Bjorn O. Pedersen

Person

Chelmsford, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Indirectly heated cathode ion source
- Patent number 7,138,768
- Issue date Nov 21, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Peter E. Maciejowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faraday dose and uniformity monitor for plasma based ion implantation
- Patent number 7,132,672
- Issue date Nov 7, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer platen equipped with electrostatic clamp, wafer backside gas...
- Patent number 7,126,808
- Issue date Oct 24, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for ion beam neutralization in magnets
- Patent number 6,762,423
- Issue date Jul 13, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for operating high energy accelerator in low...
- Patent number 6,653,642
- Issue date Nov 25, 2003
- Varian Semiconductor Equipment Associates, Inc.
- Bjorn O. Pedersen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Dose monitor for plasma doping system
- Patent number 6,020,592
- Issue date Feb 1, 2000
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling thermal transfer in a cyclic vacuum proce...
- Patent number 4,527,620
- Issue date Jul 9, 1985
- Varian Associates, Inc.
- Bjorn O. Pedersen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Faraday dose and uniformity monitor for plasma based ion implantation
- Publication number 20050223991
- Publication date Oct 13, 2005
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer platen equipped with electrostatic clamp, wafer backside gas...
- Publication number 20040196616
- Publication date Oct 7, 2004
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR ION BEAM NEUTRALIZATION IN MAGNETS
- Publication number 20040084635
- Publication date May 6, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Indirectly heated cathode ion source
- Publication number 20030218428
- Publication date Nov 27, 2003
- Peter E. Maciejowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for plasma doping by anode pulsing
- Publication number 20030079688
- Publication date May 1, 2003
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose monitor for plasma doping system
- Publication number 20020030167
- Publication date Mar 14, 2002
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for operating high energy accelerator in low...
- Publication number 20010040220
- Publication date Nov 15, 2001
- Varian Semiconductor Equipment Associates, Inc.
- Bjorn O. Pedersen
- H01 - BASIC ELECTRIC ELEMENTS

Bjorn O. Pedersen

Person

Patents Grantslast 30 patents

Indirectly heated cathode ion source

Faraday dose and uniformity monitor for plasma based ion implantation

Wafer platen equipped with electrostatic clamp, wafer backside gas...

Methods and apparatus for ion beam neutralization in magnets

Methods and apparatus for operating high energy accelerator in low...

Dose monitor for plasma doping system

Apparatus for controlling thermal transfer in a cyclic vacuum proce...

Patents Applicationslast 30 patents

Faraday dose and uniformity monitor for plasma based ion implantation

Wafer platen equipped with electrostatic clamp, wafer backside gas...

METHODS AND APPARATUS FOR ION BEAM NEUTRALIZATION IN MAGNETS

Indirectly heated cathode ion source

Methods and apparatus for plasma doping by anode pulsing

Dose monitor for plasma doping system

Methods and apparatus for operating high energy accelerator in low...