Benjamin M. Rathsack

Follow

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate treatment to reduce pattern roughness
- Patent number 8,449,293
- Issue date May 28, 2013
- Tokyo Electron Limited
- Benjamin M. Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of slimming radiation-sensitive material lines in lithograph...
- Patent number 8,435,728
- Issue date May 7, 2013
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of slimming radiation-sensitive material lines in lithograph...
- Patent number 8,338,086
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TREATMENT TO REDUCE PATTERN ROUGHNESS
- Publication number 20110269078
- Publication date Nov 3, 2011
- TOKYO ELECTRON LIMITED
- Benjamin M. Rathsack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPH...
- Publication number 20110244402
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPH...
- Publication number 20110244403
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY