BOXIU CAI

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Photolithography alignment mark structures and semiconductor struct...
- Patent number 10,163,806
- Issue date Dec 25, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic mask
- Patent number 9,946,155
- Issue date Apr 17, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic mask and fabrication method thereof
- Patent number 9,829,788
- Issue date Nov 28, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for optical measurements
- Patent number 9,645,096
- Issue date May 9, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G01 - MEASURING TESTING
Information Patent Grant
Photolithography alignment mark structures, semiconductor structure...
- Patent number 9,620,458
- Issue date Apr 11, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser annealing device including tunable mask and method of using t...
- Patent number 9,406,515
- Issue date Aug 2, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- BoXiu Cai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photolithographic masks and fabrication method thereof
- Patent number 9,348,215
- Issue date May 24, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for monitoring source symmetry of photolithography systems
- Patent number 9,316,925
- Issue date Apr 19, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser annealing device and method
- Patent number 9,257,287
- Issue date Feb 9, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- BoXiu Cai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and system for obtaining optical proximity correction model...
- Patent number 9,105,079
- Issue date Aug 11, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Standard wafer and its fabrication method
- Patent number 9,019,152
- Issue date Apr 28, 2015
- Semiconductor Manufacturing International Corporation (Shanghai)
- BoXiu Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for monitoring electron beam condition of scan...
- Patent number 8,829,424
- Issue date Sep 9, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- BoXiu Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for detecting electron beam of scanning electron microscope...
- Patent number 8,742,345
- Issue date Jun 3, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- Boxiu Cai
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
PHOTOLITHOGRAPHIC MASK
- Publication number 20180046074
- Publication date Feb 15, 2018
- Semiconductor Manufaturing International (Shanghai) Corporation
- BOXIU CAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY ALIGNMENT MARK STRUCTURES AND SEMICONDUCTOR STRUCT...
- Publication number 20170170129
- Publication date Jun 15, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- BOXIU CAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR OPTICAL MEASUREMENTS
- Publication number 20160091436
- Publication date Mar 31, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- BOXIU CAI
- G01 - MEASURING TESTING
Information Patent Application
PHOTOLITHOGRAPHY ALIGNMENT MARK STRUCTURES, SEMICONDUCTOR STRUCTURE...
- Publication number 20160093574
- Publication date Mar 31, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- BOXIU CAI
- G02 - OPTICS
Information Patent Application
LASER ANNEALING DEVICE AND METHOD
- Publication number 20160079065
- Publication date Mar 17, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- BoXiu CAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHIC MASK AND FABRICATION METHOD THEREOF
- Publication number 20160062231
- Publication date Mar 3, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- BOXIU CAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR OBTAINING OPTICAL PROXIMITY CORRECTION MODEL...
- Publication number 20150058814
- Publication date Feb 26, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- BOXIU CAI
- G01 - MEASURING TESTING
Information Patent Application
PHOTOLITHOGRAPHIC MASKS AND FABRICATION METHOD THEREOF
- Publication number 20150037714
- Publication date Feb 5, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- BOXIU CAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MONITORING SOURCE SYMMETRY OF PHOTOLITHOGRAPHY SYSTEMS
- Publication number 20140362363
- Publication date Dec 11, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- BOXIU CAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER ANNEALING DEVICE AND METHOD
- Publication number 20140162381
- Publication date Jun 12, 2014
- SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORPORATION (SHANGHAI)
- BoXiu CAI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR DETECTING ELECTRON BEAM OF SCANNING ELECTRON MICROSCOPE...
- Publication number 20140131563
- Publication date May 15, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- BOXIU CAI
- G01 - MEASURING TESTING
Information Patent Application
STANDARD WAFER AND ITS FABRICATION METHOD
- Publication number 20140117235
- Publication date May 1, 2014
- Semiconductor Manufacturing International (Beijing) Corporation
- BoXiu CAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MONITORING ELECTRON BEAM CONDITION OF SCAN...
- Publication number 20140117218
- Publication date May 1, 2014
- Semiconductor Manufacturing International Corporation
- BoXiu CAI
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Photolithography alignment mark structures and semiconductor struct...

Photolithographic mask

Photolithographic mask and fabrication method thereof

Method and system for optical measurements

Photolithography alignment mark structures, semiconductor structure...

Laser annealing device including tunable mask and method of using t...

Photolithographic masks and fabrication method thereof

Methods for monitoring source symmetry of photolithography systems

Laser annealing device and method

Method and system for obtaining optical proximity correction model...

Standard wafer and its fabrication method

Method and apparatus for monitoring electron beam condition of scan...

Method for detecting electron beam of scanning electron microscope...

Patents Applicationslast 30 patents

PHOTOLITHOGRAPHIC MASK

PHOTOLITHOGRAPHY ALIGNMENT MARK STRUCTURES AND SEMICONDUCTOR STRUCT...

METHOD AND SYSTEM FOR OPTICAL MEASUREMENTS

PHOTOLITHOGRAPHY ALIGNMENT MARK STRUCTURES, SEMICONDUCTOR STRUCTURE...

LASER ANNEALING DEVICE AND METHOD

PHOTOLITHOGRAPHIC MASK AND FABRICATION METHOD THEREOF

METHOD AND SYSTEM FOR OBTAINING OPTICAL PROXIMITY CORRECTION MODEL...

PHOTOLITHOGRAPHIC MASKS AND FABRICATION METHOD THEREOF

METHODS FOR MONITORING SOURCE SYMMETRY OF PHOTOLITHOGRAPHY SYSTEMS

LASER ANNEALING DEVICE AND METHOD

METHOD FOR DETECTING ELECTRON BEAM OF SCANNING ELECTRON MICROSCOPE...

STANDARD WAFER AND ITS FABRICATION METHOD

METHOD AND APPARATUS FOR MONITORING ELECTRON BEAM CONDITION OF SCAN...