Bhaskar Kumar

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Stress treatments for cover wafers
- Patent number 12,142,468
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- B24 - GRINDING POLISHING
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 12,106,958
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chucking process and system for substrate processing chambers
- Patent number 12,020,911
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Bhaskar Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of seasoning process chambers
- Patent number 11,996,273
- Issue date May 28, 2024
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shunt door for magnets in plasma process chamber
- Patent number 11,959,174
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques to improve adhesion and defects for tungsten carbide film
- Patent number 11,859,275
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Vivek Bharat Shah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 11,721,545
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming hardmasks
- Patent number 11,699,585
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Jui-Yuan Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma parameters and skew characterization by high speed imaging
- Patent number 11,545,376
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Sidharth Bhatia
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Graded dimple height pattern on heater for lower backside damage an...
- Patent number 11,515,191
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Vivek B. Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma density control on substrate edge
- Patent number 11,495,440
- Issue date Nov 8, 2022
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chucking process and system for substrate processing chambers
- Patent number 11,488,811
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Bhaskar Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for removing contaminant particles in a plasm...
- Patent number 11,120,976
- Issue date Sep 14, 2021
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote capacitively coupled plasma source with improved ion blocker
- Patent number 11,069,514
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Vivek B Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique to prevent aluminum fluoride build up on the heater
- Patent number 10,892,143
- Issue date Jan 12, 2021
- Applied Materials, Inc.
- Vivek Bharat Shah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma density control on substrate edge
- Patent number 10,790,121
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma parameters and skew characterization by high speed imaging
- Patent number 10,748,797
- Issue date Aug 18, 2020
- Applied Materials, Inc.
- Sidharth Bhatia
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and methods for removing contaminant particles in a plasm...
- Patent number 10,714,319
- Issue date Jul 14, 2020
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aluminum fluoride mitigation by plasma treatment
- Patent number 10,688,538
- Issue date Jun 23, 2020
- Applied Materials, Inc.
- Vivek Bharat Shah
- B08 - CLEANING
Information Patent Grant
Selective poreseal deposition prevention and residue removal using SAM
- Patent number 10,074,559
- Issue date Sep 11, 2018
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect integration for sidewall pore seal and via cleanliness
- Patent number 9,793,108
- Issue date Oct 17, 2017
- Applied Material, Inc.
- He Ren
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gallium arsenide based materials used in thin film transistor appli...
- Patent number 9,780,223
- Issue date Oct 3, 2017
- Applied Materials, Inc.
- Kaushal K. Singh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Aluminum nitride barrier layer
- Patent number 9,646,876
- Issue date May 9, 2017
- Applied Materials, Inc.
- Deenesh Padhi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film encapsulation-thin ultra high barrier layer for OLED appl...
- Patent number 9,252,392
- Issue date Feb 2, 2016
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High quality TCO-silicon interface contact structure for high effic...
- Patent number 8,895,842
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Shuran Sheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High efficiency thin film transistor device with gallium arsenide l...
- Patent number 8,846,437
- Issue date Sep 30, 2014
- Applied Materials, Inc.
- Kaushal K. Singh
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER
- Publication number 20240271284
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Kallol BERA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER
- Publication number 20230343586
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Anup Kumar SINGH
- B08 - CLEANING
Information Patent Application
STRESS TREATMENTS FOR COVER WAFERS
- Publication number 20230069395
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHUCKING PROCESS AND SYSTEM FOR SUBSTRATE PROCESSING CHAMBERS
- Publication number 20230048661
- Publication date Feb 16, 2023
- Applied Materials, Inc.
- Bhaskar KUMAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CFX LAYER TO PROTECT ALUMINUM SURFACE FROM OVER-OXIDATION
- Publication number 20220178017
- Publication date Jun 9, 2022
- Applied Materials, Inc.
- Anup Kumar SINGH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON CVD DEPOSITION METHODS TO MITIGATE STRESS INDUCED DEFECTS
