Benjamin Sigel

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical system with aperture device having plurality of aperture el...
- Patent number 9,964,673
- Issue date May 8, 2018
- Carl Zeiss SMT GmbH
- Benjamin Sigel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical component
- Patent number 9,851,555
- Issue date Dec 26, 2017
- Carl Zeiss SMT GmbH
- Markus Holz
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Projection exposure apparatus for semiconductor lithography includi...
- Patent number 9,030,644
- Issue date May 12, 2015
- Carl Zeiss SMT GmbH
- Benjamin Sigel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SWAPPING TOOL
- Publication number 20230400772
- Publication date Dec 14, 2023
- Carl Zeiss SMT GMBH
- Eugen Doetzel
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
DEVICE FOR CLEANING A SURFACE IN THE INTERIOR OF AN OPTICAL SYSTEM
- Publication number 20220308466
- Publication date Sep 29, 2022
- Carl Zeiss SMT GMBH
- Jovana-Maria DIESCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDI...
- Publication number 20190121238
- Publication date Apr 25, 2019
- Carl Zeiss SMT GMBH
- Benjamin Sigel
- G02 - OPTICS
Information Patent Application
OPTICAL COMPONENT
- Publication number 20160170201
- Publication date Jun 16, 2016
- Carl Zeiss SMT GMBH
- Markus Holz
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDI...
- Publication number 20150316855
- Publication date Nov 5, 2015
- Carl Zeiss SMT GMBH
- Benjamin Sigel
- G02 - OPTICS
Information Patent Application
OPTICAL DEVICES HAVING KINEMATIC COMPONENTS
- Publication number 20130038848
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Jochen Weber
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDI...
- Publication number 20110317140
- Publication date Dec 29, 2011
- Carl Zeiss SMT GMBH
- Benjamin Sigel
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM WITH APERTURE DEVICE
- Publication number 20110194089
- Publication date Aug 11, 2011
- Carl Zeiss SMT GMBH
- Benjamin Sigel
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD
- Publication number 20100128367
- Publication date May 27, 2010
- Carl Zeiss SMT AG
- Mariella Beckenbach
- G02 - OPTICS
Information Patent Application
OPTICAL DEVICES HAVING KINEMTAIC COMPONENTS
- Publication number 20080117397
- Publication date May 22, 2008
- Carl Zeiss SMT AG
- Jochen Weber
- G02 - OPTICS

Benjamin Sigel

Person

Patents Grantslast 30 patents

Optical system with aperture device having plurality of aperture el...

Optical component

Projection exposure apparatus for semiconductor lithography includi...

Patents Applicationslast 30 patents

METHOD AND SWAPPING TOOL

DEVICE FOR CLEANING A SURFACE IN THE INTERIOR OF AN OPTICAL SYSTEM

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDI...

OPTICAL COMPONENT

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDI...

OPTICAL DEVICES HAVING KINEMATIC COMPONENTS

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDI...

OPTICAL SYSTEM WITH APERTURE DEVICE

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD

OPTICAL DEVICES HAVING KINEMTAIC COMPONENTS