Bassam Hanna Abraham

Person

Millis, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 11,821,068
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering a layer on a substrate using a high-energy density plasm...
- Patent number 11,823,859
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrically and magnetically enhanced ionized physical vapor depos...
- Patent number 11,482,404
- Issue date Oct 25, 2022
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrically and magnetically enhanced ionized physical vapor depos...
- Patent number 11,359,274
- Issue date Jun 14, 2022
- IonQuestCorp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced low temperature-high density plasma-chemical...
- Patent number 11,306,391
- Issue date Apr 19, 2022
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 11,286,555
- Issue date Mar 29, 2022
- IonQuest Corp.
- Bassam Hanna Abraham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrically and magnetically enhanced ionized physical vapor depos...
- Patent number 11,255,012
- Issue date Feb 22, 2022
- IonQuest Corp.
- Bassam Hanna Abraham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 10,957,519
- Issue date Mar 23, 2021
- IonQuest Corp.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 10,913,998
- Issue date Feb 9, 2021
- IonQuestCorp.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced low temperature-high density plasma-chemical...
- Patent number 10,900,118
- Issue date Jan 26, 2021
- IonQuest Corp.
- Bassam Hanna Abraham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupled plasma source for sputtering and resputtering
- Patent number 10,480,063
- Issue date Nov 19, 2019
- IonQuest Corp.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 10,227,692
- Issue date Mar 12, 2019
- IONQUEST LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced low temperature-high density plasma-chemical...
- Patent number 10,227,691
- Issue date Mar 12, 2019
- IONQUEST LLC
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 9,951,414
- Issue date Apr 24, 2018
- IONQUEST LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of ionized physical vapor desposition sputter coating high a...
- Patent number 9,771,648
- Issue date Sep 26, 2017
- Zond, Inc.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for sputtering hard coatings
- Patent number 9,123,508
- Issue date Sep 1, 2015
- Zond, LLC
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for generating strongly-ionized plasmas with...
- Patent number 7,898,183
- Issue date Mar 1, 2011
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for generating strongly-ionized plasmas with...
- Patent number 7,663,319
- Issue date Feb 16, 2010
- Zond, Inc.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...
- Publication number 20230005724
- Publication date Jan 5, 2023
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRICALLY AND MAGNETICALLY ENHANCED IONIZED PHYSICAL VAPOR DEPOS...
- Publication number 20220259719
- Publication date Aug 18, 2022
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...
- Publication number 20220195585
- Publication date Jun 23, 2022
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...
- Publication number 20220042168
- Publication date Feb 10, 2022
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...
- Publication number 20210317569
- Publication date Oct 14, 2021
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...
- Publication number 20210115552
- Publication date Apr 22, 2021
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...
- Publication number 20210115553
- Publication date Apr 22, 2021
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetically Enhanced Low Temperature-High Density Plasma-Chemical...
- Publication number 20210102284
- Publication date Apr 8, 2021
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-POWER RESONANCE PULSE AC HEDP SPUTTERING SOURCE AND METHOD FOR...
- Publication number 20200176234
- Publication date Jun 4, 2020
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRICALLY AND MAGNETICALLY ENHANCED IONIZED PHYSICAL VAPOR DEPOS...
- Publication number 20190316249
- Publication date Oct 17, 2019
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...
- Publication number 20190271070
- Publication date Sep 5, 2019
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...
- Publication number 20190256969
- Publication date Aug 22, 2019
- IonQuest Corp.
- Roman CHISTYAKOV
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETICALLY ENHANCED LOW TEMPERATURE-HIGH DENSITY PLASMA-CHEMICAL...
- Publication number 20190249293
- Publication date Aug 15, 2019
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...
- Publication number 20180374688
- Publication date Dec 27, 2018
- IonQuest LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...
- Publication number 20180374689
- Publication date Dec 27, 2018
- IonQuest LLC
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...
- Publication number 20180195164
- Publication date Jul 12, 2018
- IonQuest LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS
- Publication number 20180044780
- Publication date Feb 15, 2018
- Zond, LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETICALLY ENHANCED LOW TEMPERATURE-HIGH DENSITY PLASMA-CHEMICAL...
- Publication number 20170175248
- Publication date Jun 22, 2017
- IonQuest LLC
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...
- Publication number 20170178878
- Publication date Jun 22, 2017
- IonQuest LLC
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...
- Publication number 20170175253
- Publication date Jun 22, 2017
- IonQuest LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Capacitive Coupled Plasma Source for Sputtering and Resputtering
- Publication number 20170178912
- Publication date Jun 22, 2017
- IonQuest LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF COATING HIGH ASPECT RATIO FEATURES
- Publication number 20170029937
- Publication date Feb 2, 2017
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS
- Publication number 20150315697
- Publication date Nov 5, 2015
- Zond, LLC
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus For Generating Strongly-Ionized Plasmas With...
- Publication number 20110133651
- Publication date Jun 9, 2011
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Generating Strongly-Ionized Plasmas with...
- Publication number 20100101935
- Publication date Apr 29, 2010
- ZOND, INC.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Hard Coating a Blade
- Publication number 20090321249
- Publication date Dec 31, 2009
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR GENERATING STRONGLY-IONIZED PLASMAS WITH...
- Publication number 20070188104
- Publication date Aug 16, 2007
- ZOND, INC.
- Roman Chistyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source With Segmented Magnetron
- Publication number 20070181417
- Publication date Aug 9, 2007
- ZOND, INC.
- Roman Chistyakov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Bassam Hanna Abraham

