Bachir Dirahoui

Person

Mount Kisco, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of charge controlled patterning during reactive ion etching
- Patent number 10,573,526
- Issue date Feb 25, 2020
- International Business Machines Corporation
- Sunit S. Mahajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of charge controlled patterning during reactive ion etching
- Patent number 9,496,148
- Issue date Nov 15, 2016
- International Business Machines Corporation
- Sunit S. Mahajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermally stable high-K tetragonal HFO2 layer within high aspect ra...
- Patent number 9,087,927
- Issue date Jul 21, 2015
- International Business Machines Corporation
- Michael P. Chudzik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermally stable high-K tetragonal HFO2 layer within high aspect ra...
- Patent number 8,901,706
- Issue date Dec 2, 2014
- International Business Machines Corporation
- Michael P. Chudzik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming high performance gates and structures thereof
- Patent number 7,790,553
- Issue date Sep 7, 2010
- International Business Machines Corporation
- Huilong Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring lateral encroachment of spacer process on a C...
- Patent number 7,358,130
- Issue date Apr 15, 2008
- International Business Machines Corporation
- Bachir Dirahoui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring lateral encroachment of spacer process on a C...
- Patent number 7,105,398
- Issue date Sep 12, 2006
- International Business Machines Corporation
- Bachir Dirahoui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Triple layer hard mask for gate patterning to fabricate scaled CMOS...
- Patent number 6,800,530
- Issue date Oct 5, 2004
- International Business Machines Corporation
- Byoung Hun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making a planar integrated circuit interconnect
- Patent number 6,492,259
- Issue date Dec 10, 2002
- International Business Machines Corporation
- Bachir Dirahoui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planar integrated circuit interconnect
- Patent number 6,281,583
- Issue date Aug 28, 2001
- International Business Machines Corporation
- Bachir Dirahoui
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of Charge Controlled Patterning During Reactive ION Etching
- Publication number 20170076951
- Publication date Mar 16, 2017
- International Business Machines Corporation
- Sunit S. Mahajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMALLY STABLE HIGH-K TETRAGONAL HFO2 LAYER WITHIN HIGH ASPECT RA...
- Publication number 20150044853
- Publication date Feb 12, 2015
- International Business Machines Corporation
- Michael P. Chudzik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMALLY STABLE HIGH-K TETRAGONAL HFO2 LAYER WITHIN HIGH ASPECT RA...
- Publication number 20130175665
- Publication date Jul 11, 2013
- International Business Machines Corporation
- Michael P. Chudzik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING HIGH PERFORMANCE GATES AND STRUCTURES THEREOF
- Publication number 20100006926
- Publication date Jan 14, 2010
- International Business Machines Corporation
- HUILONG ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET DEVICES FROM BULK SEMICONDUCTOR AND METHODS FOR MANUFACTURIN...
- Publication number 20090256207
- Publication date Oct 15, 2009
- International Business Machines Corporation
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for monitoring lateral encroachment of spacer process on a C...
- Publication number 20060252197
- Publication date Nov 9, 2006
- International Business Machine Corporation
- Bachir Dirahoui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for monitoring lateral encroachment of spacer process on a C...
- Publication number 20060055393
- Publication date Mar 16, 2006
- International Business Machines Corporation
- Bachir Dirahoui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Triple layer hard mask for gate patterning to fabricate scaled CMOS...
- Publication number 20040259303
- Publication date Dec 23, 2004
- International Business Machines Corporation
- Byoung Hun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRIPLE LAYER HARD MASK FOR GATE PATTERNING TO FABRICATE SCALED CMOS...
- Publication number 20040137672
- Publication date Jul 15, 2004
- International Business Machines Corporation
- Byoung Hun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for making a planar integrated circuit interconnect
- Publication number 20010054766
- Publication date Dec 27, 2001
- Bachir Dirahoui
- H01 - BASIC ELECTRIC ELEMENTS

Bachir Dirahoui

Person

Patents Grantslast 30 patents

Method of charge controlled patterning during reactive ion etching

Method of charge controlled patterning during reactive ion etching

Thermally stable high-K tetragonal HFO2 layer within high aspect ra...

Thermally stable high-K tetragonal HFO2 layer within high aspect ra...

Methods for forming high performance gates and structures thereof

Method for monitoring lateral encroachment of spacer process on a C...

Method for monitoring lateral encroachment of spacer process on a C...

Triple layer hard mask for gate patterning to fabricate scaled CMOS...

Process for making a planar integrated circuit interconnect

Planar integrated circuit interconnect

Patents Applicationslast 30 patents

Method of Charge Controlled Patterning During Reactive ION Etching

THERMALLY STABLE HIGH-K TETRAGONAL HFO2 LAYER WITHIN HIGH ASPECT RA...

THERMALLY STABLE HIGH-K TETRAGONAL HFO2 LAYER WITHIN HIGH ASPECT RA...

METHODS FOR FORMING HIGH PERFORMANCE GATES AND STRUCTURES THEREOF

FINFET DEVICES FROM BULK SEMICONDUCTOR AND METHODS FOR MANUFACTURIN...

Method for monitoring lateral encroachment of spacer process on a C...

Method for monitoring lateral encroachment of spacer process on a C...

Triple layer hard mask for gate patterning to fabricate scaled CMOS...

TRIPLE LAYER HARD MASK FOR GATE PATTERNING TO FABRICATE SCALED CMOS...

Process for making a planar integrated circuit interconnect