Bastiaan Theodoor Wolschrijn

Person

Abcoude, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for removing a contamination layer from an optical surface a...
- Patent number 8,980,009
- Issue date Mar 17, 2015
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Grant
Lithographic apparatus comprising an internal sensor and a mini-rea...
- Patent number 8,928,855
- Issue date Jan 6, 2015
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,585,224
- Issue date Nov 19, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element with at least one electrically conductive region, a...
- Patent number 8,553,200
- Issue date Oct 8, 2013
- Carl Zeiss SMT GmbH
- Bastiaan Theodoor Wolschrijn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing a contamination layer from an optical surface a...
- Patent number 8,419,862
- Issue date Apr 16, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,382,301
- Issue date Feb 26, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for removing contamination on optical surfaces and optical a...
- Patent number 8,279,397
- Issue date Oct 2, 2012
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement and EUV lithography device with at least one he...
- Patent number 7,959,310
- Issue date Jun 14, 2011
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical apparatus, lithographic apparatus and device manufacturing...
- Patent number 7,935,218
- Issue date May 3, 2011
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, and device manufacturing method
- Patent number 7,928,412
- Issue date Apr 19, 2011
- ASML Netherlands B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radical cleaning arrangement for a lithographic apparatus
- Patent number 7,812,330
- Issue date Oct 12, 2010
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for radiation in the EUV-wavelength range and method...
- Patent number 7,763,870
- Issue date Jul 27, 2010
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic device, device manufacturing method and device manufac...
- Patent number 7,684,012
- Issue date Mar 23, 2010
- ASML Netherlands B.V.
- Johannes Henricus Wilhelmus Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method, apparatus and cleaning system
- Patent number 7,671,347
- Issue date Mar 2, 2010
- ASML Netherlands B.V.
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, and device manufacturing method
- Patent number 7,629,594
- Issue date Dec 8, 2009
- ASML Netherlands B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, system and device manufacturing method
- Patent number 7,491,951
- Issue date Feb 17, 2009
- ASML Netherlands B.V.
- Marc Hubertus Lorenz Van Der Velden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radical cleaning arrangement for a lithographic apparatus
- Patent number 7,462,850
- Issue date Dec 9, 2008
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having a monitoring device for detecting con...
- Patent number 7,405,417
- Issue date Jul 29, 2008
- ASML Netherlands B.V.
- Lucas Henricus Johannes Stevens
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,279,690
- Issue date Oct 9, 2007
- ASML Netherlands B.V.
- Levinus Pieter Bakker
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE A...
- Publication number 20130186430
- Publication date Jul 25, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...
- Publication number 20130148200
- Publication date Jun 13, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHIC APPARATUS COMPRISING AN INTERNAL SENSOR AND A MINI-REA...
- Publication number 20110037961
- Publication date Feb 17, 2011
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for removing a contamination layer from an optical surface a...
- Publication number 20100288302
- Publication date Nov 18, 2010
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
OPTICAL ELEMENT WITH AT LEAST ONE ELECTRICALLY CONDUCTIVE REGION, A...
- Publication number 20100231877
- Publication date Sep 16, 2010
- Carl Zeiss SMT AG
- Bastiaan Theodoor Wolschrijn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING CONTAMINATION ON OPTICAL SURFACES AND OPTICAL A...
- Publication number 20090314931
- Publication date Dec 24, 2009
- Carl Zeiss SMT AG
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...
- Publication number 20090231707
- Publication date Sep 17, 2009
- Carl Zeiss SMT AG
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic Apparatus, and Device Manufacturing Method
- Publication number 20090173360
- Publication date Jul 9, 2009
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus VAN HERPEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radical cleaning arrangement for a lithographic apparatus
- Publication number 20090072168
- Publication date Mar 19, 2009
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and method
- Publication number 20080151201
- Publication date Jun 26, 2008
- ASML NETHERLANDS B.V.
- Arnoldus Jan Storm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HE...
- Publication number 20080143981
- Publication date Jun 19, 2008
- Carl Zeis SMT AG
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
Cleaning method, apparatus and cleaning system
- Publication number 20080083878
- Publication date Apr 10, 2008
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, and device manufacturing method
- Publication number 20080083885
- Publication date Apr 10, 2008
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical apparatus, lithographic apparatus and device manufacturing...
- Publication number 20070158579
- Publication date Jul 12, 2007
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, system and device manufacturing method
- Publication number 20070146660
- Publication date Jun 28, 2007
- ASML NETHERLANDS B.V.
- Marc Hubertus Lorenz Van Der Velden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radical cleaning arrangement for a lithographic apparatus
- Publication number 20070145295
- Publication date Jun 28, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus having a monitoring device for detecting con...
- Publication number 20070138414
- Publication date Jun 21, 2007
- ASML NETHERLANDS B.V.
- Lucas Henricus Johannes Stevens
- G01 - MEASURING TESTING
Information Patent Application
Lithographic projection apparatus, device manufacturing method and...
- Publication number 20070085984
- Publication date Apr 19, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060219950
- Publication date Oct 5, 2006
- ASML NETHERLANDS B.V.
- Levinus Pieter Bakker
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and device for measuring contamination of a surface of a com...
- Publication number 20040227102
- Publication date Nov 18, 2004
- ASML NETHERLANDS B.V.
- Ralph Kurt
- G01 - MEASURING TESTING

Bastiaan Theodoor Wolschrijn

Person

Patents Grantslast 30 patents

Method for removing a contamination layer from an optical surface a...

Lithographic apparatus comprising an internal sensor and a mini-rea...

Optical arrangement, in particular projection exposure apparatus fo...

Optical element with at least one electrically conductive region, a...

Method for removing a contamination layer from an optical surface a...

Optical arrangement, in particular projection exposure apparatus fo...

Method for removing contamination on optical surfaces and optical a...

Optical arrangement and EUV lithography device with at least one he...

Optical apparatus, lithographic apparatus and device manufacturing...

Lithographic apparatus, and device manufacturing method

Radical cleaning arrangement for a lithographic apparatus

Optical system for radiation in the EUV-wavelength range and method...

Lithographic device, device manufacturing method and device manufac...

Cleaning method, apparatus and cleaning system

Lithographic apparatus, and device manufacturing method

Lithographic apparatus, system and device manufacturing method

Radical cleaning arrangement for a lithographic apparatus

Lithographic apparatus having a monitoring device for detecting con...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE A...

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...

LITHOGRAPHIC APPARATUS COMPRISING AN INTERNAL SENSOR AND A MINI-REA...

Method for removing a contamination layer from an optical surface a...

OPTICAL ELEMENT WITH AT LEAST ONE ELECTRICALLY CONDUCTIVE REGION, A...

METHOD FOR REMOVING CONTAMINATION ON OPTICAL SURFACES AND OPTICAL A...

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...

Lithographic Apparatus, and Device Manufacturing Method

Radical cleaning arrangement for a lithographic apparatus

Lithographic apparatus and method

OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HE...

Cleaning method, apparatus and cleaning system

Lithographic apparatus, and device manufacturing method

Optical apparatus, lithographic apparatus and device manufacturing...

Lithographic apparatus, system and device manufacturing method

Radical cleaning arrangement for a lithographic apparatus

Lithographic apparatus having a monitoring device for detecting con...

Lithographic projection apparatus, device manufacturing method and...

Lithographic apparatus and device manufacturing method

Method and device for measuring contamination of a surface of a com...