Boris Golovanevsky

Person

Haifa, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Direct focusing with image binning in metrology tools
- Patent number 10,897,566
- Issue date Jan 19, 2021
- KLA-Tencor Corporation
- Nadav Gutman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hot spot and process window monitoring
- Patent number 10,755,016
- Issue date Aug 25, 2020
- KLA-Tencor Corporation
- Boris Golovanevsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Hot spot and process window monitoring
- Patent number 10,354,035
- Issue date Jul 16, 2019
- KLA-Tencor Corporation
- Boris Golovanevsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology tool stage configurations and operation methods
- Patent number 9,970,886
- Issue date May 15, 2018
- Boris Golovanevsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase characterization of targets
- Patent number 9,581,430
- Issue date Feb 28, 2017
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology target indentification, design and verification
- Patent number 9,546,946
- Issue date Jan 17, 2017
- KLA-Tencor Corporation
- Boris Golovanevsky
- G01 - MEASURING TESTING
Information Patent Grant
Flexible scatterometry metrology system and method
- Patent number 8,908,175
- Issue date Dec 9, 2014
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Multichip CCD camera inspection system
- Patent number 8,804,111
- Issue date Aug 12, 2014
- KLA-Tencor Corporation
- Boris Golovanevsky
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,933,016
- Issue date Apr 26, 2011
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Overlay metrology and control method
- Patent number 7,804,994
- Issue date Sep 28, 2010
- KLA-Tencor Technologies Corporation
- Michael Adel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,663,753
- Issue date Feb 16, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,616,313
- Issue date Nov 10, 2009
- KLA-Tencor Technologies Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,298,481
- Issue date Nov 20, 2007
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Measuring overlay and profile asymmetry using symmetric and anti-sy...
- Patent number 7,277,172
- Issue date Oct 2, 2007
- KLA-Tencor Technologies, Corporation
- Daniel Kandel
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Hot Spot and Process Window Monitoring
- Publication number 20190286781
- Publication date Sep 19, 2019
- KLA-Tencor Corporation
- Boris Golovanevsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Direct Focusing with Image Binning in Metrology Tools
- Publication number 20190208108
- Publication date Jul 4, 2019
- KLA-Tencor Corporation
- Nadav GUTMAN
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Hot Spot and Process Window Monitoring
- Publication number 20180232478
- Publication date Aug 16, 2018
- KLA-Tencor Corporation
- Boris Golovanevsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY TARGET INDENTIFICATION, DESIGN AND VERIFICATION
- Publication number 20150233814
- Publication date Aug 20, 2015
- KLA-Tencor Corporation
- Boris Golovanevsky
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TOOL STAGE CONFIGURATIONS AND OPERATION METHODS
- Publication number 20150098081
- Publication date Apr 9, 2015
- KLA-Tencor Corporation
- Boris Golovanevsky
- G01 - MEASURING TESTING
Information Patent Application
PHASE CHARACTERIZATION OF TARGETS
- Publication number 20140111791
- Publication date Apr 24, 2014
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20100091284
- Publication date Apr 15, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
MULTICHIP CCD CAMERA INSPECTION SYSTEM
- Publication number 20090091751
- Publication date Apr 9, 2009
- Boris Golovanevsky
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20070229829
- Publication date Oct 4, 2007
- KLA-Tencor Technologies Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring overlay and profile asymmetry using symmetric and anti-sy...
- Publication number 20060274310
- Publication date Dec 7, 2006
- KLA-Tencor Technologies Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233439
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Overlay metrology and control method
- Publication number 20030223630
- Publication date Dec 4, 2003
- KLA-Tencor Corporation
- Michael Adel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Boris Golovanevsky

Person

Patents Grantslast 30 patents

Direct focusing with image binning in metrology tools

Hot spot and process window monitoring

Hot spot and process window monitoring

Metrology tool stage configurations and operation methods

Phase characterization of targets

Metrology target indentification, design and verification

Flexible scatterometry metrology system and method

Multichip CCD camera inspection system

Apparatus and methods for detecting overlay errors using scatterometry

Overlay metrology and control method

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Measuring overlay and profile asymmetry using symmetric and anti-sy...

Patents Applicationslast 30 patents

Hot Spot and Process Window Monitoring

Direct Focusing with Image Binning in Metrology Tools

Hot Spot and Process Window Monitoring

METROLOGY TARGET INDENTIFICATION, DESIGN AND VERIFICATION

METROLOGY TOOL STAGE CONFIGURATIONS AND OPERATION METHODS

PHASE CHARACTERIZATION OF TARGETS

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

MULTICHIP CCD CAMERA INSPECTION SYSTEM

Apparatus and methods for detecting overlay errors using scatterometry

Measuring overlay and profile asymmetry using symmetric and anti-sy...

Apparatus and methods for detecting overlay errors using scatterometry

Overlay metrology and control method