Person

Patents Grantslast 30 patents

Magnetically enhanced high density plasma-chemical vapor deposition...

Sputtering a layer on a substrate using a high-energy density plasm...

Electrically and magnetically enhanced ionized physical vapor depos...

Electrically and magnetically enhanced ionized physical vapor depos...

Magnetically enhanced low temperature-high density plasma-chemical...

Magnetically enhanced high density plasma-chemical vapor deposition...

Electrically and magnetically enhanced ionized physical vapor depos...

Magnetically enhanced high density plasma-chemical vapor deposition...

Magnetically enhanced high density plasma-chemical vapor deposition...

Magnetically enhanced low temperature-high density plasma-chemical...

Capacitive coupled plasma source for sputtering and resputtering

Magnetically enhanced high density plasma-chemical vapor deposition...

Magnetically enhanced low temperature-high density plasma-chemical...

Magnetically enhanced high density plasma-chemical vapor deposition...

Method of ionized physical vapor desposition sputter coating high a...

Apparatus and method for sputtering hard coatings

Methods and apparatus for generating strongly-ionized plasmas with...

Methods and apparatus for generating strongly-ionized plasmas with...

Patents Applicationslast 30 patents

Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...

ELECTRICALLY AND MAGNETICALLY ENHANCED IONIZED PHYSICAL VAPOR DEPOS...

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition...

Magnetically Enhanced Low Temperature-High Density Plasma-Chemical...

HIGH-POWER RESONANCE PULSE AC HEDP SPUTTERING SOURCE AND METHOD FOR...

ELECTRICALLY AND MAGNETICALLY ENHANCED IONIZED PHYSICAL VAPOR DEPOS...

Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...

MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...

MAGNETICALLY ENHANCED LOW TEMPERATURE-HIGH DENSITY PLASMA-CHEMICAL...

MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...

Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...

MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...

APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS

MAGNETICALLY ENHANCED LOW TEMPERATURE-HIGH DENSITY PLASMA-CHEMICAL...

Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...

MAGNETICALLY ENHANCED HIGH DENSITY PLASMA-CHEMICAL VAPOR DEPOSITION...

Capacitive Coupled Plasma Source for Sputtering and Resputtering

METHOD OF COATING HIGH ASPECT RATIO FEATURES

APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS

Methods And Apparatus For Generating Strongly-Ionized Plasmas With...

Methods and Apparatus for Generating Strongly-Ionized Plasmas with...

Method of Hard Coating a Blade

METHODS AND APPARATUS FOR GENERATING STRONGLY-IONIZED PLASMAS WITH...

Plasma Source With Segmented Magnetron