Benjamen Michael Rathsack

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 12,165,870
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facilitation of spin-coat planarization over feature topography dur...
- Patent number 10,622,267
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Ryan L. Burns
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and techniques to use with photosensitized chemically ampli...
- Patent number 10,534,266
- Issue date Jan 14, 2020
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-sensitized chemically amplified resist (PS-CAR) simulation
- Patent number 10,429,745
- Issue date Oct 1, 2019
- Osaka University
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Subtractive methods for creating dielectric isolation structures wi...
- Patent number 10,170,354
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 10,020,195
- Issue date Jul 10, 2018
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of grapho-epitaxial directed self-assembly applications to prec...
- Patent number 9,793,137
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlling cleaning of a layer on a substrate using nozzles
- Patent number 9,735,026
- Issue date Aug 15, 2017
- Tokyo Electron Limited
- Ian J. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of topography to direct assembly of block copolymers in grapho-...
- Patent number 9,715,172
- Issue date Jul 25, 2017
- Tokyo Electron Limited
- Benjamen M. Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate backside texturing
- Patent number 9,711,419
- Issue date Jul 18, 2017
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using sub-resolution openings to aid in image reversal, directed se...
- Patent number 9,633,847
- Issue date Apr 25, 2017
- Tokyo Electron Limited
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and techniques to use with photosensitized chemically ampli...
- Patent number 9,618,848
- Issue date Apr 11, 2017
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integration of absorption based heating bake methods into a photoli...
- Patent number 9,613,801
- Issue date Apr 4, 2017
- Tokyo Electron Limited
- Michael A. Carcasi
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Metrology for measurement of photosensitizer concentration within p...
- Patent number 9,519,227
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line pattern collapse mitigation through gap-fill material application
- Patent number 9,454,081
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Mark H Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of topography to direct assembly of block copolymers in grapho-...
- Patent number 9,418,860
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of grapho-epitaxial directed self-assembly to precisely cut lines
- Patent number 9,412,611
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of topography to direct assembly of block copolymers in grapho-...
- Patent number 9,349,604
- Issue date May 24, 2016
- Tokyo Electron Limited
- Benjamen M. Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate backside texturing
- Patent number 9,281,251
- Issue date Mar 8, 2016
- Tokyo Electron Limited
- Carlos A Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-step bake apparatus and method for directed self-assembly lit...
- Patent number 9,209,014
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Benjamen M. Rathsack
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Topography minimization of neutral layer overcoats in directed self...
- Patent number 9,147,574
- Issue date Sep 29, 2015
- Tokyo Electron Limited
- Mark H. Somervell
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-step bake apparatus and method for directed self-assembly lit...
- Patent number 9,136,110
- Issue date Sep 15, 2015
- Tokyo Electron Limited
- Benjamen M. Rathsack
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming patterns using block copolymers and articles thereof
- Patent number 9,005,877
- Issue date Apr 14, 2015
- Tokyo Electron Limited
- Benjamen M. Rathsack
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Line pattern collapse mitigation through gap-fill material application
- Patent number 8,795,952
- Issue date Aug 5, 2014
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion lithography wafer edge bead removal for wafer and scanner...
- Patent number 8,318,607
- Issue date Nov 27, 2012
- Texas Instruments Incorporated
- Benjamen Michael Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic post exposure bake apparatus and method
- Patent number 8,288,174
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of blended solvents in defectivity prevention
- Patent number 8,263,306
- Issue date Sep 11, 2012
- Texas Instruments Incorporated
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout of printable assist features to aid transistor control
- Patent number 8,176,443
- Issue date May 8, 2012
- Texas Instruments Incorporated
- Benjamen Michael Rathsack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Use of blended solvents in defectivity prevention
- Patent number 8,129,089
- Issue date Mar 6, 2012
- Texas Instruments Incorporated
