Ayako Ida

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive positive resist composition
- Patent number 5,792,585
- Issue date Aug 11, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive positive resist composition
- Patent number 5,783,355
- Issue date Jul 21, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive positive resist composition comprising an alkal...
- Patent number 5,736,292
- Issue date Apr 7, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyhydric phenol compound and positive resist composition comprisi...
- Patent number 5,714,620
- Issue date Feb 3, 1998
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyhydric phenol compound and positive resist composition comprisi...
- Patent number 5,587,492
- Issue date Dec 24, 1996
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition
- Patent number 5,436,107
- Issue date Jul 25, 1995
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition comprising a quinone diazide sulfonic a...
- Patent number 5,413,895
- Issue date May 9, 1995
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing resist composition
- Patent number 5,368,987
- Issue date Nov 29, 1994
- Sumitomo Chemical Co., Ltd.
- Yukio Hanamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 5,360,696
- Issue date Nov 1, 1994
- Sumitomo Chemical Co., Ltd.
- Yukio Hanamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition comprising an alkal...

Polyhydric phenol compound and positive resist composition comprisi...

Polyhydric phenol compound and positive resist composition comprisi...

Positive resist composition

Positive resist composition comprising a quinone diazide sulfonic a...

Process for producing resist composition

Resist composition