Ayako ENDO

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Minato-ku, Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20250147418
- Publication date May 8, 2025
- JSR Corporation
- Naoki NISHIGUCHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20230036031
- Publication date Feb 2, 2023
- JSR Corporation
- Naoki NISHIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20220057714
- Publication date Feb 24, 2022
- JSR Corporation
- Naoki NISHIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING PLATED FORMED PRODUCT
- Publication number 20220035246
- Publication date Feb 3, 2022
- JSR Corporation
- Naoki NISHIGUCHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR