Bernard G. Lindsay

Person

Danvers, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Techniques for plasma processing a substrate
- Patent number 9,123,509
- Issue date Sep 1, 2015
- Varian Semiconductor Equipment Associates, Inc.
- George D. Papasouliotis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing with enhanced charge neutralization and process c...
- Patent number 8,926,850
- Issue date Jan 6, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for selectively controlling ion composition of io...
- Patent number 8,664,561
- Issue date Mar 4, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Kamal Hadidi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,623,171
- Issue date Jan 7, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for monitoring and controlling a plasma process with an i...
- Patent number 8,344,318
- Issue date Jan 1, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Kamal Hadidi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for detecting wafer charging in a plasma processing system
- Patent number 7,675,730
- Issue date Mar 9, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop control and process optimization in plasma doping proce...
- Patent number 7,586,100
- Issue date Sep 8, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Deven M. Raj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Technique for monitoring and controlling a plasma process
- Patent number 7,453,059
- Issue date Nov 18, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING WITH ENHANCED CHARGE NEUTRALIZATION AND PROCESS C...
- Publication number 20130092529
- Publication date Apr 18, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES FOR PLASMA PROCESSING A SUBSTRATE
- Publication number 20110309049
- Publication date Dec 22, 2011
- Varian Semiconductor Equipment Associates, Inc.
- George D. PAPASOULIOTIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR SELECTIVELY CONTROLLING ION COMPOSITION OF IO...
- Publication number 20110000896
- Publication date Jan 6, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Kamal Hadidi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100255683
- Publication date Oct 7, 2010
- Varian Semiconductor Equipment Associates
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ION PROCESS UNIFORMITY MONITOR
- Publication number 20100159120
- Publication date Jun 24, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Joseph P. Dzengeleski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR MONITORING AND CONTROLLING A PLASMA PROCESS WITH AN I...
- Publication number 20100062547
- Publication date Mar 11, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Kamal Hadidi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Closed Loop Control And Process Optimization In Plasma Doping Proce...
- Publication number 20090200461
- Publication date Aug 13, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Deven M. Raj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING WITH ENHANCED CHARGE NEUTRALIZATION AND PROCESS C...
- Publication number 20090000946
- Publication date Jan 1, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for Plasma Processing a Substrate and a Method Thereof
- Publication number 20090001890
- Publication date Jan 1, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA DOPING WITH ENHANCED CHARGE NEUTRALIZATION
- Publication number 20090004836
- Publication date Jan 1, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Vikram Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES FOR DETECTING WAFER CHARGING IN A PLASMA PROCESSING SYSTEM
- Publication number 20080314731
- Publication date Dec 25, 2008
- Varian Semiconductor Equipment Associates Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for Monitoring and Controlling a Plasma Process
- Publication number 20070227231
- Publication date Oct 4, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS

Bernard G. Lindsay

Person

Patents Grantslast 30 patents

Techniques for plasma processing a substrate

Plasma processing with enhanced charge neutralization and process c...

System and method for selectively controlling ion composition of io...

Plasma processing apparatus

Technique for monitoring and controlling a plasma process with an i...

Techniques for detecting wafer charging in a plasma processing system

Closed loop control and process optimization in plasma doping proce...

Technique for monitoring and controlling a plasma process

Patents Applicationslast 30 patents

PLASMA PROCESSING WITH ENHANCED CHARGE NEUTRALIZATION AND PROCESS C...

TECHNIQUES FOR PLASMA PROCESSING A SUBSTRATE

SYSTEM AND METHOD FOR SELECTIVELY CONTROLLING ION COMPOSITION OF IO...

PLASMA PROCESSING APPARATUS

PLASMA ION PROCESS UNIFORMITY MONITOR

TECHNIQUE FOR MONITORING AND CONTROLLING A PLASMA PROCESS WITH AN I...

Closed Loop Control And Process Optimization In Plasma Doping Proce...

PLASMA PROCESSING WITH ENHANCED CHARGE NEUTRALIZATION AND PROCESS C...

Apparatus for Plasma Processing a Substrate and a Method Thereof

PLASMA DOPING WITH ENHANCED CHARGE NEUTRALIZATION

TECHNIQUES FOR DETECTING WAFER CHARGING IN A PLASMA PROCESSING SYSTEM

Technique for Monitoring and Controlling a Plasma Process