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Blake Parkinson
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Albany, NY, US
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last 30 patents
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Patent Grant
Etching method to form spacers having multiple film layers
Patent number
9,378,975
Issue date
Jun 28, 2016
Tokyo Electron Limited
Blake Parkinson
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Method to improve etch selectivity during silicon nitride spacer etch
Patent number
9,318,343
Issue date
Apr 19, 2016
Tokyo Electron Limited
Alok Ranjan
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
Method to Improve Etch Selectivity During Silicon Nitride Spacer Etch
Publication number
20150364338
Publication date
Dec 17, 2015
TOKYO ELECTRON LIMITED
Alok Ranjan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Etching Method to Form Spacers Having Multiple Film Layers
Publication number
20150228499
Publication date
Aug 13, 2015
TOKYO ELECTRON LIMITED
Blake Parkinson
H01 - BASIC ELECTRIC ELEMENTS