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Bill Crane
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Boise, ID, US
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Patents Grants
last 30 patents
Information
Patent Grant
Conditioning of a reaction chamber
Patent number
7,273,817
Issue date
Sep 25, 2007
Micron Technology, Inc.
William A. Polinsky
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Conditioning of a reaction chamber
Patent number
7,022,620
Issue date
Apr 4, 2006
Micron Technology, Inc.
William A. Polinsky
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for facilitating removal of material from the...
Patent number
5,707,485
Issue date
Jan 13, 1998
Micron Technology, Inc.
J. Brett Rolfson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method to remove fluorine residues from bond pads
Patent number
5,380,401
Issue date
Jan 10, 1995
Micron Technology, Inc.
Curtis S. Jones
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Anisotropic etch method
Patent number
5,169,487
Issue date
Dec 8, 1992
Micron Technology, Inc.
Rod C. Langley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Temperature controlled anode for plasma dry etchers for etching sem...
Patent number
4,859,304
Issue date
Aug 22, 1989
Micron Technology, Inc.
David A. Cathey
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
Conditioning of a reaction chamber
Publication number
20060202394
Publication date
Sep 14, 2006
William A. Polinsky
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Conditioning of a reaction chamber
Publication number
20050106891
Publication date
May 19, 2005
William A. Polinsky
H01 - BASIC ELECTRIC ELEMENTS