Benjamin B. Bierman

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Thermally processing a substrate
- Patent number 6,803,546
- Issue date Oct 12, 2004
- Applied Materials, Inc.
- Ryan C Boas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sloped substrate support
- Patent number 6,395,363
- Issue date May 28, 2002
- Applied Materials, Inc.
- David S. Ballance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermally processing a substrate
- Patent number 6,215,106
- Issue date Apr 10, 2001
- Applied Materials, Inc.
- Ryan C. Boas
- C30 - CRYSTAL GROWTH
Information Patent Grant
Magnetically-levitated rotor system for an RTP chamber
- Patent number 6,157,106
- Issue date Dec 5, 2000
- Applied Materials, Inc.
- James V. Tietz
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Co-rotating edge ring extension for use in a semiconductor processi...
- Patent number 6,133,152
- Issue date Oct 17, 2000
- Applied Materials, Inc.
- Benjamin Bierman
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus for achieving temperature uniformity of a subs...
- Patent number 6,123,766
- Issue date Sep 26, 2000
- Applied Materials, Inc.
- Meredith J. Williams
- C30 - CRYSTAL GROWTH
Information Patent Grant
Multi-zone gas flow control in a process chamber
- Patent number 6,090,210
- Issue date Jul 18, 2000
- Applied Materials, Inc.
- David S. Ballance
- C30 - CRYSTAL GROWTH
Information Patent Grant
Reflector cover for a semiconductor processing chamber
- Patent number 6,035,100
- Issue date Mar 7, 2000
- Applied Materials, Inc.
- Benjamin Bierman
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for purging the back side of a substrate durin...
- Patent number 5,960,555
- Issue date Oct 5, 1999
- Applied Materials, Inc.
- Paul Deaton
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for gaseous substrate support
- Patent number 5,920,797
- Issue date Jul 6, 1999
- Applied Materials, Inc.
- David S. Ballance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for purging the back side of a substrate durin...
- Patent number 5,884,412
- Issue date Mar 23, 1999
- Applied Materials, Inc.
- James V. Tietz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lift pin and support pin apparatus for a processing chamber
- Patent number 5,879,128
- Issue date Mar 9, 1999
- Applied Materials, Inc.
- James V. Tietz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer support with graded thermal mass
- Patent number 5,848,889
- Issue date Dec 15, 1998
- Applied Materials Inc.
- James V. Tietz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas introduction showerhead for an RTP chamber with upper and lower...
- Patent number 5,781,693
- Issue date Jul 14, 1998
- Applied Materials, Inc.
- David S. Ballance
- C30 - CRYSTAL GROWTH

Benjamin B. Bierman

Person

Patents Grantslast 30 patents

Thermally processing a substrate

Sloped substrate support

Thermally processing a substrate

Magnetically-levitated rotor system for an RTP chamber

Co-rotating edge ring extension for use in a semiconductor processi...

Method and apparatus for achieving temperature uniformity of a subs...

Multi-zone gas flow control in a process chamber

Reflector cover for a semiconductor processing chamber

Method and apparatus for purging the back side of a substrate durin...

Method for gaseous substrate support

Method and apparatus for purging the back side of a substrate durin...

Lift pin and support pin apparatus for a processing chamber

Semiconductor wafer support with graded thermal mass

Gas introduction showerhead for an RTP chamber with upper and lower...