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Bernd Schulte
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Aachen, DE
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last 30 patents
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Patent Grant
CVD reactor having a process-chamber ceiling which can be lowered
Patent number
8,157,915
Issue date
Apr 17, 2012
Aixtron Inc.
Martin Dauelsberg
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Process and apparatus for depositing semiconductor layers using two...
Patent number
7,709,398
Issue date
May 4, 2010
Aixtron AG
Gerhard Karl Strauch
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
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Patent Application
Process And Apparatus For Depositing Semiconductor Layers Using Two...
Publication number
20100012034
Publication date
Jan 21, 2010
Gerhard Karl Strauch
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CVD REACTOR HAVING A PROCESS-CHAMBER CEILING WHICH CAN BE LOWERED
Publication number
20090064935
Publication date
Mar 12, 2009
Martin Dauelsberg
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Process and apparatus for depositing semiconductor layers using two...
Publication number
20060121193
Publication date
Jun 8, 2006
Gerhard Karl Strauch
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...