Bastiaan Onne Fagginger Auer

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method of calibrating a plurality of metrology apparatuses, method...
- Patent number 11,556,060
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Seyed Iman Mossavat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 11,526,085
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a parameter of interest using im...
- Patent number 10,983,445
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 10,739,687
- Issue date Aug 11, 2020
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus, lithographic system, and method of measuring a...
- Patent number 10,599,047
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Janneke Ravensbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optimizing a metrology process
- Patent number 10,585,354
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining an optimal focus height for a metrology appar...
- Patent number 10,571,363
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beat patterns for alignment on small metrology targets
- Patent number 10,488,768
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Bastiaan Onne Fagginger Auer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 10,394,135
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Method for monitoring a characteristic of illumination from a metro...
- Patent number 10,317,805
- Issue date Jun 11, 2019
- ASML Netherlands B.V.
- Jolanda Theodora Josephina Schmetz-Schagen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 10,162,271
- Issue date Dec 25, 2018
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MAPPING METRICS BETWEEN MANUFACTURING SYSTEMS
- Publication number 20230288815
- Publication date Sep 14, 2023
- ASML NETHERLANDS B.V.
- Siebe Tjerk DE ZWART
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...
- Publication number 20200379359
- Publication date Dec 3, 2020
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G01 - MEASURING TESTING
Information Patent Application
Method of Calibrating a Plurality of Metrology Apparatuses, Method...
- Publication number 20200110341
- Publication date Apr 9, 2020
- ASML NETHERLANDS B.V.
- Seyed Iman MOSSAVAT
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...
- Publication number 20190250094
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...
- Publication number 20190242782
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPTIMIZING A METROLOGY PROCESS
- Publication number 20190243253
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Anagnostis TSIATMAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESSING DATA, METHOD OF OBTAINING CALIBRATION DATA
- Publication number 20190204180
- Publication date Jul 4, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...
- Publication number 20190094712
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAT PATTERNS FOR ALIGNMENT ON SMALL METROLOGY TARGETS
- Publication number 20190072860
- Publication date Mar 7, 2019
- ASML NETHERLANDS B.V.
- Bastiaan Onne FAGGINGER AUER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus, Lithographic System, And Method Of Measuring A...
- Publication number 20180348645
- Publication date Dec 6, 2018
- ASML NETHERLANDS B.V.
- Janneke Ravensbergen
- G01 - MEASURING TESTING
Information Patent Application
Method for Monitoring a Characteristic of Illumination From a Metro...
- Publication number 20180173113
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Jolanda Theodora Josephina SCHMETZ-SCHAGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20180129140
- Publication date May 10, 2018
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G01 - MEASURING TESTING

Bastiaan Onne Fagginger Auer

Person

Patents Grantslast 30 patents

Method of calibrating a plurality of metrology apparatuses, method...

Metrology method and apparatus, substrate, lithographic system and...

Method and apparatus for measuring a parameter of interest using im...

Metrology method and apparatus, substrate, lithographic system and...

Metrology apparatus, lithographic system, and method of measuring a...

Method of optimizing a metrology process

Method of determining an optimal focus height for a metrology appar...

Beat patterns for alignment on small metrology targets

Method and apparatus for measuring a parameter of a lithographic pr...

Method for monitoring a characteristic of illumination from a metro...

Metrology method and apparatus, substrate, lithographic system and...

Patents Applicationslast 30 patents

MAPPING METRICS BETWEEN MANUFACTURING SYSTEMS

METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...

Method of Calibrating a Plurality of Metrology Apparatuses, Method...

METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...

METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...

METHOD OF OPTIMIZING A METROLOGY PROCESS

METHOD OF PROCESSING DATA, METHOD OF OBTAINING CALIBRATION DATA

METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...

BEAT PATTERNS FOR ALIGNMENT ON SMALL METROLOGY TARGETS

Metrology Apparatus, Lithographic System, And Method Of Measuring A...

Method for Monitoring a Characteristic of Illumination From a Metro...

Method and Apparatus for Measuring a Parameter of a Lithographic Pr...