Brian S. Freer

Person

Medford, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for growing a thin film using a gas cluster ion beam
- Patent number 9,103,031
- Issue date Aug 11, 2015
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam angle calibration and emittance measurement system for rib...
- Patent number 8,168,941
- Issue date May 1, 2012
- Axcelis Technologies, Inc.
- Marvin Farley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for trapping ion beam particles and focusing an...
- Patent number 7,598,495
- Issue date Oct 6, 2009
- Axcelis Technologies, Inc.
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop dose control for ion implantation
- Patent number 7,557,363
- Issue date Jul 7, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam angle measurement systems and methods employing varied ang...
- Patent number 7,476,876
- Issue date Jan 13, 2009
- Axcelis Technologies, Inc.
- Brian S. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam angle measurement systems and methods for ion implantation...
- Patent number 7,435,977
- Issue date Oct 14, 2008
- Axcelis Technologies, Inc.
- Brian S. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam incident angle detector for ion implant systems
- Patent number 6,828,572
- Issue date Dec 7, 2004
- Axcelis Technologies, Inc.
- Ronald N. Reece
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for cleaning contaminated surfaces in an ion impl...
- Patent number 6,221,169
- Issue date Apr 24, 2001
- Axcelis Technologies, Inc.
- James D. Bernstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to operate GEF4 gas in hot cathode discharge ion sources
- Patent number 6,215,125
- Issue date Apr 10, 2001
- International Business Machines Corporation
- Jiong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter electron shower having enhanced secondary electron em...
- Patent number 5,909,031
- Issue date Jun 1, 1999
- Eaton Corporation
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Biased and serrated extension tube for ion implanter electron shower
- Patent number 5,903,009
- Issue date May 11, 1999
- Eaton Corporation
- James D. Bernstein
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM ANGLE CALIBRATION AND EMITTANCE MEASUREMENT SYSTEM FOR RIB...
- Publication number 20100181470
- Publication date Jul 22, 2010
- Axcelis Technologies, Inc.
- Marvin Farley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR GROWING A THIN FILM USING A GAS CLUSTER ION BEAM
- Publication number 20090317564
- Publication date Dec 24, 2009
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS FOR TRAPPING ION BEAM PARTICLES AND FOCUSING AN...
- Publication number 20070295901
- Publication date Dec 27, 2007
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Closed loop dose control for ion implantation
- Publication number 20070278427
- Publication date Dec 6, 2007
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam angle measurement systems and methods for ion implantation...
- Publication number 20070145298
- Publication date Jun 28, 2007
- Axcelis Technologies, Inc.
- Brian S. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam angle measurement systems and methods employing varied ang...
- Publication number 20070138412
- Publication date Jun 21, 2007
- Axcelis Technologies, Inc.
- Brian S. Freer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM INCIDENT ANGLE DETECTOR FOR ION IMPLANT SYSTEMS
- Publication number 20040195528
- Publication date Oct 7, 2004
- Ronald N. Reece
- H01 - BASIC ELECTRIC ELEMENTS

Brian S. Freer

Person

Patents Grantslast 30 patents

Method and system for growing a thin film using a gas cluster ion beam

Ion beam angle calibration and emittance measurement system for rib...

Methods and systems for trapping ion beam particles and focusing an...

Closed loop dose control for ion implantation

Ion beam angle measurement systems and methods employing varied ang...

Ion beam angle measurement systems and methods for ion implantation...

Ion beam incident angle detector for ion implant systems

System and method for cleaning contaminated surfaces in an ion impl...

Method to operate GEF4 gas in hot cathode discharge ion sources

Ion implanter electron shower having enhanced secondary electron em...

Biased and serrated extension tube for ion implanter electron shower

Patents Applicationslast 30 patents

ION BEAM ANGLE CALIBRATION AND EMITTANCE MEASUREMENT SYSTEM FOR RIB...

METHOD AND SYSTEM FOR GROWING A THIN FILM USING A GAS CLUSTER ION BEAM

METHODS AND SYSTEMS FOR TRAPPING ION BEAM PARTICLES AND FOCUSING AN...

Closed loop dose control for ion implantation

Ion beam angle measurement systems and methods for ion implantation...

Ion beam angle measurement systems and methods employing varied ang...

ION BEAM INCIDENT ANGLE DETECTOR FOR ION IMPLANT SYSTEMS