Bhanwar Singh

Person

Morgan Hill, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods that control liquid temperature in immersion li...
- Patent number 8,547,521
- Issue date Oct 1, 2013
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of lithographic mask correction using localized transmission...
- Patent number 8,124,300
- Issue date Feb 28, 2012
- GLOBALFOUNDRIES Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mitigating heat in an integrated circuit
- Patent number 8,028,531
- Issue date Oct 4, 2011
- GLOBALFOUNDRIES, INC.
- Khoi A. Phan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 8,007,631
- Issue date Aug 30, 2011
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Advanced process control framework using two-dimensional image anal...
- Patent number 7,875,851
- Issue date Jan 25, 2011
- Advanced Micro Devices, Inc.
- Chris Haidinyak
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Surface treatment with an acidic composition to prevent substrate a...
- Patent number 7,799,514
- Issue date Sep 21, 2010
- GLOBALFOUNDRIES Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process margin using discrete assist features
- Patent number 7,749,662
- Issue date Jul 6, 2010
- GLOBALFOUNDRIES Inc.
- Itty Matthew
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 7,709,373
- Issue date May 4, 2010
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask having sidewall absorbers to enable the printing of finer feat...
- Patent number 7,604,903
- Issue date Oct 20, 2009
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thin film germanium diode with low reverse breakdown
- Patent number 7,468,296
- Issue date Dec 23, 2008
- Spansion LLC
- Ercan Adem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanner optimization for reduced across-chip performance variation...
- Patent number 7,460,922
- Issue date Dec 2, 2008
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G05 - CONTROLLING REGULATING
Information Patent Grant
Feedback control of imprint mask feature profile using scatterometr...
- Patent number 7,449,348
- Issue date Nov 11, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combination of non-lithographic shrink techniques and trim process...
- Patent number 7,405,032
- Issue date Jul 29, 2008
- Advanced Micro Devices, Inc.
- Gilles Amblard
- G01 - MEASURING TESTING
Information Patent Grant
Post fabrication CD modification on imprint lithography mask
- Patent number 7,386,162
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint lithography mask trimming for imprint mask using etch
- Patent number 7,384,569
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Using supercritical fluids to clean lenses and monitor defects
- Patent number 7,381,278
- Issue date Jun 3, 2008
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topography compensation of imprint lithography patterning
- Patent number 7,376,259
- Issue date May 20, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Transistor gate shape metrology using multiple data sources
- Patent number 7,373,215
- Issue date May 13, 2008
- Advanced Micro Devices, Inc.
- Jason Phillip Cain
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimizing critical dimension uniformity utilizing a resist bake pl...
- Patent number 7,334,202
- Issue date Feb 19, 2008
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Silicon-containing resist to pattern organic low k-dielectrics
- Patent number 7,309,659
- Issue date Dec 18, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extraction of tool independent line-edge-roughness (LER) measuremen...
- Patent number 7,310,155
- Issue date Dec 18, 2007
- Advanced Micro Devices, Inc.
- Luigi Capodieci
- G01 - MEASURING TESTING
Information Patent Grant
Method for manufacturing place & route based on 2-D forbidden patterns
- Patent number 7,305,645
- Issue date Dec 4, 2007
- Advanced Micro Technologies, Inc.
- Luigi Capodieci
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods of imprint lithography with adjustable mask
- Patent number 7,295,288
- Issue date Nov 13, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Frame structure for turbulence control in immersion lithography
- Patent number 7,289,193
- Issue date Oct 30, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic BARC with adjustable etch rate
- Patent number 7,262,138
- Issue date Aug 28, 2007
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of supercritical fluid to dry wafer and clean lens in immersion...
- Patent number 7,262,422
- Issue date Aug 28, 2007
- Spansion LLC
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ reticle contamination detection system at exposure wavelength
- Patent number 7,251,033
- Issue date Jul 31, 2007
- Advanced Micro Devices, Inc.
- Khoi Phan
- G01 - MEASURING TESTING
Information Patent Grant
Using scatterometry to verify contact hole opening during tapered b...
- Patent number 7,235,414
- Issue date Jun 26, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G01 - MEASURING TESTING
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 7,235,474
- Issue date Jun 26, 2007
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ defect monitor and control system for immersion medium in i...
- Patent number 7,224,456
- Issue date May 29, 2007
- Advanced Micro Devices, Inc.
- Khoi Phan
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
HEAT REGULATING DEVICE FOR AN INTEGRATED CIRCUIT
- Publication number 20090288425
- Publication date Nov 26, 2009
- Khoi A. Phan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MONITORING OPTICAL PROXIMITY CORRECTION PE...
- Publication number 20090144692
- Publication date Jun 4, 2009
- Jason P. Cain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MONITORING MARGINAL LAYOUT DESIGN RULES
- Publication number 20090144686
- Publication date Jun 4, 2009
- KEVIN R. LENSING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TRANSISTOR GATE SHAPE METROLOGY USING MULTIPLE DATA SOURCES
- Publication number 20080058978
- Publication date Mar 6, 2008
- Advanced Micro Devices, Inc.
- Jason Phillip Cain
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR IMPRINT LITHOGRAPHY TO FACILITATE DUAL DAMASC...
- Publication number 20070283883
- Publication date Dec 13, 2007
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Application
Process margin using discrete assist features
- Publication number 20070082277
- Publication date Apr 12, 2007
- Advanced Micro Devices, Inc.
- Itty Matthew
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Use of supercritical fluid to dry wafer and clean lens in immersion...
- Publication number 20070026345
- Publication date Feb 1, 2007
- Spansion LLC
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-layer overlay measurement and correction technique for IC man...
- Publication number 20050193362
- Publication date Sep 1, 2005
- Khoi A. Phan
- G01 - MEASURING TESTING
Information Patent Application
Pattern recognition and metrology structure for an x-initiative lay...
- Publication number 20050048741
- Publication date Mar 3, 2005
- Khoi A. Phan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEM INSPECTION AND ANALYSIS OF PATTERNED PHOTORESIST FEATURES
- Publication number 20040129880
- Publication date Jul 8, 2004
- Advanced Micro Devices, Inc.
- Uzodinma Okoroanyanwu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Using scatterometry to obtain measurements of in circuit structures
- Publication number 20040078108
- Publication date Apr 22, 2004
- Bryan K. Choo
- G01 - MEASURING TESTING
Information Patent Application
Comprehensive integrated lithographic process control system based...
- Publication number 20040063009
- Publication date Apr 1, 2004
- Khoi A. Phan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated pressure sensor for measuring multiaxis pressure gradients
- Publication number 20030188829
- Publication date Oct 9, 2003
- Bharath Rangarajan
- B24 - GRINDING POLISHING
Information Patent Application
SYSTEM AND METHOD FOR ACTIVE CONTROL OF SPACER DEPOSITION
- Publication number 20030153104
- Publication date Aug 14, 2003
- Bharath Rangarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nozzle arm movement for resist development
- Publication number 20030068430
- Publication date Apr 10, 2003
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ or ex-situ profile monitoring of phase openings on alternat...
- Publication number 20030052084
- Publication date Mar 20, 2003
- Cyrus E. Tabery
- G01 - MEASURING TESTING
Information Patent Application
WAFER BASED TEMPERATURE SENSORS FOR CHARACTERIZING CHEMICAL MECHANI...
- Publication number 20030055526
- Publication date Mar 20, 2003
- Steven C. Avanzino
- B24 - GRINDING POLISHING
Information Patent Application
Critical dimension monitoring from latent image
- Publication number 20030002878
- Publication date Jan 2, 2003
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using scatterometry for etch end points for dual damascene process
- Publication number 20030000644
- Publication date Jan 2, 2003
- Ramkumar Subramanian
- G01 - MEASURING TESTING
Information Patent Application
Using scatterometry to develop real time etch image
- Publication number 20030000922
- Publication date Jan 2, 2003
- Ramkumar Subramanian
- G01 - MEASURING TESTING
Information Patent Application
Growing copper vias or lines within a patterned resist using a copp...
- Publication number 20030003701
- Publication date Jan 2, 2003
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Modification of mask layout data to improve mask fidelity
- Publication number 20020160281
- Publication date Oct 31, 2002
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...
- Publication number 20020146648
- Publication date Oct 10, 2002
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- B82 - NANO-TECHNOLOGY
Information Patent Application
In-situ thickness measurement for use in semiconductor processing
- Publication number 20020142493
- Publication date Oct 3, 2002
- Arvind Halliyal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Scatterometry techniques to ascertain asymmetry profile of features...
- Publication number 20020135781
- Publication date Sep 26, 2002
- Bhanwar Singh
- G01 - MEASURING TESTING
Information Patent Application
Methodology to mitigate electron beam induced charge dissipation on...
- Publication number 20020100903
- Publication date Aug 1, 2002
- Bhanwar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-THIN RESIST COATING QUALITYBY BY INCREASING SURFACE ROUGHNESS...
- Publication number 20020004300
- Publication date Jan 10, 2002
- MARINA V. PLAT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual damascene process using sacrificial spin-on materials
- Publication number 20010046778
- Publication date Nov 29, 2001
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF SILICON OXYNITRIDE ARC FOR METAL LAYERS
- Publication number 20010046791
- Publication date Nov 29, 2001
- RAMKUMAR SUBRAMANIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual damascene method for backened metallization using poly stop la...
- Publication number 20010027003
- Publication date Oct 4, 2001
- Bharath Rangarajan
- H01 - BASIC ELECTRIC ELEMENTS

Bhanwar Singh

Person

Patents Grantslast 30 patents

Systems and methods that control liquid temperature in immersion li...

Method of lithographic mask correction using localized transmission...

Mitigating heat in an integrated circuit

System and method for imprint lithography to facilitate dual damasc...

Advanced process control framework using two-dimensional image anal...

Surface treatment with an acidic composition to prevent substrate a...

Process margin using discrete assist features

System and method for imprint lithography to facilitate dual damasc...

Mask having sidewall absorbers to enable the printing of finer feat...

Thin film germanium diode with low reverse breakdown

Scanner optimization for reduced across-chip performance variation...

Feedback control of imprint mask feature profile using scatterometr...

Combination of non-lithographic shrink techniques and trim process...

Post fabrication CD modification on imprint lithography mask

Imprint lithography mask trimming for imprint mask using etch

Using supercritical fluids to clean lenses and monitor defects

Topography compensation of imprint lithography patterning

Transistor gate shape metrology using multiple data sources

Optimizing critical dimension uniformity utilizing a resist bake pl...

Silicon-containing resist to pattern organic low k-dielectrics

Extraction of tool independent line-edge-roughness (LER) measuremen...

Method for manufacturing place & route based on 2-D forbidden patterns

Systems and methods of imprint lithography with adjustable mask

Frame structure for turbulence control in immersion lithography

Organic BARC with adjustable etch rate

Use of supercritical fluid to dry wafer and clean lens in immersion...

In-situ reticle contamination detection system at exposure wavelength

Using scatterometry to verify contact hole opening during tapered b...

System and method for imprint lithography to facilitate dual damasc...

In-situ defect monitor and control system for immersion medium in i...

Patents Applicationslast 30 patents

HEAT REGULATING DEVICE FOR AN INTEGRATED CIRCUIT

METHOD AND APPARATUS FOR MONITORING OPTICAL PROXIMITY CORRECTION PE...

METHOD AND APPARATUS FOR MONITORING MARGINAL LAYOUT DESIGN RULES

TRANSISTOR GATE SHAPE METROLOGY USING MULTIPLE DATA SOURCES

SYSTEM AND METHOD FOR IMPRINT LITHOGRAPHY TO FACILITATE DUAL DAMASC...

Process margin using discrete assist features

Use of supercritical fluid to dry wafer and clean lens in immersion...

Multi-layer overlay measurement and correction technique for IC man...

Pattern recognition and metrology structure for an x-initiative lay...

SEM INSPECTION AND ANALYSIS OF PATTERNED PHOTORESIST FEATURES

Using scatterometry to obtain measurements of in circuit structures

Comprehensive integrated lithographic process control system based...

Integrated pressure sensor for measuring multiaxis pressure gradients

SYSTEM AND METHOD FOR ACTIVE CONTROL OF SPACER DEPOSITION

Nozzle arm movement for resist development

In-situ or ex-situ profile monitoring of phase openings on alternat...

WAFER BASED TEMPERATURE SENSORS FOR CHARACTERIZING CHEMICAL MECHANI...

Critical dimension monitoring from latent image

Using scatterometry for etch end points for dual damascene process

Using scatterometry to develop real time etch image

Growing copper vias or lines within a patterned resist using a copp...

Modification of mask layout data to improve mask fidelity

Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...

In-situ thickness measurement for use in semiconductor processing

Scatterometry techniques to ascertain asymmetry profile of features...

Methodology to mitigate electron beam induced charge dissipation on...

ULTRA-THIN RESIST COATING QUALITYBY BY INCREASING SURFACE ROUGHNESS...

Dual damascene process using sacrificial spin-on materials

USE OF SILICON OXYNITRIDE ARC FOR METAL LAYERS

Dual damascene method for backened metallization using poly stop la...