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Bruce David Gittleman
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Scottsdale, AZ, US
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Patents Grants
last 30 patents
Information
Patent Grant
Ionized physical vapor deposition (iPVD) process
Patent number
7,901,545
Issue date
Mar 8, 2011
Tokyo Electron Limited
Frank M. Cerio, Jr.
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Ionized PVD with sequential deposition and etching
Patent number
7,744,735
Issue date
Jun 29, 2010
Tokyo Electron Limited
Rodney Lee Robison
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Ionized PVD with sequential deposition and etching
Patent number
6,755,945
Issue date
Jun 29, 2004
Tokyo Electron Limited
Tugrul Yasar
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for ionized physical vapor deposition
Patent number
6,719,886
Issue date
Apr 13, 2004
Tokyo Electron Limited
John Stephen Drewery
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for ionized physical vapor deposition
Patent number
6,287,435
Issue date
Sep 11, 2001
Tokyo Electron Limited
John Stephen Drewery
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for increasing the metal ion fraction in ioniz...
Patent number
6,117,279
Issue date
Sep 12, 2000
Tokyo Electron Limited
Jason Smolanoff
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for depositing a low-resistivity titanium-oxynitride (TiON)...
Patent number
6,107,195
Issue date
Aug 22, 2000
Tokyo Electron Limited
Bruce David Gittleman
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
IONIZED PHYSICAL VAPOR DEPOSITION (iPVD) PROCESS
Publication number
20090321247
Publication date
Dec 31, 2009
TOKYO ELECTRON LIMITED
Frank M. Cerio, JR.
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Ionized physical vapor deposition (iPVD) process
Publication number
20050211545
Publication date
Sep 29, 2005
Frank M. Cerio
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Processing chamber components, particularly chamber shields, and me...
Publication number
20050147742
Publication date
Jul 7, 2005
TOKYO ELECTRON LIMITED
Mark Kleshock
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Ionized PVD with sequential deposition and etching
Publication number
20040188239
Publication date
Sep 30, 2004
Rodney Lee Robison
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Ionized PVD with sequential deposition and etching
Publication number
20030034244
Publication date
Feb 20, 2003
Tugrul Yasar
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method and apparatus for ionized physical vapor deposition
Publication number
20020104751
Publication date
Aug 8, 2002
John Stephen Drewery
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...