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CVD flowable gap fill
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Patent number 9,257,302
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Issue date Feb 9, 2016
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Novellus Systems, Inc.
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Feng Wang
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H01 - BASIC ELECTRIC ELEMENTS
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CVD flowable gap fill
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Patent number 8,187,951
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Issue date May 29, 2012
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Novellus Systems, Inc.
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Feng Wang
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H01 - BASIC ELECTRIC ELEMENTS
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CVD flowable gap fill
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Patent number 7,629,227
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Issue date Dec 8, 2009
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Novellus Systems, Inc.
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Feng Wang
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H01 - BASIC ELECTRIC ELEMENTS
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