Azeddine Zerrade

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,860,533
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,815,809
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank defect reduction
- Patent number 11,789,358
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank defect reduction methods
- Patent number 11,669,008
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,630,385
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank hard mask materials
- Patent number 11,556,053
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank hard mask materials
- Patent number 11,537,040
- Issue date Dec 27, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask blank absorber defect reduction
- Patent number 11,454,876
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Binni Varghese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,300,871
- Issue date Apr 12, 2022
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EUV Mask Blank Absorber Defect Reduction
- Publication number 20220187696
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Binni Varghese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20210341828
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank Defect Reduction
- Publication number 20210333703
- Publication date Oct 28, 2021
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210302826
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank Hard Mask Materials
- Publication number 20210232040
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Extreme Ultraviolet Mask Blank Hard Mask Materials
- Publication number 20210232041
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210232039
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210232042
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS
- Publication number 20210124252
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS
- Publication number 20210124253
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Azeddine Zerrade

Person

Patents Grantslast 30 patents

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask blank defect reduction

Extreme ultraviolet mask blank defect reduction methods

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask blank hard mask materials

Extreme ultraviolet mask blank hard mask materials

EUV mask blank absorber defect reduction

Extreme ultraviolet mask absorber materials

Patents Applicationslast 30 patents

EUV Mask Blank Absorber Defect Reduction

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Extreme Ultraviolet Mask Blank Defect Reduction

Extreme Ultraviolet Mask Absorber Materials

Extreme Ultraviolet Mask Blank Hard Mask Materials

Extreme Ultraviolet Mask Blank Hard Mask Materials

Extreme Ultraviolet Mask Absorber Materials

Extreme Ultraviolet Mask Absorber Materials

EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS

EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS