Boris Menchtchikov

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 12,055,904
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing devices
- Patent number 12,044,980
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Abraham Slachter
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,947,266
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Nicolaas Petrus Marcus Brantjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining root cause affecting yield in a semiconducto...
- Patent number 11,803,127
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Chenxi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,714,357
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,086,229
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus
- Patent number 9,903,823
- Issue date Feb 27, 2018
- ASML Netherlands B.V.
- Yen-Wen Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20240184221
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Samee Ur REHMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...
- Publication number 20220026810
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Nicolaas Petrus Marcus BRANTJES
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20220011728
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF MANUFACTURING DEVICES
- Publication number 20210397172
- Publication date Dec 23, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR DETERMINING ROOT CAUSE AFFECTING YIELD IN A SEMICONDUCTO...
- Publication number 20210389677
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Chenxi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20210325788
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20200103761
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20160146740
- Publication date May 26, 2016
- ASML NETHERLANDS B.V.
- Yen-Wen Lu
- G01 - MEASURING TESTING

Boris Menchtchikov

Person

Patents Grantslast 30 patents

Method to predict yield of a device manufacturing process

Method of manufacturing devices

Method for controlling a manufacturing process and associated appar...

Method for determining root cause affecting yield in a semiconducto...

Method to predict yield of a device manufacturing process

Method to predict yield of a device manufacturing process

Lithographic method

Lithographic method

Metrology method and apparatus

Patents Applicationslast 30 patents

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD OF MANUFACTURING DEVICES

METHOD FOR DETERMINING ROOT CAUSE AFFECTING YIELD IN A SEMICONDUCTO...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

LITHOGRAPHIC METHOD

LITHOGRAPHIC METHOD

METROLOGY METHOD AND APPARATUS