- Publication number 20220178026
- Publication date Jun 9, 2022
- Applied Materials, Inc.
- Vinayak Vishwanath HASSAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF FORMING HARDMASKS
- Publication number 20220122835
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Jui-Yuan HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF SEASONING PROCESS CHAMBERS
- Publication number 20220122821
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Vinayak Vishwanath HASSAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER
- Publication number 20220102141
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Anup Kumar SINGH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION
- Publication number 20220064797
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Akshay DHANAKSHIRUR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Remote Capacitively Coupled Plasma Source with Improved Ion Blocker
- Publication number 20210351020
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Vivek B. Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER
- Publication number 20210269919
- Publication date Sep 2, 2021
- Applied Materials, Inc.
- Kallol BERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES TO IMPROVE ADHESION AND DEFECTS FOR TUNGSTEN CARBIDE FILM
- Publication number 20210108309
- Publication date Apr 15, 2021
- Applied Materials, Inc.
- Vivek Bharat SHAH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA DENSITY CONTROL ON SUBSTRATE EDGE
- Publication number 20200381222
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Bhaskar KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PARAMETERS AND SKEW CHARACTERIZATION BY HIGH SPEED IMAGING
- Publication number 20200357668
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Sidharth BHATIA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHODS FOR REMOVING CONTAMINANT PARTICLES IN A PLASM...
- Publication number 20200350146
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- Bhaskar KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHUCKING PROCESS AND SYSTEM FOR SUBSTRATE PROCESSING CHAMBERS
- Publication number 20200286716
- Publication date Sep 10, 2020
- Applied Materials, Inc.
- Bhaskar KUMAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GRADED DIMPLE HEIGHT PATTERN ON HEATER FOR LOWER BACKSIDE DAMAGE AN...
- Publication number 20200135530
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- Vivek B. Shah
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Remote Capacitively Coupled Plasma Source With Improved Ion Blocker
- Publication number 20200035467
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Vivek B. Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR REMOVING CONTAMINANT PARTICLES IN A PLASM...
- Publication number 20190259585
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- Bhaskar KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DENSITY CONTROL ON SUBSTRATE EDGE
- Publication number 20180294146
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Bhaskar KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PHASE PARTICLE REDUCTION IN PECVD CHAMBER
- Publication number 20180294139
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Bhaskar KUMAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PORESEAL DEPOSITION PREVENTION AND RESIDUE REMOVAL USING SAM
- Publication number 20180261500
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PARAMETERS AND SKEW CHARACTERIZATION BY HIGH SPEED IMAGING
- Publication number 20180204750
- Publication date Jul 19, 2018
- Applied Materials, Inc.
- Sidharth BHATIA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TECHNIQUE TO PREVENT ALUMINUM FLUORIDE BUILD UP ON THE HEATER
- Publication number 20180114679
- Publication date Apr 26, 2018
- Applied Materials, Inc.
- Vivek Bharat SHAH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALUMINUM FLUORIDE MITIGATION BY PLASMA TREATMENT
- Publication number 20180036775
- Publication date Feb 8, 2018
- Applied Materials, Inc.
- Vivek Bharat SHAH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERCONNECT INTEGRATION FOR SIDEWALL PORE SEAL AND VIA CLEANLINESS
- Publication number 20160379819
- Publication date Dec 29, 2016
- Applied Materials, Inc.
- He REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GALLIUM ARSENIDE BASED MATERIALS USED IN THIN FILM TRANSISTOR APPLI...
- Publication number 20160322509
- Publication date Nov 3, 2016
- Applied Materials, Inc.
- Kaushal K. SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALUMINUM NITRIDE BARRIER LAYER
- Publication number 20160254181
- Publication date Sep 1, 2016
- Applied Materials, Inc.
- Deenesh Padhi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SEALANT REMOVAL
- Publication number 20160172238
- Publication date Jun 16, 2016
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS

Bhaskar Kumar

Person

Patents Grantslast 30 patents

Stress treatments for cover wafers

Method of using dual frequency RF power in a process chamber

Chucking process and system for substrate processing chambers

Methods of seasoning process chambers

Shunt door for magnets in plasma process chamber

Techniques to improve adhesion and defects for tungsten carbide film

Method of using dual frequency RF power in a process chamber

Methods of forming hardmasks

Plasma parameters and skew characterization by high speed imaging

Graded dimple height pattern on heater for lower backside damage an...

