Bo H. Vanderberg

Person

Boston, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Scanning magnet design with enhanced efficiency
- Patent number 11,114,270
- Issue date Sep 7, 2021
- Axcelis Technologies, Inc.
- Bo Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scan and corrector magnet designs for high throughput scanned beam...
- Patent number 11,037,754
- Issue date Jun 15, 2021
- Axcelis Technologies, Inc.
- Edward Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scan and corrector magnet designs for high throughput scanned beam...
- Patent number 10,553,392
- Issue date Feb 4, 2020
- Axcelis Technologies, Inc.
- Edward Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam profiling speed enhancement for scanned beam implanters
- Patent number 10,483,086
- Issue date Nov 19, 2019
- Axcelis Technologies, Inc.
- Andy M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation system having beam angle control in drift and dece...
- Patent number 10,037,877
- Issue date Jul 31, 2018
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method to improve productivity of hybrid scan ion beam i...
- Patent number 9,711,329
- Issue date Jul 18, 2017
- Axelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined electrostatic lens system for ion implantation
- Patent number 9,679,739
- Issue date Jun 13, 2017
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid scanning for ion implantation
- Patent number 9,443,698
- Issue date Sep 13, 2016
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated extraction electrode manipulator for ion source
- Patent number 9,318,302
- Issue date Apr 19, 2016
- Axcelis Technologies, Inc.
- Bo Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam line design to reduce energy contamination
- Patent number 8,963,107
- Issue date Feb 24, 2015
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G01 - MEASURING TESTING
Information Patent Grant
Microwave plasma electron flood
- Patent number 8,760,054
- Issue date Jun 24, 2014
- Axcelis Technologies. Inc.
- William DiVergilio
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for ion implantation with improved productivity a...
- Patent number 8,637,838
- Issue date Jan 28, 2014
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for ion implantation with improved productivity a...
- Patent number 8,502,173
- Issue date Aug 6, 2013
- Axcelis Technologies. Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity of a scanned ion beam
- Patent number 8,378,313
- Issue date Feb 19, 2013
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for ion implantation with improved productivity a...
- Patent number 8,278,634
- Issue date Oct 2, 2012
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced low energy ion beam transport in ion implantation
- Patent number 8,237,135
- Issue date Aug 7, 2012
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic scanning system with improved efficiency
- Patent number 8,138,484
- Issue date Mar 20, 2012
- Axcelis Technologies. Inc.
- Bo Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter having combined hybrid and double mechanical scan arc...
- Patent number 8,124,947
- Issue date Feb 28, 2012
- Axcelis Technologies. Inc.
- Manny Sieradzki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-decel magnetic energy filter for ion implantation systems
- Patent number 8,124,946
- Issue date Feb 28, 2012
- Axcelis Technologies. Inc.
- Geoffrey Ryding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measurement of beam angle in ion implantation
- Patent number 7,897,944
- Issue date Mar 1, 2011
- Axcelis Technologies, Inc.
- Robert J. Mitchell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma electron flood for ion beam implanter
- Patent number 7,800,083
- Issue date Sep 21, 2010
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for two-dimensional beam scan across a workpiece...
- Patent number 7,750,320
- Issue date Jul 6, 2010
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for ion beam profiling
- Patent number 7,701,230
- Issue date Apr 20, 2010
- Axcelis Technologies, Inc.
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam angle adjustment in ion implanters
- Patent number 7,696,494
- Issue date Apr 13, 2010
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for magnetic scanning and correction of an ion beam
- Patent number 7,615,763
- Issue date Nov 10, 2009
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter having combined hybrid and double mechanical scan arc...
- Patent number 7,586,111
- Issue date Sep 8, 2009
- Axcelis Technologies, Inc.
- Manny Sieradzki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Throughput enhancement for scanned beam ion implanters
- Patent number 7,566,886
- Issue date Jul 28, 2009
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam scanning control methods and systems for ion implantation...
- Patent number 7,550,751
- Issue date Jun 23, 2009
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Beam line architecture for ion implanter
- Patent number 7,507,978
- Issue date Mar 24, 2009
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source
- Patent number 7,435,971
- Issue date Oct 14, 2008
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SCAN AND CORRECTOR MAGNET DESIGNS FOR HIGH THROUGHPUT SCANNED BEAM...
