Bill Stanton

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Masks for microlithography and methods of making and using such masks
- Patent number 8,859,168
- Issue date Oct 14, 2014
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor constructions
- Patent number 8,785,989
- Issue date Jul 22, 2014
- Micron Technology, Inc.
- Lucien J. Bissey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for lithographic simulation and verification
- Patent number 8,595,655
- Issue date Nov 26, 2013
- Micron Technology, Inc.
- Fei Wang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Photomask constructions having liners of specified compositions alo...
- Patent number 8,589,826
- Issue date Nov 19, 2013
- Micron Technology, Inc.
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for defining evaluation points for optical proximity correc...
- Patent number 8,584,058
- Issue date Nov 12, 2013
- Micron Technology, Inc.
- John R. C. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography systems and associated methods of selective die ex...
- Patent number 8,547,526
- Issue date Oct 1, 2013
- Micron Technology, Inc.
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask constructions having liners of specified compositions alo...
- Patent number 8,365,101
- Issue date Jan 29, 2013
- Micron Technology, Inc.
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inverted variable resistance memory cell and method of making the same
- Patent number 8,263,962
- Issue date Sep 11, 2012
- Micron Technology, Inc.
- William Arthur Stanton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for defining evaluation points for optical proximity correc...
- Patent number 8,037,446
- Issue date Oct 11, 2011
- Micron Technology, Inc.
- John R. C. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structures with increased photo-alignment margins
- Patent number 8,030,222
- Issue date Oct 4, 2011
- Round Rock Research, LLC
- Luan Tran
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Masks for microlithography and methods of making and using such masks
- Patent number 7,972,753
- Issue date Jul 5, 2011
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of patterning photoresist, and methods of forming semicondu...
- Patent number 7,964,503
- Issue date Jun 21, 2011
- Micron Technology, Inc.
- Lucien J. Bissey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming and using reticles
- Patent number 7,932,003
- Issue date Apr 26, 2011
- Micron Technology, Inc.
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming photomasks
- Patent number 7,930,657
- Issue date Apr 19, 2011
- Micron Technology, Inc.
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guided-mode-resonance transmission color filters for color generati...
- Patent number 7,858,921
- Issue date Dec 28, 2010
- Aptina Imaging Corporation
- William A. Stanton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Masks for microlithography and methods of making and using such masks
- Patent number 7,838,178
- Issue date Nov 23, 2010
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for lithographic simulation and verification
- Patent number 7,818,710
- Issue date Oct 19, 2010
- Micron Technology, Inc.
- Fei Wang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Optimized optical lithography illumination source for use during th...
- Patent number 7,760,329
- Issue date Jul 20, 2010
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming and using reticles
- Patent number 7,754,395
- Issue date Jul 13, 2010
- Micron Technology, Inc.
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inverted variable resistance memory cell and method of making the same
- Patent number 7,718,533
- Issue date May 18, 2010
- Micron Technology, Inc.
- William Arthur Stanton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of patterning photoresist, and methods of forming semicondu...
- Patent number 7,432,197
- Issue date Oct 7, 2008
- Micron Technology, Inc.
- Lucien J. Bissey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming radiation-patterning tools; carrier waves and co...
- Patent number 7,401,010
- Issue date Jul 15, 2008
- Micron Technology, Inc.
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for increasing photo alignment margins
- Patent number 7,368,362
- Issue date May 6, 2008
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for increasing photo-alignment margins
- Patent number 7,361,569
- Issue date Apr 22, 2008
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming patterned reticles
- Patent number 7,350,182
- Issue date Mar 25, 2008
- Micron Technology, Inc.
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized optical lithography illumination source for use during th...
- Patent number 7,283,205
- Issue date Oct 16, 2007
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to increase throughput of processing using pul...
- Patent number 7,282,666
- Issue date Oct 16, 2007
- Micron Technology, Inc.
- Vishnu K. Agarwal
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods for generating or designing sidelobe inhibitors for radiati...
- Patent number 7,276,315
- Issue date Oct 2, 2007
- Micron Technology, Inc.
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask having transmissive elements and a common sidelobe inhibitor f...
- Patent number 7,273,684
- Issue date Sep 25, 2007
- Micron Technology, Inc.
