Baiei Kawano

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for forming thin film using upstream and downs...
- Patent number 7,408,225
- Issue date Aug 5, 2008
- ASM Japan K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual-chamber plasma processing apparatus
- Patent number 7,381,291
- Issue date Jun 3, 2008
- ASM Japan K.K.
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor-processing apparatus provided with susceptor and plac...
- Patent number 7,276,123
- Issue date Oct 2, 2007
- ASM Japan K.K.
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin-film deposition apparatus
- Patent number 7,267,725
- Issue date Sep 11, 2007
- ASM Japan K.K.
- Baiei Kawano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of film deposition using single-wafer-processing type CVD
- Patent number 6,921,556
- Issue date Jul 26, 2005
- ASM Japan K.K.
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Dual-chamber plasma processing apparatus
- Publication number 20060021701
- Publication date Feb 2, 2006
- ASM JAPAN K.K.
- Yasuhiro Tobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for forming thin film using upstream and downs...
- Publication number 20050208217
- Publication date Sep 22, 2005
- ASM JAPAN K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for single-wafer-processing type CVD
- Publication number 20050098111
- Publication date May 12, 2005
- ASM JAPAN K.K.
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor-processing apparatus provided with susceptor and plac...
- Publication number 20050022737
- Publication date Feb 3, 2005
- ASM JAPAN K.K.
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin-film deposition apparatus
- Publication number 20040221808
- Publication date Nov 11, 2004
- ASM JAPAN K.K.
- Baiei Kawano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for single-wafer-processing type CVD
- Publication number 20040071874
- Publication date Apr 15, 2004
- ASM JAPAN K.K.
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Baiei Kawano

Person

Patents Grantslast 30 patents

Apparatus and method for forming thin film using upstream and downs...

Dual-chamber plasma processing apparatus

Semiconductor-processing apparatus provided with susceptor and plac...

Thin-film deposition apparatus

Method of film deposition using single-wafer-processing type CVD

Patents Applicationslast 30 patents

Dual-chamber plasma processing apparatus

Apparatus and method for forming thin film using upstream and downs...

Apparatus for single-wafer-processing type CVD

Semiconductor-processing apparatus provided with susceptor and plac...

Thin-film deposition apparatus

Apparatus and method for single-wafer-processing type CVD