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simplified micro-bridging and roughness analysis
- Patent number 8,108,805
- Issue date Jan 31, 2012
- Tokyo Electron Limited
- Benjamen M Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL AMPLIFICATION METHODS AND TECHNIQUES FOR DEVELOPABLE BOTTO...
- Publication number 20180315596
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACILITATION OF SPIN-COAT PLANARIZATION OVER FEATURE TOPOGRAPHY DUR...
- Publication number 20180096905
- Publication date Apr 5, 2018
- TOKYO ELECTRON LIMITED
- Ryan L. Burns
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation
- Publication number 20170242342
- Publication date Aug 24, 2017
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND TECHNIQUES TO USE WITH PHOTOSENSITIZED CHEMICALLY AMPLI...
- Publication number 20170192357
- Publication date Jul 6, 2017
- TOKYO ELECTRON LIMITED
- Michael A. CARCASI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20160363868
- Publication date Dec 15, 2016
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques for Spin-on-Carbon Planarization
- Publication number 20160358786
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Joshua S. Hooge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF GRAPHO-EPITAXIAL DIRECTED SELF-ASSEMBLY APPLICATIONS TO PREC...
- Publication number 20160343588
- Publication date Nov 24, 2016
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBTRACTIVE METHODS FOR CREATING DIELECTRIC ISOLATION STRUCTURES WI...
- Publication number 20160300756
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING SUB-RESOLUTION OPENINGS TO AID IN IMAGE REVERSAL, DIRECTED SE...
- Publication number 20160300711
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...
- Publication number 20160268132
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20160141169
- Publication date May 19, 2016
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20160043007
- Publication date Feb 11, 2016
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLI...
- Publication number 20160013052
- Publication date Jan 14, 2016
- TOKYO ELECTRON LIMITED
- Michael A. Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Amplification Methods and Techniques for Developable Botto...
- Publication number 20150241782
- Publication date Aug 27, 2015
- TOKYO ELECTERON LIMITED
- Steven SCHEER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Techniques to use with Photosensitized Chemically Ampli...
- Publication number 20150241783
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Michael A. CARCASI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY FOR MEASUREMENT OF PHOTOSENSITIZER CONCENTRATION WITHIN P...
- Publication number 20150241793
- Publication date Aug 27, 2015
- Michael A. CARCASI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20150125791
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...
- Publication number 20150111387
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF GRAPHO-EPITAXIAL DIRECTED SELF-ASSEMBLY TO PRECISELY CUT LINES
- Publication number 20150108087
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...
- Publication number 20150111386
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20150044785
- Publication date Feb 12, 2015
- TOKYO ELECTRON LIMITED
- Carlos A. FONSECA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP BAKE APPARATUS AND METHOD FOR DIRECTED SELF-ASSEMBLY LIT...
- Publication number 20140273522
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI-STEP BAKE APPARATUS AND METHOD FOR DIRECTED SELF-ASSEMBLY LIT...
- Publication number 20140273523
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- B82 - NANO-TECHNOLOGY
Information Patent Application
TOPOGRAPHY MINIMIZATION OF NEUTRAL LAYER OVERCOATS IN DIRECTED SELF...
- Publication number 20140273514
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- B82 - NANO-TECHNOLOGY
Information Patent Application
INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLI...
- Publication number 20140273534
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Michael A. Carcasi
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
CONTROLLING CLEANING OF A LAYER ON A SUBSTRATE USING NOZZLES
- Publication number 20140144463
- Publication date May 29, 2014
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS USING BLOCK COPOLYMERS AND ARTICLES THEREOF
- Publication number 20130309457
- Publication date Nov 21, 2013
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPH...
- Publication number 20130107237
- Publication date May 2, 2013
- TOKYO ELECTRON LIMITED
- Michael A. Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC POST EXPOSURE BAKE APPARATUS AND METHOD
- Publication number 20120244645
- Publication date Sep 27, 2012
- TOKYO ELECTRON LIMITED
- Benjamen M. Rathsack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Simplified Micro-Bridging and Roughness Analysis
- Publication number 20110239167
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Benjamen Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Benjamen Michael Rathsack

Person

Patents Grantslast 30 patents

Chemical amplification methods and techniques for developable botto...

