Ben-Li Sheu

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Light-emitting diode display pixels with microlens stacks over ligh...
- Patent number 11,757,074
- Issue date Sep 12, 2023
- Apple Inc.
- Jaein Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping control of metal nitride films
- Patent number 11,587,829
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping control of metal nitride films
- Patent number 10,910,263
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of ALD copper with high temperature PVD copper depositi...
- Patent number 10,892,186
- Issue date Jan 12, 2021
- Applied Materials, Inc.
- Ben-Li Sheu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Seed layers for copper interconnects
- Patent number 10,847,463
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Zhiyuan Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt manganese vapor phase deposition
- Patent number 10,665,542
- Issue date May 26, 2020
- Applied Materials, Inc.
- Sang Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for asymmetric deposition of metal on high aspect ratio nan...
- Patent number 10,636,655
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Ben-Li Sheu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doping control of metal nitride films
- Patent number 10,431,493
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors of manganese and manganese-based compounds for copper di...
- Patent number 10,283,352
- Issue date May 7, 2019
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doping control of metal nitride films
- Patent number 10,008,412
- Issue date Jun 26, 2018
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of depositing cobalt manganese films
- Patent number 9,953,926
- Issue date Apr 24, 2018
- Applied Materials, Inc.
- Sang Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursors of manganese and manganese-based compounds for copper di...
- Patent number 9,916,975
- Issue date Mar 13, 2018
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doping control of metal nitride films
- Patent number 9,659,814
- Issue date May 23, 2017
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wiggling control for pseudo-hardmask
- Patent number 8,470,126
- Issue date Jun 25, 2013
- Lam Research Corporation
- Ben-Li Sheu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing line width roughness with plasma pre-etch treat...
- Patent number 8,329,585
- Issue date Dec 11, 2012
- Lam Research Corporation
- Ben-Li Sheu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wiggling control for pseudo-hardmask
- Patent number 8,304,262
- Issue date Nov 6, 2012
- Lam Research Corporation
- Ben-Li Sheu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Light-Emitting Diode Display Pixels with Microlens Stacks over Ligh...
- Publication number 20210391513
- Publication date Dec 16, 2021
- Apple Inc.
- Jaein Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Doping Control of Metal Nitride Films
- Publication number 20210159118
- Publication date May 27, 2021
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ASYMMETRIC DEPOSITION OF METAL ON HIGH AS...
- Publication number 20200219720
- Publication date Jul 9, 2020
- Applied Materials, Inc.
- BEN-LI SHEU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPING CONTROL OF METAL NITRIDE FILMS
- Publication number 20190378754
- Publication date Dec 12, 2019
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ASYMMETRIC DEPOSITION OF METAL ON HIGH AS...
- Publication number 20190287791
- Publication date Sep 19, 2019
- BEN-LI SHEU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integration Of ALD Copper With High Temperature PVD Copper Depositi...
- Publication number 20190115254
- Publication date Apr 18, 2019
- Applied Materials, Inc.
- Ben-Li Sheu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEED LAYERS FOR COPPER INTERCONNECTS
- Publication number 20190067201
- Publication date Feb 28, 2019
- Applied Materials, Inc.
- Zhiyuan WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Doping Control of Metal Nitride Films
- Publication number 20180277428
- Publication date Sep 27, 2018
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cobalt Manganese Vapor Phase Deposition
- Publication number 20180240755
- Publication date Aug 23, 2018
- Applied Materials, Inc.
- Sang Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Precursors Of Manganese And Manganese-Based Compounds For Copper Di...
- Publication number 20180204721
- Publication date Jul 19, 2018
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Doping Control of Metal Nitride Films
- Publication number 20170256448
- Publication date Sep 7, 2017
- Applied Materials, Inc.
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Precursors Of Manganese And Manganese-Based Compounds For Copper Di...
- Publication number 20160181150
- Publication date Jun 23, 2016
- Applied Materials, Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGH-PUT AND LOW TEMPERATURE ALD COPPER DEPOSITION AND INTE...
- Publication number 20160032455
- Publication date Feb 4, 2016
- Applied Materials, Inc.
- Feng Q. Liu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Cobalt Manganese Vapor Phase Deposition
- Publication number 20150194384
- Publication date Jul 9, 2015
- Applied Materials, Inc.
- Sang Ho Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Doping Control of Metal Nitride Films
- Publication number 20140220772
- Publication date Aug 7, 2014
- Annamalai Lakshmanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIGGLING CONTROL FOR PSEUDO-HARDMASK
- Publication number 20130020026
- Publication date Jan 24, 2013
- LAM RESEARCH CORPORATION
- Ben-Li Sheu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIGGLING CONTROL FOR PSEUDO-HARDMASK
- Publication number 20120214310
- Publication date Aug 23, 2012
- LAM RESEARCH CORPORATION
- Ben-Li Sheu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING LINE WIDTH ROUGHNESS WITH PLASMA PRE-ETCH TREAT...
- Publication number 20110117749
- Publication date May 19, 2011
- LAM RESEARCH CORPORATION
- Ben-Li SHEU
- H01 - BASIC ELECTRIC ELEMENTS

Ben-Li Sheu

Person

Patents Grantslast 30 patents

Light-emitting diode display pixels with microlens stacks over ligh...

Doping control of metal nitride films

Doping control of metal nitride films

Integration of ALD copper with high temperature PVD copper depositi...

Seed layers for copper interconnects

Cobalt manganese vapor phase deposition

Methods for asymmetric deposition of metal on high aspect ratio nan...

Doping control of metal nitride films

Precursors of manganese and manganese-based compounds for copper di...

Doping control of metal nitride films

Methods of depositing cobalt manganese films

Precursors of manganese and manganese-based compounds for copper di...

Doping control of metal nitride films

Wiggling control for pseudo-hardmask

Method for reducing line width roughness with plasma pre-etch treat...

Wiggling control for pseudo-hardmask

Patents Applicationslast 30 patents

Light-Emitting Diode Display Pixels with Microlens Stacks over Ligh...

Doping Control of Metal Nitride Films

APPARATUS AND METHODS FOR ASYMMETRIC DEPOSITION OF METAL ON HIGH AS...

DOPING CONTROL OF METAL NITRIDE FILMS

APPARATUS AND METHODS FOR ASYMMETRIC DEPOSITION OF METAL ON HIGH AS...

Integration Of ALD Copper With High Temperature PVD Copper Depositi...

SEED LAYERS FOR COPPER INTERCONNECTS

Doping Control of Metal Nitride Films

Cobalt Manganese Vapor Phase Deposition

Precursors Of Manganese And Manganese-Based Compounds For Copper Di...

Doping Control of Metal Nitride Films

Precursors Of Manganese And Manganese-Based Compounds For Copper Di...

HIGH THROUGH-PUT AND LOW TEMPERATURE ALD COPPER DEPOSITION AND INTE...

Cobalt Manganese Vapor Phase Deposition

Doping Control of Metal Nitride Films

WIGGLING CONTROL FOR PSEUDO-HARDMASK

WIGGLING CONTROL FOR PSEUDO-HARDMASK

METHOD FOR REDUCING LINE WIDTH ROUGHNESS WITH PLASMA PRE-ETCH TREAT...