- Publication number 20200194221
- Publication date Jun 18, 2020
- Axcelis Technologies, Inc.
- Edward Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING MAGNET DESIGN WITH ENHANCED EFFICIENCY
- Publication number 20200066478
- Publication date Feb 27, 2020
- Axcelis Technologies, Inc.
- Bo Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Combined Electrostatic Lens System for Ion Implantation
- Publication number 20160189912
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam Profiling Speed Enhancement for Scanned Beam Implanters
- Publication number 20160189926
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Andy M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WIT...
- Publication number 20160189917
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD TO IMPROVE PRODUCTIVITY OF HYBRID SCAN ION BEAM I...
- Publication number 20160189928
- Publication date Jun 30, 2016
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM LINE DESIGN TO REDUCE ENERGY CONTAMINATION
- Publication number 20130181139
- Publication date Jul 18, 2013
- Axcelis Technologies, Inc.
- Edward C. EISNER
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR ION IMPLANTATION WITH IMPROVED PRODUCTIVITY A...
- Publication number 20130146760
- Publication date Jun 13, 2013
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Ion Implantation with Improved Productivity a...
- Publication number 20130026356
- Publication date Jan 31, 2013
- Axcelis Technologies Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniformity of a Scanned Ion Beam
- Publication number 20120248326
- Publication date Oct 4, 2012
- Axcelis Technologies, Inc.
- Edward C. Eisner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MICROWAVE PLASMA ELECTRON FLOOD
- Publication number 20120187842
- Publication date Jul 26, 2012
- Axcelis Technologies, Inc.
- William F. DiVergilio
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Throughput Enhancement for Scanned Beam Ion Implanters
- Publication number 20110272567
- Publication date Nov 10, 2011
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetic Scanning System with Improved Efficiency
- Publication number 20110266456
- Publication date Nov 3, 2011
- Axcelis Technologies, Inc.
- Bo Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Ion Implantation with Improved Productivity a...
- Publication number 20100308215
- Publication date Dec 9, 2010
- Axcelis Technologies Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED LOW ENERGY ION BEAM TRANSPORT IN ION IMPLANTATION
- Publication number 20100181499
- Publication date Jul 22, 2010
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID SCANNING FOR ION IMPLANTATION
- Publication number 20100084576
- Publication date Apr 8, 2010
- Axcelis Technologies,Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION
- Publication number 20100065761
- Publication date Mar 18, 2010
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MEASUREMENT OF BEAM ANGLE IN ION IMPLANTATION
- Publication number 20100012861
- Publication date Jan 21, 2010
- Axcelis Technologies, Inc.
- Robert J. Mitchell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Implanter Having Combined Hybrid and Double Mechanical Scan Arc...
- Publication number 20090321625
- Publication date Dec 31, 2009
- Axcelis Technologies, Inc.
- Manny Sieradzki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-DECEL MAGNETIC ENERGY FILTER FOR ION IMPLANTATION SYSTEMS
- Publication number 20090321630
- Publication date Dec 31, 2009
- Axcelis Technologies, Inc.
- Geoffrey Ryding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ELECTRON FLOOD FOR ION BEAM IMPLANTER
- Publication number 20090114815
- Publication date May 7, 2009
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER HAVING COMBINED HYBRID AND DOUBLE MECHANICAL SCAN ARC...
- Publication number 20090032726
- Publication date Feb 5, 2009
- Manny Sieradzki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ION BEAM PROFILING
- Publication number 20080265866
- Publication date Oct 30, 2008
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for two-dimensional beam scan across a workpiece...
- Publication number 20080149857
- Publication date Jun 26, 2008
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam line architecture for ion implanter
- Publication number 20080078954
- Publication date Apr 3, 2008
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion source
- Publication number 20080067412
- Publication date Mar 20, 2008
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam scanning control methods and systems for ion implantation...
- Publication number 20080067444
- Publication date Mar 20, 2008
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS
- Publication number 20080067442
- Publication date Mar 20, 2008
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System for magnetic scanning and correction of an ion beam
- Publication number 20080067436
- Publication date Mar 20, 2008
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and methods for beam angle adjustment in ion implanters
- Publication number 20080061228
- Publication date Mar 13, 2008
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS