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for increasing photo-alignment margins
- Patent number 7,268,054
- Issue date Sep 11, 2007
- Micron Technology, Inc.
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Photomask Constructions Having Liners of Specified Compositions Alo...
- Publication number 20130137017
- Publication date May 30, 2013
- Micron Technology, Inc.
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS
- Publication number 20130130163
- Publication date May 23, 2013
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES WITH INCREASED PHOTO-ALIGNMENT MARGINS
- Publication number 20120044735
- Publication date Feb 23, 2012
- ROUND ROCK RESEARCH, LLC
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORREC...
- Publication number 20120030638
- Publication date Feb 2, 2012
- Micron Technology, Inc.
- John R. C. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS
- Publication number 20110256644
- Publication date Oct 20, 2011
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Constructions
- Publication number 20110215387
- Publication date Sep 8, 2011
- Micron Technology, Inc.
- Lucien J. Bissey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomasks and Methods Of Forming Photomasks
- Publication number 20110165506
- Publication date Jul 7, 2011
- Micron Technology, Inc.
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS
- Publication number 20110045388
- Publication date Feb 24, 2011
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR LITHOGRAPHIC SIMULATION AND VERIFICATION
- Publication number 20110010677
- Publication date Jan 13, 2011
- Fei Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOLITHOGRAPHY SYSTEMS AND ASSOCIATED METHODS OF SELECTIVE DIE EX...
- Publication number 20100253929
- Publication date Oct 7, 2010
- Micron Technology, Inc.
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods Of Forming And Using Reticles
- Publication number 20100248094
- Publication date Sep 30, 2010
- Micron Technology, Inc.
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INVERTED VARIABLE RESISTANCE MEMORY CELL AND METHOD OF MAKING THE SAME
- Publication number 20100193765
- Publication date Aug 5, 2010
- William Arthur Stanton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORREC...
- Publication number 20100017778
- Publication date Jan 21, 2010
- Micron Technology, Inc.
- John R. C. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDED-MODE-RESONANCE TRANSMISSION COLOR FILTERS FOR COLOR GENERATI...
- Publication number 20090272880
- Publication date Nov 5, 2009
- Micron Technology, Inc.
- William A. Stanton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RE...
- Publication number 20090226823
- Publication date Sep 10, 2009
- Micron Technology, Inc.
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomasks and Methods Of Forming Photomasks
- Publication number 20090186283
- Publication date Jul 23, 2009
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS
- Publication number 20090047583
- Publication date Feb 19, 2009
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR LITHOGRAPHIC SIMULATION AND VERIFICATION
- Publication number 20090012769
- Publication date Jan 8, 2009
- Fei Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photomasks Used to Fabricate Integrated Circuitry, Finished-Constru...
- Publication number 20080311485
- Publication date Dec 18, 2008
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Patterning Photoresist, and Methods of Forming Semicondu...
- Publication number 20080311528
- Publication date Dec 18, 2008
- Lucien J. Bissey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR DEFECT-FREE MICROLITHOGRAPHY
- Publication number 20080297753
- Publication date Dec 4, 2008
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticles, and methods of treating reticles, configuring reticles an...
- Publication number 20080286699
- Publication date Nov 20, 2008
- William Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inverted variable resistance memory cell and method of making the same
- Publication number 20080277641
- Publication date Nov 13, 2008
- William Arthur Stanton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTIMIZED OPTICAL LITHOGRAPHY ILLUMINATION SOURCE FOR USE DURING TH...
- Publication number 20080043214
- Publication date Feb 21, 2008
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor constructions, methods of patterning photoresist, and...
- Publication number 20070178711
- Publication date Aug 2, 2007
- Micron Technology, Inc.
- Lucien J. Bissey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Structures with increased photo-alignment margins
- Publication number 20060264001
- Publication date Nov 23, 2006
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for increasing photo-alignment margins
- Publication number 20060264000
- Publication date Nov 23, 2006
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for increasing photo-alignment margins
- Publication number 20060264002
- Publication date Nov 23, 2006
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for increasing photo alignment margins
- Publication number 20060228854
- Publication date Oct 12, 2006
- Luan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimized optical lithography illumination source for use during th...
- Publication number 20060216844
- Publication date Sep 28, 2006
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Bill Stanton

