Bernard SELL

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Portland, OR, US

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Patents Grantslast 30 patents

Information Patent Grant
Fin structure having hard mask etch stop layers underneath gate sid...
- Patent number 9,923,054
- Issue date Mar 20, 2018
- Intel Corporation
- Ritesh Jhaveri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device with tall fins and using h...
- Patent number 9,048,260
- Issue date Jun 2, 2015
- Intel Corporation
- Ritesh Jhaveri
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING A SEMICONDUCTOR DEVICE WITH TALL FINS AND USING H...
- Publication number 20150287779
- Publication date Oct 8, 2015
- Intel Corporation
- Ritesh Jhaveri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK ETCH STOP FOR TALL FINS
- Publication number 20140191300
- Publication date Jul 10, 2014
- Ritesh Jhaveri
- H01 - BASIC ELECTRIC ELEMENTS