BangChing Ho

Person

Toyama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming resist overlayer film for EUV lithography
- Patent number 11,675,269
- Issue date Jun 13, 2023
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming resist underlayer film with reduced outgassing
- Patent number 10,437,150
- Issue date Oct 8, 2019
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer-containing developer
- Patent number 9,753,369
- Issue date Sep 5, 2017
- NISSAN CHEMICAL IDUSTRIES, LTD.
- Rikimaru Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing EUV resist underlayer film-forming composition i...
- Patent number 9,627,217
- Issue date Apr 18, 2017
- Nissan Chemical Industries, Ltd.
- Shuhei Shigaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist overlayer film forming composition for lithography and metho...
- Patent number 9,494,864
- Issue date Nov 15, 2016
- Nissan Chemical Industries, Ltd.
- Ryuji Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition for EUV lithography cont...
- Patent number 9,240,327
- Issue date Jan 19, 2016
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming resist underlayer film for EUV lithography
- Patent number 9,005,873
- Issue date Apr 14, 2015
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film forming composition, and method for forming...
- Patent number 8,722,840
- Issue date May 13, 2014
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHO...
- Publication number 20150248057
- Publication date Sep 3, 2015
- Nissan Chemical Industries, Ltd.
- Ryuji Ohnishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION I...
- Publication number 20150079792
- Publication date Mar 19, 2015
- Nissan Chemical Industries, Ltd.
- Shuhei Shigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR EUV LITHOGRAPHY CONT...
- Publication number 20140170567
- Publication date Jun 19, 2014
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY
- Publication number 20140099791
- Publication date Apr 10, 2014
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER-CONTAINING DEVELOPER
- Publication number 20140038415
- Publication date Feb 6, 2014
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION, AND METHOD FOR FORMING...
- Publication number 20130230809
- Publication date Sep 5, 2013
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST OVERLAYER FILM FOR EUV LITHOGRAPHY
- Publication number 20130209940
- Publication date Aug 15, 2013
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM
- Publication number 20120251955
- Publication date Oct 4, 2012
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY
- Publication number 20120040291
- Publication date Feb 16, 2012
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH REDUCED OUTGASSING
- Publication number 20110230058
- Publication date Sep 22, 2011
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20110117746
- Publication date May 19, 2011
- Nissan Chemical Industries, Ltd.
- Daisuke Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

BangChing Ho

Person

Patents Grantslast 30 patents

Composition for forming resist overlayer film for EUV lithography

Composition for forming resist underlayer film with reduced outgassing

Polymer-containing developer

Silicon-containing EUV resist underlayer film-forming composition i...

Resist overlayer film forming composition for lithography and metho...

Resist underlayer film-forming composition for EUV lithography cont...

Composition for forming resist underlayer film for EUV lithography

Resist underlayer film forming composition, and method for forming...

Patents Applicationslast 30 patents

RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHO...

SILICON-CONTAINING EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION I...

RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR EUV LITHOGRAPHY CONT...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY

POLYMER-CONTAINING DEVELOPER

RESIST UNDERLAYER FILM FORMING COMPOSITION, AND METHOD FOR FORMING...

COMPOSITION FOR FORMING RESIST OVERLAYER FILM FOR EUV LITHOGRAPHY

COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH REDUCED OUTGASSING

COATING COMPOSITION AND PATTERN FORMING METHOD