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Bahri Ozturk
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Cranberry Township, PA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Capacitor containing high purity tantalum
Patent number
7,102,229
Issue date
Sep 5, 2006
Honeywell International Inc.
Harry Rosenberg
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Tantalum sputtering target and method of manufacture
Patent number
6,958,257
Issue date
Oct 25, 2005
Honeywell International Inc.
Harry Rosenberg
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Tantalum sputtering target and method of manufacture
Patent number
6,955,938
Issue date
Oct 18, 2005
Honeywell International Inc.
Harry Rosenberg
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Tantalum sputtering target and method of manufacture
Patent number
6,566,161
Issue date
May 20, 2003
Honeywell International Inc.
Harry Rosenberg
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Tantalum sputtering target and method of manufacture
Patent number
6,323,055
Issue date
Nov 27, 2001
The Alta Group, Inc.
Harry Rosenberg
B22 - CASTING POWDER METALLURGY
Patents Applications
last 30 patents
Information
Patent Application
Tantalum sputtering target and method of manufacture
Publication number
20050284259
Publication date
Dec 29, 2005
Harry Rosenberg
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Tantalum sputtering target and method of manufacture
Publication number
20050284546
Publication date
Dec 29, 2005
Harry Rosenberg
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Tantalum sputtering target and method of manufacture
Publication number
20030082864
Publication date
May 1, 2003
Harry Rosenberg
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Application
Tantalum sputtering target and method of manufacture
Publication number
20020132388
Publication date
Sep 19, 2002
Harry Rosenberg
C01 - INORGANIC CHEMISTRY