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Projection lens arrangement
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Patent number 9,105,439
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Issue date Aug 11, 2015
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Mapper Lithography IP B.V.
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Marco Jan Jaco Wieland
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B82 - NANO-TECHNOLOGY
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Projection lens arrangement
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Patent number 8,890,094
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Issue date Nov 18, 2014
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Mapper Lithography IP B.V.
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Marco Jan Jaco Wieland
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B82 - NANO-TECHNOLOGY
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Electron beam exposure system
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Patent number RE45049
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Issue date Jul 29, 2014
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Mapper Lithography IP B.V.
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Marco Jan-Jaco Wieland
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250 - Radiant energy
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Electron beam exposure system
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Patent number RE44908
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Issue date May 27, 2014
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Mapper Lithography IP B.V.
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Marco Jan-Jaco Wieland
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250 - Radiant energy
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Electron beam exposure system
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Patent number RE44240
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Issue date May 28, 2013
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Mapper Lithography IP B.V.
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Marco Jan-Jaco Wieland
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250 - Radiant energy
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Projection lens arrangement
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Patent number 8,089,056
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Issue date Jan 3, 2012
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Mapper Lithography IP B.V.
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Marco Jan Jaco Wieland
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B82 - NANO-TECHNOLOGY
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Electron beam exposure system
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Patent number 7,091,504
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Issue date Aug 15, 2006
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Mapper Lithography IP B.V.
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Marco Jan-Jaco Wieland
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H01 - BASIC ELECTRIC ELEMENTS
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Electron beam exposure system
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Patent number 6,897,458
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Issue date May 24, 2005
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Mapper Lithography IP B.V.
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Marco Jan-Jaco Wieland
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H01 - BASIC ELECTRIC ELEMENTS
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