Bikram Kapoor

Person

Santa Cruz, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reactive ion etching for semiconductor device feature topography mo...
- Patent number 7,628,897
- Issue date Dec 8, 2009
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen assisted HDP-CVD deposition process for aggressive gap-fil...
- Patent number 7,595,088
- Issue date Sep 29, 2009
- Applied Materials, Inc.
- Bikram Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxygen plasma treatment for enhanced HDP-CVD gapfill
- Patent number 7,229,931
- Issue date Jun 12, 2007
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HDP-CVD multistep gapfill process
- Patent number 7,205,240
- Issue date Apr 17, 2007
- Applied Materials, Inc.
- M. Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HDP-CVD uniformity control
- Patent number 6,890,597
- Issue date May 10, 2005
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen assisted HDP-CVD deposition process for aggressive gap-fil...
- Patent number 6,808,748
- Issue date Oct 26, 2004
- Applied Materials, Inc.
- Bikram Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma CVD process for gapfill into high aspect ratio...
- Patent number 6,802,944
- Issue date Oct 12, 2004
- Applied Materials, Inc.
- Farhan Ahmad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlled method of silicon-rich oxide deposition using HDP-CVD
- Patent number 6,458,722
- Issue date Oct 1, 2002
- Applied Materials, Inc.
- Bikram Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Oxygen plasma treatment for enhanced HDP-CVD gapfill
- Publication number 20050282398
- Publication date Dec 22, 2005
- APPLIED MATERIALS, INC., A Delaware corporation
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microcontamination abatement in semiconductor processing
- Publication number 20050260356
- Publication date Nov 24, 2005
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hydrogen assisted HDP-CVD deposition process for aggressive gap-fil...
- Publication number 20050008790
- Publication date Jan 13, 2005
- Applied Materials, Inc.
- Bikram Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HDP-CVD MULTISTEP GAPFILL PROCESS
- Publication number 20040245091
- Publication date Dec 9, 2004
- Applied Materials, Inc.
- M Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HDP-CVD uniformity control
- Publication number 20040224090
- Publication date Nov 11, 2004
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYDROGEN ASSISTED HDP-CVD DEPOSITION PROCESS FOR AGGRESSIVE GAP-FIL...
- Publication number 20040146661
- Publication date Jul 29, 2004
- Applied Materials, Inc.
- Bikram Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reactive ion etching for semiconductor device feature topography mo...
- Publication number 20040079728
- Publication date Apr 29, 2004
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High density plasma CVD process for gapfill into high aspect ratio...
- Publication number 20040079632
- Publication date Apr 29, 2004
- Applied Materials, Inc.
- Farhan Ahmad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Bikram Kapoor

Person

Patents Grantslast 30 patents

Reactive ion etching for semiconductor device feature topography mo...

Hydrogen assisted HDP-CVD deposition process for aggressive gap-fil...

Oxygen plasma treatment for enhanced HDP-CVD gapfill

HDP-CVD multistep gapfill process

HDP-CVD uniformity control

Hydrogen assisted HDP-CVD deposition process for aggressive gap-fil...

High density plasma CVD process for gapfill into high aspect ratio...

Controlled method of silicon-rich oxide deposition using HDP-CVD

Patents Applicationslast 30 patents

Oxygen plasma treatment for enhanced HDP-CVD gapfill

Microcontamination abatement in semiconductor processing

Hydrogen assisted HDP-CVD deposition process for aggressive gap-fil...

HDP-CVD MULTISTEP GAPFILL PROCESS

HDP-CVD uniformity control

HYDROGEN ASSISTED HDP-CVD DEPOSITION PROCESS FOR AGGRESSIVE GAP-FIL...

Reactive ion etching for semiconductor device feature topography mo...

High density plasma CVD process for gapfill into high aspect ratio...