Boris Bittner

Person

Roth, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 11,112,543
- Issue date Sep 7, 2021
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Imaging optical system for microlithography
- Patent number 10,754,132
- Issue date Aug 25, 2020
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G02 - OPTICS
Information Patent Grant
Optical element and optical arrangement therewith
- Patent number 10,474,036
- Issue date Nov 12, 2019
- Carl Zeiss SMT GmbH
- Hans-Jochen Paul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 10,401,540
- Issue date Sep 3, 2019
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus with at least one manipulator
- Patent number 10,303,063
- Issue date May 28, 2019
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with a highly flexible manipulator
- Patent number 10,261,425
- Issue date Apr 16, 2019
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront correction element for use in an optical system
- Patent number 10,151,922
- Issue date Dec 11, 2018
- Carl Zeiss SMT GmbH
- Matus Banyay
- G02 - OPTICS
Information Patent Grant
Projection lens with wave front manipulator and related method and...
- Patent number 10,061,206
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 10,054,860
- Issue date Aug 21, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection objective
- Patent number 10,042,265
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a microlithographic projection apparatus
- Patent number 10,018,907
- Issue date Jul 10, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens for EUV microlithography, film element and method f...
- Patent number 10,001,631
- Issue date Jun 19, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Optical assembly
- Patent number 9,939,730
- Issue date Apr 10, 2018
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with at least one manipulator
- Patent number 9,927,714
- Issue date Mar 27, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus including at least one mirror
- Patent number 9,910,364
- Issue date Mar 6, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with at least one manipulator
- Patent number 9,846,367
- Issue date Dec 19, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System correction from long timescales
- Patent number 9,829,800
- Issue date Nov 28, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 9,817,316
- Issue date Nov 14, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus comprising a manipulator, and method...
- Patent number 9,760,019
- Issue date Sep 12, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror arrangement for an EUV projection exposure apparatus, method...
- Patent number 9,709,770
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element for EUV lithography and method of manufa...
- Patent number 9,606,446
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Norbert Wabra
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic projection objective
- Patent number 9,494,868
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element
- Patent number 9,470,872
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 9,423,696
- Issue date Aug 23, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection arrangement
- Patent number 9,377,694
- Issue date Jun 28, 2016
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 9,372,411
- Issue date Jun 21, 2016
- Carl Zeiss SMT GmbH
- Johannes Zellner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 9,354,524
- Issue date May 31, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic apparatus
- Patent number 9,348,234
- Issue date May 24, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,235,143
- Issue date Jan 12, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with at least one manipulator
- Patent number 9,170,497
- Issue date Oct 27, 2015
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20210364677
- Publication date Nov 25, 2021
- Carl Zeiss SMT GMBH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20190377107
- Publication date Dec 12, 2019
- Carl Zeiss SMT GMBH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
LITHOGRAPHIC PROJECTION OBJECTIVE
- Publication number 20190025709
- Publication date Jan 24, 2019
- Carl Zeiss SMT GMBH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH AT LEAST ONE MANIPULATOR
- Publication number 20180173100
- Publication date Jun 21, 2018
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20180136565
- Publication date May 17, 2018
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS WITH WAVE FRONT MANIPULATOR AND RELATED METHOD AND...
- Publication number 20180081281
- Publication date Mar 22, 2018
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM
- Publication number 20180059413
- Publication date Mar 1, 2018
- Carl Zeiss SMT GMBH
- Matus BANYAY
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20170261730
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH AT LEAST ONE MANIPULATOR
- Publication number 20170219932
- Publication date Aug 3, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20170123118
- Publication date May 4, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS INCLUDING AT LEAST ONE MIRROR
- Publication number 20170115576
- Publication date Apr 27, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PROJECTION OBJECTIVE
- Publication number 20170031247
- Publication date Feb 2, 2017
- Carl Zeiss SMT GMBH
- Olaf Rogalsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT AND OPTICAL ARRANGEMENT THEREWITH
- Publication number 20160377988
- Publication date Dec 29, 2016
- Carl Zeiss SMT GMBH
- Hans-Jochen PAUL
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20160252824
- Publication date Sep 1, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS COMPRISING A MANIPULATOR, AND METHOD...
- Publication number 20160216616
- Publication date Jul 28, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20160209754
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...
- Publication number 20160161852
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Karl-Heinz SCHUSTER
- G02 - OPTICS
Information Patent Application
METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION APPARATUS
- Publication number 20160161845
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL ASSEMBLY
- Publication number 20160091798
- Publication date Mar 31, 2016
- Carl Zeiss SMT GMBH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH A HIGHLY FLEXIBLE MANIPULATOR
- Publication number 20160054662
- Publication date Feb 25, 2016
- Carl Zeiss SMT GMBH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH AT LEAST ONE MANIPULATOR
- Publication number 20160033873
- Publication date Feb 4, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC APPARATUS
- Publication number 20160011521
- Publication date Jan 14, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Optical Element for EUV Lithography and Method of Manufa...
- Publication number 20150316851
- Publication date Nov 5, 2015
- Carl Zeiss SMT GMBH
- Norbert WABRA
- G02 - OPTICS
Information Patent Application
MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...
- Publication number 20150168674
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
SYSTEM CORRECTION FROM LONG TIMESCALES
- Publication number 20150160562
- Publication date Jun 11, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Optical Element
- Publication number 20150116703
- Publication date Apr 30, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20140347721
- Publication date Nov 27, 2014
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARAT...
- Publication number 20140327892
- Publication date Nov 6, 2014
- Holger Walter
- G02 - OPTICS
Information Patent Application
Reflective Optical Element for the EUV Wavelength Range, Method for...
- Publication number 20140307308
- Publication date Oct 16, 2014
- Carl Zeiss SMT GMBH
- Markus WEISS
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION AND DISPLACEMENT DEVICE FOR A PROJECTION EXPOSURE APPA...
- Publication number 20140239192
- Publication date Aug 28, 2014
- Sonja Schneider
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Boris Bittner

