Bernhard KNEER

Person

Altheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Microlithographic projection exposure apparatus and measuring devic...
- Patent number 10,345,710
- Issue date Jul 9, 2019
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for stress-adjusted operation of a projection exposure syste...
- Patent number 9,696,631
- Issue date Jul 4, 2017
- Carl Zeiss SMT GmbH
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and measuring device for a projection lens
- Patent number 9,436,095
- Issue date Sep 6, 2016
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for stress-adjusted operation of a projection exposure syste...
- Patent number 9,086,637
- Issue date Jul 21, 2015
- Carl Zeiss SMT GmbH
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and measuring device for a projection lens
- Patent number 8,330,935
- Issue date Dec 11, 2012
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging system for a microlithographical projection light system
- Patent number 7,719,658
- Issue date May 18, 2010
- Carl Zeiss SMT AG
- Andreas Dorsel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for distortion correction in a microlithographic projection...
- Patent number 7,605,905
- Issue date Oct 20, 2009
- Carl Zeiss SMT AG
- Andreas Kirchner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting astigmatism in a microlithography projection...
- Patent number 7,522,260
- Issue date Apr 21, 2009
- Carl Zeiss SMT AG
- Andreas Kirchner
- G02 - OPTICS
Information Patent Grant
Projection exposure system
- Patent number 7,457,043
- Issue date Nov 25, 2008
- Carl Zeiss SMT AG
- Bernhard Kneer
- G02 - OPTICS
Information Patent Grant
Projection exposure system
- Patent number 7,408,621
- Issue date Aug 5, 2008
- Carl Zeiss SMT AG
- Bernhard Kneer
- G02 - OPTICS
Information Patent Grant
Method for distortion correction in a microlithographic projection...
- Patent number 7,372,539
- Issue date May 13, 2008
- Carl Zeiss SMT AG
- Andreas Kirchner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20170176868
- Publication date Jun 22, 2017
- Jan Bernard Plechelmus VAN SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...
- Publication number 20170082930
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTE...
- Publication number 20160062245
- Publication date Mar 3, 2016
- Carl Zeiss SMT GMBH
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
- Publication number 20130120723
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTE...
- Publication number 20130044303
- Publication date Feb 21, 2013
- Carl Zeiss SMT GMBH
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...
- Publication number 20110228246
- Publication date Sep 22, 2011
- Carl Zeiss SMT AG
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
- Publication number 20100141912
- Publication date Jun 10, 2010
- Carl Zeiss SMT AG
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...
- Publication number 20080309894
- Publication date Dec 18, 2008
- Carl Zeiss SMT AG
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...
- Publication number 20080304033
- Publication date Dec 11, 2008
- Carl Zeiss SMT AG
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Distortion Correction In A Microlithographic Projection...
- Publication number 20080278699
- Publication date Nov 13, 2008
- Carl Zeiss SMT AG
- Andreas Kirchner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging System for a Microlithographical Projection Light System
- Publication number 20070285637
- Publication date Dec 13, 2007
- Carl Zeiss SMT AG
- Andreas Dorsel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection Exposure System
- Publication number 20070171539
- Publication date Jul 26, 2007
- Carl Zeiss SMT AG, a Germany corporation
- Bernhard Kneer
- G02 - OPTICS
Information Patent Application
Projection objective for a microlithographic projection exposure ap...
- Publication number 20070165198
- Publication date Jul 19, 2007
- Carl Zeiss SMT AG
- Bernhard Kneer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...
- Publication number 20070070316
- Publication date Mar 29, 2007
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure system
- Publication number 20060170897
- Publication date Aug 3, 2006
- Bernhard Kneer
- G02 - OPTICS
Information Patent Application
Method for distortion correction in a microlithographic projection...
- Publication number 20040263810
- Publication date Dec 30, 2004
- Andreas Kirchner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure system
- Publication number 20030063268
- Publication date Apr 3, 2003
- Bernhard Kneer
- G02 - OPTICS

Bernhard KNEER

Person

Patents Grantslast 30 patents

Microlithographic projection exposure apparatus and measuring devic...

Method for stress-adjusted operation of a projection exposure syste...

Exposure apparatus and measuring device for a projection lens

Method for stress-adjusted operation of a projection exposure syste...

Exposure apparatus and measuring device for a projection lens

Imaging system for a microlithographical projection light system

Method for distortion correction in a microlithographic projection...

Method for correcting astigmatism in a microlithography projection...

Projection exposure system

Projection exposure system

Method for distortion correction in a microlithographic projection...

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND METHOD

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...

METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTE...

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTE...

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE AP...

Method For Distortion Correction In A Microlithographic Projection...

Imaging System for a Microlithographical Projection Light System

Projection Exposure System

Projection objective for a microlithographic projection exposure ap...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...

Projection exposure system

Method for distortion correction in a microlithographic projection...

Projection exposure system