Bert Verstraeten

Person

Lommel, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for process metrology
- Patent number 12,007,697
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Bert Verstraeten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of processing data, method of obtaining calibration data
- Patent number 11,506,566
- Issue date Nov 22, 2022
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G01 - MEASURING TESTING
Information Patent Grant
Method for process metrology
- Patent number 11,385,551
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Bert Verstraeten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,054,754
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate, metrology apparatus and associated methods for a lithogr...
- Patent number 10,871,367
- Issue date Dec 22, 2020
- ASML Netherlands B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of measuring a parameter of a device manufacturing process,...
- Patent number 10,747,122
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G01 - MEASURING TESTING
Information Patent Grant
Substrate, metrology apparatus and associated methods for a lithogr...
- Patent number 10,677,589
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Alok Verma
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining an optimal focus height for a metrology appar...
- Patent number 10,571,363
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PROCESS METROLOGY
- Publication number 20220326625
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Bert VERSTRAETEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PROCESS METROLOGY
- Publication number 20210302845
- Publication date Sep 30, 2021
- ASML NETHERLANDS B.V.
- Bert VERSTRAETEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...
- Publication number 20200284578
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200142324
- Publication date May 7, 2020
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING A PARAMETER OF A DEVICE MANUFACTURING PROCESS,...
- Publication number 20190354024
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Anagnostis TSIATMAS
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...
- Publication number 20190242782
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF PROCESSING DATA, METHOD OF OBTAINING CALIBRATION DATA
- Publication number 20190204180
- Publication date Jul 4, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...
- Publication number 20190063911
- Publication date Feb 28, 2019
- ASML NETHERLANDS B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING

Bert Verstraeten

Person

Patents Grantslast 30 patents

Method for process metrology

Method of processing data, method of obtaining calibration data

Method for process metrology

Methods and patterning devices and apparatuses for measuring focus...

Substrate, metrology apparatus and associated methods for a lithogr...

Method of measuring a parameter of a device manufacturing process,...

Substrate, metrology apparatus and associated methods for a lithogr...

Method of determining an optimal focus height for a metrology appar...

Patents Applicationslast 30 patents

METHOD FOR PROCESS METROLOGY

METHOD FOR PROCESS METROLOGY

SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...

Methods and Patterning Devices and Apparatuses for Measuring Focus...

METHOD OF MEASURING A PARAMETER OF A DEVICE MANUFACTURING PROCESS,...

METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...

METHOD OF PROCESSING DATA, METHOD OF OBTAINING CALIBRATION DATA

SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...