Bret W. Adams

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Computer-implemented process control in chemical mechanical polishing
- Patent number 8,460,057
- Issue date Jun 11, 2013
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with in-line and in-situ metrology
- Patent number 7,927,182
- Issue date Apr 19, 2011
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Computer-implemented method for process control in chemical mechani...
- Patent number 7,585,202
- Issue date Sep 8, 2009
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with in-line and in-situ metrology
- Patent number 7,294,039
- Issue date Nov 13, 2007
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with in-line and in-situ metrology
- Patent number 7,101,251
- Issue date Sep 5, 2006
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with in-line and in-situ metrology
- Patent number 6,939,198
- Issue date Sep 6, 2005
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Grant
Optical monitoring in a two-step chemical mechanical polishing process
- Patent number 6,632,124
- Issue date Oct 14, 2003
- Applied Materials Inc.
- Bret W. Adams
- B24 - GRINDING POLISHING
Information Patent Grant
Optical monitoring in a two-step chemical mechanical polishing process
- Patent number 6,506,097
- Issue date Jan 14, 2003
- Applied Materials, Inc.
- Bret W. Adams
- B24 - GRINDING POLISHING
Information Patent Grant
Determining when to replace a retaining ring used in substrate poli...
- Patent number 6,390,908
- Issue date May 21, 2002
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Integrated electrodeposition and chemical mechanical polishing tool
- Patent number 6,352,467
- Issue date Mar 5, 2002
- Applied Materials, Inc.
- Sasson Somekh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated electrodeposition and chemical-mechanical polishing tool
- Patent number 6,110,011
- Issue date Aug 29, 2000
- Applied Materials, Inc.
- Sasson Somekh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Back sputtering shield
- Patent number 6,045,670
- Issue date Apr 4, 2000
- Applied Materials, Inc.
- Bret Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle trap in a magnetron sputtering chamber
- Patent number 6,013,159
- Issue date Jan 11, 2000
- Applied Materials, Inc.
- Bret W. Adams
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
POLISHING SYSTEM WITH IN-LINE AND IN-SITU METROLOGY
- Publication number 20110195528
- Publication date Aug 11, 2011
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SYSTEM WITH IN-LINE AND IN-SITU METROLOGY
- Publication number 20100062684
- Publication date Mar 11, 2010
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Application
Polishing System With In-Line and In-Situ Metrology
- Publication number 20080064300
- Publication date Mar 13, 2008
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Application
Polishing System With In-Line and In-Situ Metrology
- Publication number 20060286904
- Publication date Dec 21, 2006
- Applied Materials, Inc.
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Application
Polishing system with in-line and in-situ metrology
- Publication number 20050245170
- Publication date Nov 3, 2005
- Applied Materials, Inc., a Delaware corporation
- Boguslaw A. Swedek
- B24 - GRINDING POLISHING
Information Patent Application
OPTICAL MONITORING IN A TWO-STEP CHEMICAL MECHANICAL POLISHING PROCESS
- Publication number 20030104760
- Publication date Jun 5, 2003
- Applied Materials, Inc. a Delaware Corporation
- Bret W. Adams
- B24 - GRINDING POLISHING
Information Patent Application
OPTICAL MONITORING IN A TWO-STEP CHEMICAL MECHANICAL POLISHING PROCESS
- Publication number 20030003845
- Publication date Jan 2, 2003
- Bret W. Adams
- B24 - GRINDING POLISHING

Bret W. Adams

Person

Patents Grantslast 30 patents

Computer-implemented process control in chemical mechanical polishing

Polishing system with in-line and in-situ metrology

Computer-implemented method for process control in chemical mechani...

Polishing system with in-line and in-situ metrology

Polishing system with in-line and in-situ metrology

Polishing system with in-line and in-situ metrology

Optical monitoring in a two-step chemical mechanical polishing process

Optical monitoring in a two-step chemical mechanical polishing process

Determining when to replace a retaining ring used in substrate poli...

Integrated electrodeposition and chemical mechanical polishing tool

Integrated electrodeposition and chemical-mechanical polishing tool

Back sputtering shield

Particle trap in a magnetron sputtering chamber

Patents Applicationslast 30 patents

POLISHING SYSTEM WITH IN-LINE AND IN-SITU METROLOGY

POLISHING SYSTEM WITH IN-LINE AND IN-SITU METROLOGY

Polishing System With In-Line and In-Situ Metrology

Polishing System With In-Line and In-Situ Metrology

Polishing system with in-line and in-situ metrology

OPTICAL MONITORING IN A TWO-STEP CHEMICAL MECHANICAL POLISHING PROCESS

OPTICAL MONITORING IN A TWO-STEP CHEMICAL MECHANICAL POLISHING PROCESS