Person

Patents Grantslast 30 patents

Optical element having a coating for influencing heating radiation...

Imaging optical system for microlithography

Optical element and optical arrangement therewith

Optical element having a coating for influencing heating radiation...

Projection exposure apparatus with at least one manipulator

Projection exposure apparatus with a highly flexible manipulator

Wavefront correction element for use in an optical system

Projection lens with wave front manipulator and related method and...

Projection exposure apparatus with optimized adjustment possibility

Lithographic projection objective

Method of operating a microlithographic projection apparatus

Projection lens for EUV microlithography, film element and method f...

Optical assembly

Projection exposure apparatus with at least one manipulator

Projection exposure apparatus including at least one mirror

Projection exposure apparatus with at least one manipulator

System correction from long timescales

Projection exposure method and projection exposure apparatus for mi...

Projection exposure apparatus comprising a manipulator, and method...

Mirror arrangement for an EUV projection exposure apparatus, method...

Reflective optical element for EUV lithography and method of manufa...

Lithographic projection objective

Reflective optical element

Projection exposure apparatus with optimized adjustment possibility

Projection arrangement

Projection objective of a microlithographic projection exposure app...

Projection exposure apparatus with optimized adjustment possibility

Microlithographic apparatus

Microlithographic projection exposure apparatus

Projection exposure apparatus with at least one manipulator

Patents Applicationslast 30 patents

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...

LITHOGRAPHIC PROJECTION OBJECTIVE

PROJECTION EXPOSURE APPARATUS WITH AT LEAST ONE MANIPULATOR

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

PROJECTION LENS WITH WAVE FRONT MANIPULATOR AND RELATED METHOD AND...

WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM

Projection Lens for EUV Microlithography, Film Element and Method f...

PROJECTION EXPOSURE APPARATUS WITH AT LEAST ONE MANIPULATOR

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...

PROJECTION EXPOSURE APPARATUS INCLUDING AT LEAST ONE MIRROR

LITHOGRAPHIC PROJECTION OBJECTIVE

OPTICAL ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY

PROJECTION EXPOSURE APPARATUS COMPRISING A MANIPULATOR, AND METHOD...

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...

METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION APPARATUS

OPTICAL ASSEMBLY

PROJECTION EXPOSURE APPARATUS WITH A HIGHLY FLEXIBLE MANIPULATOR

PROJECTION EXPOSURE APPARATUS WITH AT LEAST ONE MANIPULATOR

MICROLITHOGRAPHIC APPARATUS

Reflective Optical Element for EUV Lithography and Method of Manufa...

MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...

SYSTEM CORRECTION FROM LONG TIMESCALES

Reflective Optical Element

Projection Lens for EUV Microlithography, Film Element and Method f...

METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARAT...

Reflective Optical Element for the EUV Wavelength Range, Method for...

ILLUMINATION AND DISPLACEMENT DEVICE FOR A PROJECTION EXPOSURE APPA...