Brian Haas

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for measuring shape or thickness information o...
- Patent number 8,068,234
- Issue date Nov 29, 2011
- KLA-Tencor Corporation
- Shouhong Tang
- G01 - MEASURING TESTING
Information Patent Grant
Computer-implemented methods and systems for determining a configur...
- Patent number 7,436,505
- Issue date Oct 14, 2008
- KLA-Tencor Technologies Corp.
- Alexander Belyaev
- G01 - MEASURING TESTING
Information Patent Grant
Tailored temperature uniformity
- Patent number 7,127,367
- Issue date Oct 24, 2006
- Applied Materials, Inc.
- Balasubramanian Ramachandran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stepped reflector plate
- Patent number 7,041,931
- Issue date May 9, 2006
- Applied Materials, Inc.
- Dean Jennings
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Thermally processing a substrate
- Patent number 6,803,546
- Issue date Oct 12, 2004
- Applied Materials, Inc.
- Ryan C Boas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing the deposition rate of volatile contaminants onto an optic...
- Patent number 6,280,790
- Issue date Aug 28, 2001
- Applied Materials, Inc.
- Anthony F. White
- C30 - CRYSTAL GROWTH
Information Patent Grant
Thermally processing a substrate
- Patent number 6,215,106
- Issue date Apr 10, 2001
- Applied Materials, Inc.
- Ryan C. Boas
- C30 - CRYSTAL GROWTH
Information Patent Grant
Co-rotating edge ring extension for use in a semiconductor processi...
- Patent number 6,133,152
- Issue date Oct 17, 2000
- Applied Materials, Inc.
- Benjamin Bierman
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus for achieving temperature uniformity of a subs...
- Patent number 6,123,766
- Issue date Sep 26, 2000
- Applied Materials, Inc.
- Meredith J. Williams
- C30 - CRYSTAL GROWTH
Information Patent Grant
Reflector cover for a semiconductor processing chamber
- Patent number 6,035,100
- Issue date Mar 7, 2000
- Applied Materials, Inc.
- Benjamin Bierman
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for purging the back side of a substrate durin...
- Patent number 5,960,555
- Issue date Oct 5, 1999
- Applied Materials, Inc.
- Paul Deaton
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for gaseous substrate support
- Patent number 5,920,797
- Issue date Jul 6, 1999
- Applied Materials, Inc.
- David S. Ballance
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR MEASURING SHAPE OR THICKNESS INFORMATION O...
- Publication number 20100208272
- Publication date Aug 19, 2010
- KLA-Tencor Corporation
- Shouhong Tang
- G01 - MEASURING TESTING
Information Patent Application
CONTROLLED ANNEALING METHOD
- Publication number 20080090309
- Publication date Apr 17, 2008
- JOSEPH MICHAEL RANISH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Computer-Implemented Methods and Systems for Determining a Configur...
- Publication number 20070229809
- Publication date Oct 4, 2007
- KLA-TENCOR TECHNOLOGIES CORP.
- Alexander Belyaev
- G01 - MEASURING TESTING
Information Patent Application
Tailored temperature uniformity
- Publication number 20050102108
- Publication date May 12, 2005
- Balasubramanian Ramachandran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stepped reflector plate
- Publication number 20040079746
- Publication date Apr 29, 2004
- APPLIED MATERIALS, INC.
- Dean Jennings
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fast gas exchange for thermal conductivity modulation
- Publication number 20040058560
- Publication date Mar 25, 2004
- APPLIED MATERIALS, INC.
- Joseph Ranish
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method and apparatus for measuring shape or thickness information o...

Computer-implemented methods and systems for determining a configur...

Tailored temperature uniformity

Stepped reflector plate

Thermally processing a substrate

Reducing the deposition rate of volatile contaminants onto an optic...

Thermally processing a substrate

Co-rotating edge ring extension for use in a semiconductor processi...

Method and apparatus for achieving temperature uniformity of a subs...

Reflector cover for a semiconductor processing chamber

Method and apparatus for purging the back side of a substrate durin...

Method for gaseous substrate support

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR MEASURING SHAPE OR THICKNESS INFORMATION O...

CONTROLLED ANNEALING METHOD

Computer-Implemented Methods and Systems for Determining a Configur...

Tailored temperature uniformity

Stepped reflector plate

Fast gas exchange for thermal conductivity modulation