Bo H. Vanderberg

Person

Patents Grantslast 30 patents

Scanning magnet design with enhanced efficiency

Scan and corrector magnet designs for high throughput scanned beam...

Scan and corrector magnet designs for high throughput scanned beam...

Beam profiling speed enhancement for scanned beam implanters

Ion implantation system having beam angle control in drift and dece...

System and method to improve productivity of hybrid scan ion beam i...

Combined electrostatic lens system for ion implantation

Hybrid scanning for ion implantation

Integrated extraction electrode manipulator for ion source

Beam line design to reduce energy contamination

Microwave plasma electron flood

System and method for ion implantation with improved productivity a...

System and method for ion implantation with improved productivity a...

Uniformity of a scanned ion beam

System and method for ion implantation with improved productivity a...

Enhanced low energy ion beam transport in ion implantation

Magnetic scanning system with improved efficiency

Ion implanter having combined hybrid and double mechanical scan arc...

Post-decel magnetic energy filter for ion implantation systems

Method and apparatus for measurement of beam angle in ion implantation

Plasma electron flood for ion beam implanter

System and method for two-dimensional beam scan across a workpiece...

Method and system for ion beam profiling

Beam angle adjustment in ion implanters

System for magnetic scanning and correction of an ion beam

Ion implanter having combined hybrid and double mechanical scan arc...

Throughput enhancement for scanned beam ion implanters

Ion beam scanning control methods and systems for ion implantation...

Beam line architecture for ion implanter

Ion source

Patents Applicationslast 30 patents

SCAN AND CORRECTOR MAGNET DESIGNS FOR HIGH THROUGHPUT SCANNED BEAM...

SCANNING MAGNET DESIGN WITH ENHANCED EFFICIENCY

Combined Electrostatic Lens System for Ion Implantation

Beam Profiling Speed Enhancement for Scanned Beam Implanters

SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WIT...

SYSTEM AND METHOD TO IMPROVE PRODUCTIVITY OF HYBRID SCAN ION BEAM I...

BEAM LINE DESIGN TO REDUCE ENERGY CONTAMINATION

SYSTEM AND METHOD FOR ION IMPLANTATION WITH IMPROVED PRODUCTIVITY A...

System and Method for Ion Implantation with Improved Productivity a...

Uniformity of a Scanned Ion Beam

MICROWAVE PLASMA ELECTRON FLOOD

Throughput Enhancement for Scanned Beam Ion Implanters

Magnetic Scanning System with Improved Efficiency

System and Method for Ion Implantation with Improved Productivity a...

ENHANCED LOW ENERGY ION BEAM TRANSPORT IN ION IMPLANTATION

HYBRID SCANNING FOR ION IMPLANTATION

ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION

METHOD AND APPARATUS FOR MEASUREMENT OF BEAM ANGLE IN ION IMPLANTATION

Ion Implanter Having Combined Hybrid and Double Mechanical Scan Arc...

POST-DECEL MAGNETIC ENERGY FILTER FOR ION IMPLANTATION SYSTEMS

PLASMA ELECTRON FLOOD FOR ION BEAM IMPLANTER

ION IMPLANTER HAVING COMBINED HYBRID AND DOUBLE MECHANICAL SCAN ARC...

METHOD AND SYSTEM FOR ION BEAM PROFILING

System and method for two-dimensional beam scan across a workpiece...

Beam line architecture for ion implanter

Ion source

Ion beam scanning control methods and systems for ion implantation...

BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS

System for magnetic scanning and correction of an ion beam

Systems and methods for beam angle adjustment in ion implanters