Bruno LaFontaine

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Prediction of out of specification based on a spatial characteristi...
- Patent number 11,733,613
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Wenjin Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for pattern fidelity control
- Patent number 11,669,020
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Tanbir Hasan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Defect prediction
- Patent number 11,403,453
- Issue date Aug 2, 2022
- ASML Netherlands B.V.
- Lin Lee Cheong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for determining an approximate value of a processing parame...
- Patent number 11,126,092
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Lin Lee Cheong
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and apparatus for pattern fidelity control
- Patent number 10,908,515
- Issue date Feb 2, 2021
- ASML Netherlands B.V.
- Tanbir Hasan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Harsh environment optical element protection
- Patent number 10,185,234
- Issue date Jan 22, 2019
- ASML Netherlands B.V.
- Alexander I. Ershov
- G02 - OPTICS
Information Patent Grant
Transport system for an extreme ultraviolet light source
- Patent number 9,560,730
- Issue date Jan 31, 2017
- ASML Netherlands B.V.
- Silvia De Dea
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transport system for an extreme ultraviolet light source
- Patent number 9,557,650
- Issue date Jan 31, 2017
- ASML Netherlands B.V.
- Silvia De Dea
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical polarizer with nanotube array
- Patent number 8,792,161
- Issue date Jul 29, 2014
- GLOBALFOUNDRIES Inc.
- Bruno M. LaFontaine
- G02 - OPTICS
Information Patent Grant
Spacer lithography
- Patent number 8,642,474
- Issue date Feb 4, 2014
- Advanced Micro Devices, Inc.
- Ryoung-han Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser beam formatting module and method for fabricating semiconduct...
- Patent number 8,198,611
- Issue date Jun 12, 2012
- GLOBALFOUNDRIES Inc.
- Bruno M. LaFontaine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for determining suitability of a resist in semiconductor waf...
- Patent number 7,858,276
- Issue date Dec 28, 2010
- Advanced Micro Devices, Inc.
- Thomas Wallow
- G01 - MEASURING TESTING
Information Patent Grant
Wafer assembly having a contrast enhancing top anti-reflecting coat...
- Patent number 7,855,048
- Issue date Dec 21, 2010
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removal of immersion lithography medium in immersion lit...
- Patent number 7,741,012
- Issue date Jun 22, 2010
- Advanced Micro Devices, Inc.
- Adam R. Pawloski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for enhancing resolution of a chemically amplified photoresist
- Patent number 7,504,198
- Issue date Mar 17, 2009
- Advanced Micro Devices, Inc.
- Bruno LaFontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask utilizing asymmetric light source
- Patent number 7,276,328
- Issue date Oct 2, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask for short wavelength lithography
- Patent number 7,101,645
- Issue date Sep 5, 2006
- Advanced Micro Devices, Inc.
- Bruno La Fontaine
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Detection of contamination in imaging systems by fluorescence and/o...
- Patent number 7,087,907
- Issue date Aug 8, 2006
- Advanced Micro Devices, Inc.
- Ivan Lalovic
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for determining reflection lens pupil transmissio...
- Patent number 7,081,956
- Issue date Jul 25, 2006
- Advanced Micro Devices, Inc.
- Ivan Lalovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift reflective mask for lithography, and method of using an...
- Patent number 7,060,401
- Issue date Jun 13, 2006
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for elimination of bubbles in immersion medium...
- Patent number 7,014,966
- Issue date Mar 21, 2006
- Advanced Micro Devices, Inc.
- Adam R. Pawloski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) lithography masks
- Patent number 6,984,475
- Issue date Jan 10, 2006
- Advanced Micro Devices, Inc.
- Harry J. Levinson
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and device for determining projection lens pupil transmissio...
- Patent number 6,977,717
- Issue date Dec 20, 2005
- Advanced Micro Devices, Inc.
- Ivan Lalovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography method and system with adjustable reflector
- Patent number 6,977,718
- Issue date Dec 20, 2005
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- G02 - OPTICS
Information Patent Grant
Method and system for monitoring EUV lithography mask flatness
- Patent number 6,950,176
- Issue date Sep 27, 2005
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask for short wavelength lithography
- Patent number 6,872,497
- Issue date Mar 29, 2005
- Advanced Micro Devices, Inc.
- Harry Levinson
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV mask which facilitates electro-static chucking
- Patent number 6,806,007
- Issue date Oct 19, 2004
- Advanced Micro Devices, Inc.
- Amr Yehia Abdo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Phase grating focus monitor using overlay technique
- Patent number 6,710,853
- Issue date Mar 23, 2004
- Advanced Micro Devices, Inc.
- Bruno La Fontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo assisted electrical linewidth measurement method and apparatus
- Patent number 6,696,847
- Issue date Feb 24, 2004
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- G01 - MEASURING TESTING
Information Patent Grant
Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...
- Patent number 6,673,524
- Issue date Jan 6, 2004
- Kouros Ghandehari
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ON SYSTEM SELF-DIAGNOSIS AND SELF-CALIBRATION TECHNIQUE FOR CHARGED...
- Publication number 20240186106
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Yongxin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PULSED VOLTAGE CONTRAST DETECTION AND CAPTU...
- Publication number 20230335374
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Benoit Herve GAURY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SIGNAL ELECTRON DETECTION IN AN INSPECTION...
- Publication number 20230298851
- Publication date Sep 21, 2023
- ASML NETHERLANDS B.V.
- Chih-Yu JEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL
- Publication number 20210181642
- Publication date Jun 17, 2021
- ASML NETHERLANDS B.V.
- Tanbir HASAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEFECT PREDICTION
- Publication number 20210150115
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Lin Lee CHEONG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PREDICTION OF OUT OF SPECIFICATION BASED ON A SPATIAL CHARACTERISTI...
- Publication number 20200151600
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Wenjin Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL
- Publication number 20200019069
- Publication date Jan 16, 2020
- ASML NETHERLANDS B.V.
- Tanbir HASAN
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS FOR IDENTIFYING A PROCESS WINDOW BOUNDARY
- Publication number 20180329311
- Publication date Nov 15, 2018
- ASML Netherland B.V.
- Lin Lee CHEONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSPORT SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150282287
- Publication date Oct 1, 2015
- ASML NETHERLANDS B.V.
- Silvia De Dea
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TRANSPORT SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150069273
- Publication date Mar 12, 2015
- CYMER, LLC
- Silvia De Dea
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
HARSH ENVIRONMENT OPTICAL ELEMENT PROTECTION
- Publication number 20140098413
- Publication date Apr 10, 2014
- CYMER INC.
- Alexander I. ERSHOV
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC ALIGNMENT MARKS
- Publication number 20090135390
- Publication date May 28, 2009
- Advanced Micro Devices, Inc.
- Bruno La Fontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOUBLE EXPOSURE OF A PHOTORESIST LAYER USING A SINGLE RETICLE
- Publication number 20090033892
- Publication date Feb 5, 2009
- Advanced Micro Devices, Inc.
- Oleg Kritsun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPACER LITHOGRAPHY
- Publication number 20090017628
- Publication date Jan 15, 2009
- Advanced Micro Devices, Inc.
- Ryoung-han KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining suitability of a resist in semiconductor waf...
- Publication number 20090011524
- Publication date Jan 8, 2009
- Advanced Micro Devices, Inc.
- Thomas Wallow
- G01 - MEASURING TESTING
Information Patent Application
EUV diffractive optical element for semiconductor wafer lithography...
- Publication number 20080259458
- Publication date Oct 23, 2008
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Laser beam formatting module and method for fabricating semiconduct...
- Publication number 20080239269
- Publication date Oct 2, 2008
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Optical polarizer with nanotube array
- Publication number 20080198453
- Publication date Aug 21, 2008
- Advanced Micro Devices, Inc.
- Bruno M. LaFontaine
- G02 - OPTICS
Information Patent Application
Methods for enhancing resolution of a chemically amplified photoresist
- Publication number 20070275321
- Publication date Nov 29, 2007
- Bruno LaFontaine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for elimination of bubbles in immersion medium...
- Publication number 20050048223
- Publication date Mar 3, 2005
- Adam R. Pawloski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...
- Publication number 20020146648
- Publication date Oct 10, 2002
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- B82 - NANO-TECHNOLOGY

