Barbara L. Cox

Person

West Roxbury, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electronic devices having bilayer capping layers and/or barrier layers
- Patent number 11,599,210
- Issue date Mar 7, 2023
- Materion Newton, Inc.
- Helia Jalili
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Current-induced dark layer formation for metallization in electroni...
- Patent number 11,327,587
- Issue date May 10, 2022
- H.C. Starck Inc.
- Helia Jalili
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sputtering targets and devices including Mo, Nb, and Ta, and methods
- Patent number 11,306,388
- Issue date Apr 19, 2022
- H.C. Starck Inc.
- Shuwei Sun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electronic devices having bilayer capping layers and/or barrier layers
- Patent number 11,281,317
- Issue date Mar 22, 2022
- H.C. Starck Inc.
- Helia Jalili
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electronic devices having bilayer capping layers and/or barrier layers
- Patent number 10,877,582
- Issue date Dec 29, 2020
- H.C. Starck Inc.
- Helia Jalili
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Current-induced dark layer formation for metallization in electroni...
- Patent number 10,739,879
- Issue date Aug 11, 2020
- H.C. Starck Inc.
- Helia Jalili
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electronic devices having bilayer capping layers and/or barrier layers
- Patent number 10,558,284
- Issue date Feb 11, 2020
- H.C. Starck Inc.
- Helia Jalili
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electronic devices having bilayer capping layers and/or barrier layers
- Patent number 10,401,994
- Issue date Sep 3, 2019
- H.C. Starck Inc.
- Helia Jalili
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tantalum and tantalum nitride powder mixtures for electrolytic capa...
- Patent number 6,716,389
- Issue date Apr 6, 2004
- H.C. Starck Inc.
- Terrance B. Tripp
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Tantalum and tantalum nitride powder mixtures for electrolytic capa...
- Patent number 6,554,884
- Issue date Apr 29, 2003
- H. C. Starck, Inc.
- Terrance B. Tripp
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
SPUTTERING TARGETS AND DEVICES INCLUDING MO, NB, AND TA, AND METHODS
- Publication number 20220220603
- Publication date Jul 14, 2022
- H.C. Starck Inc.
- Shuwei Sun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS
- Publication number 20220221950
- Publication date Jul 14, 2022
- H.C. Starck Inc.
- Helia JALILI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS
- Publication number 20210149508
- Publication date May 20, 2021
- H.C. Starck Inc.
- Helia JALILI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CURRENT-INDUCED DARK LAYER FORMATION FOR METALLIZATION IN ELECTRONI...
- Publication number 20200401248
- Publication date Dec 24, 2020
- H.C. Starck Inc.
- Helia JALILI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS
- Publication number 20200218374
- Publication date Jul 9, 2020
- H.C. Starck Inc.
- Helia JALILI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS
- Publication number 20200012361
- Publication date Jan 9, 2020
- H.C. Starck Inc.
- Helia JALILI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODS
- Publication number 20190066987
- Publication date Feb 28, 2019
- H.C. Starck Inc.
- Shuwei Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS
- Publication number 20180204877
- Publication date Jul 19, 2018
- Helia JALILI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CURRENT-INDUCED DARK LAYER FORMATION FOR METALLIZATION IN ELECTRONI...
- Publication number 20180203536
- Publication date Jul 19, 2018
- Helia JALILI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODS
- Publication number 20160203960
- Publication date Jul 14, 2016
- H.C. Starck Inc.
- Shuwei Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tantalum and tantalum nitride powder mixtures for electrolytic capa...
- Publication number 20030126944
- Publication date Jul 10, 2003
- H.C. Starck, Inc.
- Terrance B. Tripp
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Barbara L. Cox

Person

Patents Grantslast 30 patents

Electronic devices having bilayer capping layers and/or barrier layers

Current-induced dark layer formation for metallization in electroni...

Sputtering targets and devices including Mo, Nb, and Ta, and methods

Electronic devices having bilayer capping layers and/or barrier layers

Electronic devices having bilayer capping layers and/or barrier layers

Current-induced dark layer formation for metallization in electroni...

Electronic devices having bilayer capping layers and/or barrier layers

Electronic devices having bilayer capping layers and/or barrier layers

Tantalum and tantalum nitride powder mixtures for electrolytic capa...

Tantalum and tantalum nitride powder mixtures for electrolytic capa...

Patents Applicationslast 30 patents

SPUTTERING TARGETS AND DEVICES INCLUDING MO, NB, AND TA, AND METHODS

ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS

ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS

CURRENT-INDUCED DARK LAYER FORMATION FOR METALLIZATION IN ELECTRONI...

ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS

ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS

SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODS

ELECTRONIC DEVICES HAVING BILAYER CAPPING LAYERS AND/OR BARRIER LAYERS

CURRENT-INDUCED DARK LAYER FORMATION FOR METALLIZATION IN ELECTRONI...

SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODS

Tantalum and tantalum nitride powder mixtures for electrolytic capa...