Bernhard R. Liegl

Person

Cold Spring, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method of predicting problematic areas for lithography i...
- Patent number 9,075,944
- Issue date Jul 7, 2015
- Mentor Graphics Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system to predict lithography focus error using simulate...
- Patent number 8,792,080
- Issue date Jul 29, 2014
- International Business Machines Corporation
- Brian Christopher Sapp
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of predicting problematic areas for lithography i...
- Patent number 8,484,586
- Issue date Jul 9, 2013
- Mentor Graphics Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method of predicting problematic areas for lithography i...
- Patent number 8,239,789
- Issue date Aug 7, 2012
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photolithography focus improvement by reduction of autofocus radiat...
- Patent number 8,227,180
- Issue date Jul 24, 2012
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of predicting problematic areas for lithography i...
- Patent number 8,001,495
- Issue date Aug 16, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Proximity sensitive defect monitor
- Patent number 7,486,097
- Issue date Feb 3, 2009
- International Business Machines Corporation
- Bernhard R. Liegl
- G01 - MEASURING TESTING
Information Patent Grant
Density-aware dynamic leveling in scanning exposure systems
- Patent number 7,239,371
- Issue date Jul 3, 2007
- International Business Machines Corporation
- Bernhard R. Liegl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Proximity sensitive defect monitor
- Patent number 7,176,675
- Issue date Feb 13, 2007
- International Business Machines Corporation
- Bernhard R. Liegl
- G01 - MEASURING TESTING
Information Patent Grant
Sub-resolution sized assist features
- Patent number 7,141,338
- Issue date Nov 28, 2006
- Infineon Technologies AG
- Xiaochun Linda Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment system and method using bright spot and box structure
- Patent number 6,801,314
- Issue date Oct 5, 2004
- Infineon Technologies AG
- Enio L. Carpi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Intra-cell mask alignment for improved overlay
- Patent number 6,784,070
- Issue date Aug 31, 2004
- Infineon Technologies AG
- Enio L. Carpi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATE...
- Publication number 20140071416
- Publication date Mar 13, 2014
- Choongyeun Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATE...
- Publication number 20140075396
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Choongyeun Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATE...
- Publication number 20140075399
- Publication date Mar 13, 2014
- Choongyeun Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...
- Publication number 20130286370
- Publication date Oct 31, 2013
- Mentor Graphics Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...
- Publication number 20120254812
- Publication date Oct 4, 2012
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATE...
- Publication number 20120194792
- Publication date Aug 2, 2012
- International Business Machines Corporation
- Brian Christopher Sapp
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...
- Publication number 20110256486
- Publication date Oct 20, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...
- Publication number 20090265679
- Publication date Oct 22, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...
- Publication number 20090208865
- Publication date Aug 20, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK SUBSTRATE DEPTH ADJUSTMENT TO ADJUST FOR TOPOGRAPHY ON SURFACE
- Publication number 20070287072
- Publication date Dec 13, 2007
- Bernhard R. Liegl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Proximity sensitive defect monitor
- Publication number 20070132445
- Publication date Jun 14, 2007
- International Business Machines Corporation
- Bernhard R. Liegl
- G01 - MEASURING TESTING
Information Patent Application
DENSITY-AWARE DYNAMIC LEVELING IN SCANNING EXPOSURE SYSTEMS
- Publication number 20070085991
- Publication date Apr 19, 2007
- International Business Machines Corporation
- Bernhard R. Liegl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER EDGE PATTERNING IN SEMICONDUCTOR STRUCTURE FABRICATION
- Publication number 20070048668
- Publication date Mar 1, 2007
- International Business Machines Corporation
- Bernhard R. Liegl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern transfer in device fabrication
- Publication number 20040121264
- Publication date Jun 24, 2004
- Bernhard Liegl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Intra-cell mask alignment for improved overlay
- Publication number 20040105961
- Publication date Jun 3, 2004
- Infineon Technologies North America Corp.
- Enio L. Carpi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sub-resolution sized assist features
- Publication number 20040091790
- Publication date May 13, 2004
- Infineon Technologies North America Corp.
- Xiaochun Linda Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask alignment method
- Publication number 20030147077
- Publication date Aug 7, 2003
- Infineon Technologies North America Corp.
- Enio L. Carpi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment system and method using bright spot and box structure
- Publication number 20030064306
- Publication date Apr 3, 2003
- Enio L. Carpi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Bernhard R. Liegl

Person

Patents Grantslast 30 patents

System and method of predicting problematic areas for lithography i...

Method and system to predict lithography focus error using simulate...

System and method of predicting problematic areas for lithography i...

System and method of predicting problematic areas for lithography i...

Photolithography focus improvement by reduction of autofocus radiat...

System and method of predicting problematic areas for lithography i...

Proximity sensitive defect monitor

Density-aware dynamic leveling in scanning exposure systems

Proximity sensitive defect monitor

Sub-resolution sized assist features

Alignment system and method using bright spot and box structure

Intra-cell mask alignment for improved overlay

Patents Applicationslast 30 patents

METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATE...

METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATE...

METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATE...

SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...

SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...

METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATE...

PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...

SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY I...

PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...

MASK SUBSTRATE DEPTH ADJUSTMENT TO ADJUST FOR TOPOGRAPHY ON SURFACE

Proximity sensitive defect monitor

DENSITY-AWARE DYNAMIC LEVELING IN SCANNING EXPOSURE SYSTEMS

WAFER EDGE PATTERNING IN SEMICONDUCTOR STRUCTURE FABRICATION

Pattern transfer in device fabrication

Intra-cell mask alignment for improved overlay

Sub-resolution sized assist features

Mask alignment method

Alignment system and method using bright spot and box structure