Plasma density control on substrate edge

Chucking process and system for substrate processing chambers

Apparatus and methods for removing contaminant particles in a plasm...

Remote capacitively coupled plasma source with improved ion blocker

Technique to prevent aluminum fluoride build up on the heater

Plasma density control on substrate edge

Plasma parameters and skew characterization by high speed imaging

Apparatus and methods for removing contaminant particles in a plasm...

Aluminum fluoride mitigation by plasma treatment

Selective poreseal deposition prevention and residue removal using SAM

Interconnect integration for sidewall pore seal and via cleanliness

Gallium arsenide based materials used in thin film transistor appli...

Aluminum nitride barrier layer

Thin film encapsulation-thin ultra high barrier layer for OLED appl...

High quality TCO-silicon interface contact structure for high effic...

High efficiency thin film transistor device with gallium arsenide l...

Patents Applicationslast 30 patents

SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER

METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER

STRESS TREATMENTS FOR COVER WAFERS

CHUCKING PROCESS AND SYSTEM FOR SUBSTRATE PROCESSING CHAMBERS

CFX LAYER TO PROTECT ALUMINUM SURFACE FROM OVER-OXIDATION

CARBON CVD DEPOSITION METHODS TO MITIGATE STRESS INDUCED DEFECTS

METHODS OF FORMING HARDMASKS

METHODS OF SEASONING PROCESS CHAMBERS

METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER

SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION

Remote Capacitively Coupled Plasma Source with Improved Ion Blocker

SHUNT DOOR FOR MAGNETS IN PLASMA PROCESS CHAMBER

TECHNIQUES TO IMPROVE ADHESION AND DEFECTS FOR TUNGSTEN CARBIDE FILM

PLASMA DENSITY CONTROL ON SUBSTRATE EDGE

PLASMA PARAMETERS AND SKEW CHARACTERIZATION BY HIGH SPEED IMAGING

APPARATUS AND METHODS FOR REMOVING CONTAMINANT PARTICLES IN A PLASM...

CHUCKING PROCESS AND SYSTEM FOR SUBSTRATE PROCESSING CHAMBERS

GRADED DIMPLE HEIGHT PATTERN ON HEATER FOR LOWER BACKSIDE DAMAGE AN...

Remote Capacitively Coupled Plasma Source With Improved Ion Blocker

APPARATUS AND METHODS FOR REMOVING CONTAMINANT PARTICLES IN A PLASM...

PLASMA DENSITY CONTROL ON SUBSTRATE EDGE

GAS PHASE PARTICLE REDUCTION IN PECVD CHAMBER

SELECTIVE PORESEAL DEPOSITION PREVENTION AND RESIDUE REMOVAL USING SAM

PLASMA PARAMETERS AND SKEW CHARACTERIZATION BY HIGH SPEED IMAGING

TECHNIQUE TO PREVENT ALUMINUM FLUORIDE BUILD UP ON THE HEATER

ALUMINUM FLUORIDE MITIGATION BY PLASMA TREATMENT

INTERCONNECT INTEGRATION FOR SIDEWALL PORE SEAL AND VIA CLEANLINESS

GALLIUM ARSENIDE BASED MATERIALS USED IN THIN FILM TRANSISTOR APPLI...

ALUMINUM NITRIDE BARRIER LAYER

SELECTIVE SEALANT REMOVAL