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Bo Qi

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  • Sunnyvale, CA, US
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PROCESSES FOR DEPOSITING SIB FILMS
    • Publication number 20240339316
    • Publication date Oct 10, 2024
    • Applied Materials, Inc.
    • Aykut AYDIN
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROCESSES TO DEPOSIT AMORPHOUS-SILICON ETCH PROTECTION LINER
    • Publication number 20240321589
    • Publication date Sep 26, 2024
    • Applied Materials, Inc.
    • Zeqing SHEN
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEFECT FREE GERMANIUM OXIDE GAP FILL
    • Publication number 20230407468
    • Publication date Dec 21, 2023
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PROCESSES FOR DEPOSITING SIB FILMS
    • Publication number 20220406594
    • Publication date Dec 22, 2022
    • Applied Materials, Inc.
    • Aykut AYDIN
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROCESSES TO DEPOSIT AMORPHOUS-SILICON ETCH PROTECTION LINER
    • Publication number 20220351982
    • Publication date Nov 3, 2022
    • Applied Materials, Inc.
    • Zeqing SHEN
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CATALYTIC THERMAL DEPOSITION OF CARBON-CONTAINING MATERIALS
    • Publication number 20220336212
    • Publication date Oct 20, 2022
    • Applied Materials, Inc.
    • Zeqing Shen
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEPOSITION OF LOW-STRESS CARBON-CONTAINING LAYERS
    • Publication number 20220319841
    • Publication date Oct 6, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    LOW-K BORON CARBONITRIDE FILMS
    • Publication number 20220223409
    • Publication date Jul 14, 2022
    • Applied Materials, Inc.
    • Zeqing Shen
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SUPER-CONFORMAL GERMANIUM OXIDE FILMS
    • Publication number 20220186365
    • Publication date Jun 16, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DEFECT FREE GERMANIUM OXIDE GAP FILL
    • Publication number 20220189824
    • Publication date Jun 16, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    HDP SACRIFICIAL CARBON GAPFILL
    • Publication number 20220127718
    • Publication date Apr 28, 2022
    • Applied Materials, Inc.
    • Zeqing Shen
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    CONFORMAL SILICON OXIDE FILM DEPOSITION
    • Publication number 20220130658
    • Publication date Apr 28, 2022
    • Applied Materials, Inc.
    • Zeqing Shen
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DOPING SEMICONDUCTOR FILMS
    • Publication number 20220093390
    • Publication date Mar 24, 2022
    • Applied Materials, Inc.
    • Aykut Aydin
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DIFFUSION BARRIERS FOR GERMANIUM
    • Publication number 20220068640
    • Publication date Mar 3, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEPOSITION OF LOW-STRESS CARBON-CONTAINING LAYERS
    • Publication number 20220044926
    • Publication date Feb 10, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEPOSITION OF LOW-STRESS BORON-CONTAINING LAYERS
    • Publication number 20220044927
    • Publication date Feb 10, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    MOLECULAR LAYER DEPOSITION METHOD AND SYSTEM
    • Publication number 20220028686
    • Publication date Jan 27, 2022
    • Applied Materials, Inc.
    • Bhaskar Bhuyan
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    STACK FOR 3D-NAND MEMORY CELL
    • Publication number 20210327891
    • Publication date Oct 21, 2021
    • Applied Materials, Inc.
    • Takehito Koshizawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CATALYTIC FORMATION OF BORON AND CARBON FILMS
    • Publication number 20210305041
    • Publication date Sep 30, 2021
    • Applied Materials, Inc.
    • Bo Qi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Molecular Layer Deposition of Amorphous Carbon Films
    • Publication number 20210277516
    • Publication date Sep 9, 2021
    • Applied Materials, Inc.
    • Bhaskar Jyoti Bhuyan
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Hydrogen Free Silicon Dioxide
    • Publication number 20210254210
    • Publication date Aug 19, 2021
    • Applied Materials, Inc.
    • Zeqing Shen
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    HIGH BORON-CONTENT HARD MASK MATERIALS
    • Publication number 20210175078
    • Publication date Jun 10, 2021
    • Applied Materials, Inc.
    • Bo Qi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    3D NAND Etch
    • Publication number 20210118691
    • Publication date Apr 22, 2021
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Non-Conformal High Selectivity Film For Etch Critical Dimension Con...
    • Publication number 20210047733
    • Publication date Feb 18, 2021
    • Applied Materials, Inc.
    • Bo Qi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHODS OF FORMING SILICON NITRIDE ENCAPSULATION LAYERS
    • Publication number 20200381623
    • Publication date Dec 3, 2020
    • Applied Materials, Inc.
    • Bo QI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    3D NAND Etch
    • Publication number 20200035505
    • Publication date Jan 30, 2020
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Low Temperature Atomic Layer Deposition Of Silicon Nitride
    • Publication number 20190330736
    • Publication date Oct 31, 2019
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    HIGH-THROUGHPUT HDP-CVD PROCESSES FOR ADVANCED GAPFILL APPLICATIONS
    • Publication number 20080063813
    • Publication date Mar 13, 2008
    • Applied Materials, Inc.
    • Bo Qi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    High-throughput HDP-CVD processes for advanced gapfill applications
    • Publication number 20060154494
    • Publication date Jul 13, 2006
    • APPLIED MATERIALS, INC., A Delaware corporation
    • Bo Qi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...