
Method and structure for self aligned formation of a gate polysilic...
Patent number
7,807,532
Issue date
Oct 5, 2010
Semiconductor Manufacturing International (Shanghai) Corporation
Li Jiang
H01 - BASIC ELECTRIC ELEMENTS
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last 30 patents
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Patent Application
METHOD AND STRUCTURE FOR SELF ALIGNED FORMATION OF A GATE POLYSILIC...
Publication number
20070243685
Publication date
Oct 18, 2007
Semiconductor Manufacturing International (Shanghai) Corporation
Li Jiang
H01 - BASIC ELECTRIC ELEMENTS