Facilitation of spin-coat planarization over feature topography dur...

Methods and techniques to use with photosensitized chemically ampli...

Photo-sensitized chemically amplified resist (PS-CAR) simulation

Subtractive methods for creating dielectric isolation structures wi...

Chemical amplification methods and techniques for developable botto...

Use of grapho-epitaxial directed self-assembly applications to prec...

Controlling cleaning of a layer on a substrate using nozzles

Use of topography to direct assembly of block copolymers in grapho-...

Substrate backside texturing

Using sub-resolution openings to aid in image reversal, directed se...

Methods and techniques to use with photosensitized chemically ampli...

Integration of absorption based heating bake methods into a photoli...

Metrology for measurement of photosensitizer concentration within p...

Line pattern collapse mitigation through gap-fill material application

Use of topography to direct assembly of block copolymers in grapho-...

Use of grapho-epitaxial directed self-assembly to precisely cut lines

Use of topography to direct assembly of block copolymers in grapho-...

Substrate backside texturing

Multi-step bake apparatus and method for directed self-assembly lit...

Topography minimization of neutral layer overcoats in directed self...

Multi-step bake apparatus and method for directed self-assembly lit...

Method of forming patterns using block copolymers and articles thereof

Line pattern collapse mitigation through gap-fill material application

Immersion lithography wafer edge bead removal for wafer and scanner...

Electrostatic post exposure bake apparatus and method

Use of blended solvents in defectivity prevention

Layout of printable assist features to aid transistor control

Use of blended solvents in defectivity prevention

Simplified micro-bridging and roughness analysis

Patents Applicationslast 30 patents

CHEMICAL AMPLIFICATION METHODS AND TECHNIQUES FOR DEVELOPABLE BOTTO...

FACILITATION OF SPIN-COAT PLANARIZATION OVER FEATURE TOPOGRAPHY DUR...

Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation

METHODS AND TECHNIQUES TO USE WITH PHOTOSENSITIZED CHEMICALLY AMPLI...

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

Techniques for Spin-on-Carbon Planarization

USE OF GRAPHO-EPITAXIAL DIRECTED SELF-ASSEMBLY APPLICATIONS TO PREC...

SUBTRACTIVE METHODS FOR CREATING DIELECTRIC ISOLATION STRUCTURES WI...

USING SUB-RESOLUTION OPENINGS TO AID IN IMAGE REVERSAL, DIRECTED SE...

USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...

SUBSTRATE BACKSIDE TEXTURING

SUBSTRATE BACKSIDE TEXTURING

INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLI...

Chemical Amplification Methods and Techniques for Developable Botto...

Methods and Techniques to use with Photosensitized Chemically Ampli...

METROLOGY FOR MEASUREMENT OF PHOTOSENSITIZER CONCENTRATION WITHIN P...

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...

USE OF GRAPHO-EPITAXIAL DIRECTED SELF-ASSEMBLY TO PRECISELY CUT LINES

USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...

SUBSTRATE BACKSIDE TEXTURING

MULTI-STEP BAKE APPARATUS AND METHOD FOR DIRECTED SELF-ASSEMBLY LIT...

MULTI-STEP BAKE APPARATUS AND METHOD FOR DIRECTED SELF-ASSEMBLY LIT...

TOPOGRAPHY MINIMIZATION OF NEUTRAL LAYER OVERCOATS IN DIRECTED SELF...

INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLI...

CONTROLLING CLEANING OF A LAYER ON A SUBSTRATE USING NOZZLES

METHOD OF FORMING PATTERNS USING BLOCK COPOLYMERS AND ARTICLES THEREOF

METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPH...

ELECTROSTATIC POST EXPOSURE BAKE APPARATUS AND METHOD

Simplified Micro-Bridging and Roughness Analysis