Person

Patents Grantslast 30 patents

Masks for microlithography and methods of making and using such masks

Semiconductor constructions

Method and system for lithographic simulation and verification

Photomask constructions having liners of specified compositions alo...

Methods for defining evaluation points for optical proximity correc...

Photolithography systems and associated methods of selective die ex...

Photomask constructions having liners of specified compositions alo...

Inverted variable resistance memory cell and method of making the same

Methods for defining evaluation points for optical proximity correc...

Structures with increased photo-alignment margins

Masks for microlithography and methods of making and using such masks

Methods of patterning photoresist, and methods of forming semicondu...

Methods of forming and using reticles

Methods of forming photomasks

Guided-mode-resonance transmission color filters for color generati...

Masks for microlithography and methods of making and using such masks

Method and system for lithographic simulation and verification

Optimized optical lithography illumination source for use during th...

Methods of forming and using reticles

Inverted variable resistance memory cell and method of making the same

Methods of patterning photoresist, and methods of forming semicondu...

Methods of forming radiation-patterning tools; carrier waves and co...

Methods for increasing photo alignment margins

Methods for increasing photo-alignment margins

Methods of forming patterned reticles

Optimized optical lithography illumination source for use during th...

Method and apparatus to increase throughput of processing using pul...

Methods for generating or designing sidelobe inhibitors for radiati...

Mask having transmissive elements and a common sidelobe inhibitor f...

Methods for increasing photo-alignment margins

Patents Applicationslast 30 patents

Photomask Constructions Having Liners of Specified Compositions Alo...

MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS

STRUCTURES WITH INCREASED PHOTO-ALIGNMENT MARGINS

METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORREC...

MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS

Semiconductor Constructions

Photomasks and Methods Of Forming Photomasks

MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS

METHOD AND SYSTEM FOR LITHOGRAPHIC SIMULATION AND VERIFICATION

PHOTOLITHOGRAPHY SYSTEMS AND ASSOCIATED METHODS OF SELECTIVE DIE EX...

Methods Of Forming And Using Reticles

INVERTED VARIABLE RESISTANCE MEMORY CELL AND METHOD OF MAKING THE SAME

METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORREC...

GUIDED-MODE-RESONANCE TRANSMISSION COLOR FILTERS FOR COLOR GENERATI...

RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RE...

Photomasks and Methods Of Forming Photomasks

MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS

METHOD AND SYSTEM FOR LITHOGRAPHIC SIMULATION AND VERIFICATION

Photomasks Used to Fabricate Integrated Circuitry, Finished-Constru...

Methods of Patterning Photoresist, and Methods of Forming Semicondu...

APPARATUS AND METHOD FOR DEFECT-FREE MICROLITHOGRAPHY

Reticles, and methods of treating reticles, configuring reticles an...

Inverted variable resistance memory cell and method of making the same

OPTIMIZED OPTICAL LITHOGRAPHY ILLUMINATION SOURCE FOR USE DURING TH...

Semiconductor constructions, methods of patterning photoresist, and...

Structures with increased photo-alignment margins

Methods for increasing photo-alignment margins

Methods for increasing photo-alignment margins

Methods for increasing photo alignment margins

Optimized optical lithography illumination source for use during th...