Bin Hu

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mask layout patterns for closely spaced primitives in phase shift p...
- Patent number 9,122,169
- Issue date Sep 1, 2015
- Intel Corporation
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask design and OPC for device manufacture
- Patent number 8,778,605
- Issue date Jul 15, 2014
- Intel Corporation
- Shem Ogadhoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask design and OPC for device manufacture
- Patent number 8,404,403
- Issue date Mar 26, 2013
- Intel Corporation
- Shem Ogadhoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase-shifting masks with sub-wavelength diffractive optical elements
- Patent number 8,122,388
- Issue date Feb 21, 2012
- Intel Corporation
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifting masks with sub-wavelength diffractive optical elements
- Patent number 8,112,726
- Issue date Feb 7, 2012
- Intel Corporation
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask design using library of corrections
- Patent number 7,603,648
- Issue date Oct 13, 2009
- Intel Corporation
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase-shifting masks with sub-wavelength diffractive optical elements
- Patent number 7,512,926
- Issue date Mar 31, 2009
- Intel Corporation
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modification of pixelated photolithography masks based on electric...
- Patent number 7,325,223
- Issue date Jan 29, 2008
- Intel Corporation
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MASK LAYOUT PATTERNS FOR CLOSELY SPACED PRIMITIVES IN PHASE SHIFT P...
- Publication number 20140302427
- Publication date Oct 9, 2014
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DESIGN AND OPC FOR DEVICE MANUFACTURE
- Publication number 20130149638
- Publication date Jun 13, 2013
- Shem OGADHOH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK DESIGN AND OPC FOR DEVICE MANUFACTURE
- Publication number 20110318672
- Publication date Dec 29, 2011
- Shem Ogadhoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Phase-shifting masks with sub-wavelength diffractive opical elements
- Publication number 20090170012
- Publication date Jul 2, 2009
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shifting masks with sub-wavelength diffractive optical elements
- Publication number 20090100400
- Publication date Apr 16, 2009
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shifting masks with sub-wavelength diffractive optical elements
- Publication number 20070094959
- Publication date May 3, 2007
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Determining an optimizaton for generating a pixelated photolithogra...
- Publication number 20070006113
- Publication date Jan 4, 2007
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modification of pixelated photolithography masks based on electric...
- Publication number 20060225024
- Publication date Oct 5, 2006
- Bin Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Quick mask design
- Publication number 20050244728
- Publication date Nov 3, 2005
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING

Person

Patents Grantslast 30 patents

Mask layout patterns for closely spaced primitives in phase shift p...

Mask design and OPC for device manufacture

Mask design and OPC for device manufacture

Phase-shifting masks with sub-wavelength diffractive optical elements

Phase-shifting masks with sub-wavelength diffractive optical elements

Mask design using library of corrections

Phase-shifting masks with sub-wavelength diffractive optical elements

Modification of pixelated photolithography masks based on electric...

Patents Applicationslast 30 patents

MASK LAYOUT PATTERNS FOR CLOSELY SPACED PRIMITIVES IN PHASE SHIFT P...

MASK DESIGN AND OPC FOR DEVICE MANUFACTURE

MASK DESIGN AND OPC FOR DEVICE MANUFACTURE

Phase-shifting masks with sub-wavelength diffractive opical elements

Phase-shifting masks with sub-wavelength diffractive optical elements

Phase-shifting masks with sub-wavelength diffractive optical elements

Determining an optimizaton for generating a pixelated photolithogra...

Modification of pixelated photolithography masks based on electric...

Quick mask design