Bruno LaFontaine

Person

Patents Grantslast 30 patents

Prediction of out of specification based on a spatial characteristi...

Method and apparatus for pattern fidelity control

Defect prediction

Methods for determining an approximate value of a processing parame...

Method and apparatus for pattern fidelity control

Harsh environment optical element protection

Transport system for an extreme ultraviolet light source

Transport system for an extreme ultraviolet light source

Optical polarizer with nanotube array

Spacer lithography

Laser beam formatting module and method for fabricating semiconduct...

Method for determining suitability of a resist in semiconductor waf...

Wafer assembly having a contrast enhancing top anti-reflecting coat...

Method for removal of immersion lithography medium in immersion lit...

Methods for enhancing resolution of a chemically amplified photoresist

Lithography mask utilizing asymmetric light source

Reflective mask for short wavelength lithography

Detection of contamination in imaging systems by fluorescence and/o...

Method and device for determining reflection lens pupil transmissio...

Phase-shift reflective mask for lithography, and method of using an...

Method and apparatus for elimination of bubbles in immersion medium...

Extreme ultraviolet (EUV) lithography masks

Method and device for determining projection lens pupil transmissio...

Lithography method and system with adjustable reflector

Method and system for monitoring EUV lithography mask flatness

Reflective mask for short wavelength lithography

EUV mask which facilitates electro-static chucking

Phase grating focus monitor using overlay technique

Photo assisted electrical linewidth measurement method and apparatus

Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...

Patents Applicationslast 30 patents

ON SYSTEM SELF-DIAGNOSIS AND SELF-CALIBRATION TECHNIQUE FOR CHARGED...

SYSTEMS AND METHODS FOR PULSED VOLTAGE CONTRAST DETECTION AND CAPTU...

SYSTEMS AND METHODS FOR SIGNAL ELECTRON DETECTION IN AN INSPECTION...

METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL

DEFECT PREDICTION

PREDICTION OF OUT OF SPECIFICATION BASED ON A SPATIAL CHARACTERISTI...

METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL

METHODS FOR IDENTIFYING A PROCESS WINDOW BOUNDARY

TRANSPORT SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

TRANSPORT SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

HARSH ENVIRONMENT OPTICAL ELEMENT PROTECTION

LITHOGRAPHIC ALIGNMENT MARKS

DOUBLE EXPOSURE OF A PHOTORESIST LAYER USING A SINGLE RETICLE

SPACER LITHOGRAPHY

Method for determining suitability of a resist in semiconductor waf...

EUV diffractive optical element for semiconductor wafer lithography...

Laser beam formatting module and method for fabricating semiconduct...

Optical polarizer with nanotube array

Methods for enhancing resolution of a chemically amplified photoresist

Method and apparatus for elimination of bubbles in immersion medium...

Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...